Thinner AR 600-07
For adjusting the film thickness of photoresists and e-beam resists
Characterisation
- ultra-filtered, colourless, high-purity organic solvent mixtures
- adjustment of resist film thickness by defined dilution
- edge bead removal of coated substrates as well as cleaning of equipment
Interesting Resist Wiki articles
Properties
- Main componentMethoxypropanol
- Flash point (°C)38°C
- Water content max. (%)0,1%
- Filtration (μm)0,2
- Non-volatiles max. (%)0,002%
Available order sizes
- 1 x 1 L
Please contact us for further requests.