Thinner AR 300-12
For adjusting the film thickness of photoresists and e-beam resists
You are here: AR-N 42001 / AR-N 43002 / AR-N 44003 / AR-N 44504 / AR-N 46005 / AR-N 74006 / AR-N 75007 / AR-N 75208 / AR-N 7520 neu9 / AR-N 770010 / AR-N 772011 / AR-P 310012 / AR-P 320013 / AR-P 350014 / AR-P 3500T15 / AR-P 370016 / AR-P 380017 / AR-P 530018 / AR-P 590019 / AR-P 650020 / AR-PC 500021 / AR-U 400022 / SX AR-N 4340/723 / SX AR-N 7530/124 / SX AR-N 7730/125 / SX AR-P 3500/626 / SX AR-P 3500/827 / SX AR-P 3740/428 / Thinner29 / X AR-N 7700/3030 / X AR-P 3220/731 / X AR-P 5900/432 / Thinner AR 300-12
Characterisation
- ultra-filtered, colourless, high-purity organic solvent mixtures
- adjustment of resist film thickness by defined dilution
- edge bead removal of coated substrates as well as cleaning of equipment
- removal of photoresist films tempered at up to 150 °C and of non-tempered e-beam resist films
Suitable products
E-Beam Resist AR-N 7500 series
High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C
E-Beam Resist AR-N 7520 new series
Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C
E-Beam Resist AR-N 7520 series
High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C
E-Beam Resist AR-N 7700 series
High-resolution e-beam resists for the production of integrated circuits
E-Beam Resist AR-N 7720 series
AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics
E-Beam Resist AR-P 6510 series
Thick positive resists for the production of microcomponents
Photoresist AR-N 4340 (CAR)
Highly sensitive negative resist for the production of integrated circuits
Photoresist AR-N 4400-05 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm
Photoresist AR-N 4400-10 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm
Photoresist AR-N 4400-25 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4400-50 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4450-10 T (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4600 series (Atlas 46)
Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm
Photoresist AR-P 3110
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3120
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3170
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3210
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3220
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3250
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3510
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3510 T
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3540
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3540 T
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3740
Sensitive positive-tone standard resists for the production of highly integrated circuits
Photoresist AR-P 5320
Sensitive positive-tone resists for the production of evaporation samples
Photoresist AR-P 5350
Sensitive positive-tone resists for the production of evaporation samples
Photoresist SX AR-P 3500/8
Positive photoresist for high-temperature application up to 300 °C
Protective Coating AR-PC 5040
Wafer backside protection during front side etchings for the production of deep structures in silicon
Protective Coatings AR-PC 504
Wafer backside protection during front side etchings for the production of deep structures in silicon
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de