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Thinner AR 600-09

For adjusting the film thickness of photoresists and e-beam resists

Characterisation

  • ultra-filtered, colourless, high-purity organic solvent mixtures
  • adjustment of resist film thickness by defined dilution:
  • edge bead removal of coated substrates as well as cleaning of equipment

Interesting Resist Wiki articles

Properties

  • Main component
    Ethyllactat
  • Flash point (°C)
    46°C
  • Water content max.
    0,1%
  • Filtration (μm)
    0,2
  • Non-volatiles max. (%)
    0,002%

Available order sizes

  • 1 x 1 L

Please contact us for further requests

Suitable products

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

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