Protective Coating Electra 92 (AR-PC 5091)
Conductive protective coating for non-novolac-based e-beam resists
Top layer for the dissipation of e-beam charges on insulating substrates
Characterisation
- as protective coating, this resist is not sensitive to light / radiation
- thin, conductive layers for the dissipation of charges during electron exposure
- coating of novolac-based e-beam resist AR-N 7000
- longterm-stable
- easy removal with water after exposure
- polyaniline-derivative dissolved in water and IPA
Properties
- Film thickness/4000 rpm (nm)42 nm
- Film thickness/1000 rpm (nm)100 nm
- Resolution (μm)1,2 S/m
- Flash point (°C)28 °C
- Storage 6 month (°C)8-12 °C
Suitable process chemicals
- RemoverDI-Wasser
REM dissipation of charges
200 nm-squares written on quartz without distortion caused by charges with AR-P 662.04 and AR-PC 5090.02
Process parameters
- Substrate4“ Quarz-Wafer mit AR-P 662.04
- Coating2000 rpm, 60 nm auf E-Beamresist
- Tempering85 °C
Conductivity
Conductivity measurements of AR-PC 5090.02 layers obtained after spin deposition. For thinner films, the resistance increases and the conductivity decreases.
Available order sizes
- 1 x 30 ml (experimental sample)
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 1 x 1 L
- 6 x 1 L
Please contact us for further requests.
CSAR 62 and Electra 92 on glass
30 – 150 nm squares of CSAR 62 on glass
The combination of CSAR 62 with Electra 92 – AR-PC 5090.02 offers the best options to realise complex ebeam structuring processes on glass or semi-insulating substrates like e.g. gallium arsenide. The excellent sensitivity and highest resolution of the CSAR are complemented harmoniously by the conductivity of Electra 92.
PMMA lift-off on glass with Electra 92
200 nm squares produced with 2-layer PMMA lift-off
Initially, the PMMA resist AR-P 669.04 (200 nm thickness) was coated on a quartz substrate and tempered. The second PMMA resist AR-P 679.03 was then applied (150 nm thickness) and tempered, followed by coating with Electra 92. After exposure, Electra 92 was removed with water, the PMMA structures were developed (AR 600-56) and the substrate vaporised with titanium/gold. After a liftoff with acetone, the desired squares remained on the glass with high precision.
Science poster MNE 2016
