Thinner AR 300-12
For adjusting the film thickness of photoresists and e-beam resists
Characterisation
- ultra-filtered, colourless, high-purity organic solvent mixtures
- adjustment of resist film thickness by defined dilution
- edge bead removal of coated substrates as well as cleaning of equipment
- removal of photoresist films tempered at up to 150 °C and of non-tempered e-beam resist films
Properties
- Main componentPGMEA
- Flash point (°C)42°C
- Water content max. (%)0,1%
- Non-volatiles max. (%)0,002%
Available order sizes
- 1 x 2.5 L
- 4 x 2.5 L
- 8 x 2.5 L
Please contact us for further requests.