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Stopper AR 600-60

For the stopping of e-beam resist film development with solvents

Characterisation

  • immediate interruption of the development process
  • ultrapure solvent mixtures for residue-free removal of remaining developer
  • If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process
    is slowed down.

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Properties

  • Density at 20 °C (g/cm³)
    0,785 g/cm³
  • Water content max. (%)
    0,1 %
  • Flash point (°C)
    12 °C
  • Filtration (μm)
    0,2 µm
  • Storage up to 6 month (°C)
    10-22 °C

Available order sizes

  • 1 x 2.5 L
  • 4 x 2.5 L
  • 8 x 2.5 L

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

Photoresist AR-N 4600 series (Atlas 46)

Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm

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