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All 244 /Adhesions Promoter 3 /Allresist 0 /AR NEWS 17 /Basic Chemistry 7 /Basics 0 /Bottom Resist 4 /Developer 11 /E-Beam Resist 0 /FAQ 11 /FAQ 20 /General 1 /Home 12 /Home Resist 18 /Image Reversal Resist 8 /Negative 11 /Negative 17 /News 8 /Newspaper Article 2 /Other Resists 14 /Other Resists 12 /Photoresist 0 /Positive 23 /Positive 8 /Press 0 /Process Chemicals 0 /Process Information 4 /Process Procedures 9 /Protective Resist 7 /R&D 2 /R&D Projects 4 /Remover 3 /Resist of the month 27 /Resist Wiki 2 /Scientific Article 3 /Stopper 1 /Thinner 1 /z-SX-AR-PC 5000/41 1 /z_AR 300-12 4 /z_AR 300-26 / 300-35 5 /z_AR 300-40 3 /z_AR 600-01 - 09 1 /z_AR-N 4400 4 /z_AR-N 4600 3 /z_AR-P 3100 2 /z_AR-P 617 1 /z_AR-P 6200 7 /z_AR-P 630-670 1 /z_AR-P-8100 3 /z_AR-PC 5090/91 3 /z_SX AR-N 8200 5 /z_SX AR-P 3500/8 2
1. What are e-beam resists composed of, and how do they work?
23. August 2008/by AllAdmin1. What are photoresists composed of, and how do they work?
21. August 2008/by AllAdmin10. How high is the etch resistance of e-beam resists in the presence of strong acids?
14. August 2008/by AllAdmin10. Which developers are optimal for photoresist, and how do factors like developer concentration and temperature influence the result?
12. August 2008/by AllAdmin11. How can resist coatings be removed again?
11. August 2008/by AllAdmin11. How high is the solvent resistance of e-beam resist films?
13. August 2008/by AllAdmin12. What is the application range of protective coatings?
10. August 2008/by AllAdmin13. How do image reversal resists work?
9. August 2008/by AllAdmin14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?
8. August 2008/by AllAdmin15. How can thick films of > 10 µm be processed in an optimal way?
7. August 2008/by AllAdmin16. Which resolution and which contrast can be obtained with photoresists?
6. August 2008/by AllAdmin17. How high is the plasma etch resistance of photoresists?
5. August 2008/by AllAdmin18. How high is the etch resistance of photoresist in the presence of strong acids?
4. August 2008/by AllAdmin19. Which photoresists are suitable for hydrofluoric acid (HF) etching?
3. August 2008/by AllAdmin2. For how long are e-beam resists stable, and what are the optimal storage conditions?
22. August 2008/by AllAdmin2. For how long are photoresists stable, and what are the optimal storage conditions?
20. August 2008/by AllAdmin20. Howhigh is the solvent resistance of photoresist films?
2. August 2008/by AllAdmin24nd issue of the AR NEWS
21. April 2012/by AllAdmin25 years of Allresist – A reason to celebrate!
16. October 2017/by AllAdmin25th issue of the AR NEWS
21. October 2012/by AllAdmin26th issue of the AR NEWS
21. February 2013/by AllAdmin27th issue of the AR NEWS
21. October 2013/by AllAdmin28th Issue of the AR NEWS
21. May 2014/by AllAdmin29th issue of the AR NEWS
21. October 2014/by AllAdmin2L-Lift-off system AR-P 617 – AR-P 8100
25. April 2018/by AllAdmin3. How may age-related changes influence the quality of a photoresist?
19. August 2008/by AllAdmin3. What is the optimal pre-treatment of substrates for e-beam resist application
21. August 2008/by AllAdmin30th issue of the AR NEWS
21. April 2015/by AllAdmin31st issue of the AR NEWS
21. October 2015/by AllAdmin32nd issue of the AR NEWS
21. April 2016/by AllAdmin33rd issue of the AR NEWS
16. October 2016/by AllAdmin34th issue of the AR NEWS
21. April 2017/by AllAdmin35th special issue of the AR NEWS
21. September 2017/by AllAdmin36th Issue of the AR NEWS
22. October 2017/by AllAdmin37th issue of the AR NEWS
22. April 2018/by AllAdmin38th Issue of the AR NEWS
22. October 2018/by AllAdmin39th Issue of the AR NEWS
22. April 2019/by AllAdmin4. How high is the adhesion strength of e-beam resists to different wafers?
20. August 2008/by AllAdmin4.What is the optimal pre-treatment of substrates for photoresists?
18. August 2008/by AllAdmin40th issue of the AR NEWS
22. October 2019/by AllAdmin5. How are e-beam resists exposed, and how can the optimum exposure dose be determined?
19. August 2008/by AllAdmin5. What are the adhesion features of photoresists on different wafers?
17. August 2008/by AllAdmin6. What are the optimum coating parameters for photoresists in order to achieve good film images?
16. August 2008/by AllAdmin6. Which developers are optimal for e-beam resists, and how do factors like developer concentration and temperature influence the result?
18. August 2008/by AllAdmin7. How can e-beam resist films be removed again?
17. August 2008/by AllAdmin7. Why may air bubbles develop in photoresist films, and how can they be avoided?
15. August 2008/by AllAdmin8. What is the function of the softbake of photoresist films after the coating?
14. August 2008/by AllAdmin8. Which resolutions do e-beam resists achieve?
16. August 2008/by AllAdmin9. How are photo resists exposed, and how can the optimum exposure dose be determined? How long can coated and exposed substrates be stored prior to exposure?
13. August 2008/by AllAdmin9. How high is the plasma etch resistance of e-beam resists?
15. August 2008/by AllAdminAdaptable two-layer resist AR-BR 5460 for variable lift-off structures
21. July 2015/by AllAdminAdditional new experimental developers for AR-P 617
29. September 2016/by AllAdminAdhesion promoter HMDS and diphenylsilanedio (AR 300-80)
28. February 2013/by AllAdminAdhesive strength of AR 300-80
7. October 2013/by AllAdminAgeing of developer
13. July 2012/by AllAdminAlkali-stable and solvent-stable negative resist
16. July 2012/by AllAdminAlkali-stable positive resist obtained after treatment with HMDS
19. January 2016/by AllAdminAlkali-stable, easily structurable positive resist SX AR-P 5900/8
13. June 2014/by AllAdminAlkaline developers for aluminium substrates
20. May 2015/by AllAdminAllresist at the EIPBN 2018 Conference in Puerto Rico
6. June 2018/by AllAdminAllresist auf der MNE und Semicon
10. May 2017/by AllAdminAllresist now offers many solvents in lightweight HDPE bottles
17. February 2017/by AllAdminAllresist presents Medusa 82 at the MNE 2019 in Rhodes
30. September 2019/by AllAdminAllresists neue Produktentwicklungen in den Startlöchern
15. April 2017/by AllAdminAlternatives for NMP-based removers
31. August 2012/by AllAdminAluminium structures developed directly
27. February 2013/by AllAdminApril 2019: Phoenix 81
22. April 2019/by AllAdminAqueous negative resist based on gelatine
13. June 2014/by AllAdminAqueous resist system
7. October 2013/by AllAdminAR-N 7700, 4 µm dick, Proximity-Effekt
27. February 2013/by AllAdminAtlas 46 for e-beam lithography
12. October 2018/by AllAdminAtlas 46 for nanoimprint lithography
15. January 2018/by AllAdminBlack-Protect – stable protective coating for HF and KOH etchings
9. July 2018/by AllAdminBleachable resists
9. July 2018/by AllAdminBOE etching of SiO2 with CSAR 62 mask
13. April 2016/by AllAdminBrandenburger Innovationsfachkräfte
4. April 2017/by AllAdminBrandenburgs Wirtschaftsminister Albrecht Gerber bei Allresist zu Besuch – Photovoltaikanlage verbessert Ökobilanz 2015
11. February 2016/by AllAdminCAR 44 für die E-Beam-Lithographie
12. October 2018/by AllAdminCAR 44 on copper
11. July 2017/by AllAdminChemical dry etching
31. August 2012/by AllAdminChemically amplified, highly sensitive negative e-beam resist SX AR-N 7730/37
13. June 2014/by AllAdminChemically enhanced negative resist (Process parameters and resolution)
9. July 2013/by AllAdminCollapse of extreme high-resolution e-beam resist structures
27. February 2013/by AllAdminColoured negative photoresists
11. October 2017/by AllAdminComposition of photoresist
13. July 2012/by AllAdminConductive coating for e-beamresists
7. October 2013/by AllAdminConductive films
31. August 2012/by AllAdminConductive protective coating for e-beam lithography SX AR-PC 5000/90.2
13. June 2014/by AllAdminConductivity under the application conditions of e-beam lithography
5. October 2015/by AllAdminCross linker
13. July 2012/by AllAdminCSAR 62 = Alternative to ZEP
6. May 2013/by AllAdminCSAR 62 Avoidance of particles during large-area exposures
27. October 2014/by AllAdminCSAR 62 for EUV applications
13. April 2016/by AllAdminCSAR 62 for thick films
11. October 2017/by AllAdminCSAR 62 lift-off for thick layers
27. October 2014/by AllAdminCSAR 62 single layer lift-off system
25. April 2018/by AllAdminCSAR 62 thick layers
27. October 2014/by AllAdminCSAR 62 – Development at low temperatures
5. October 2015/by AllAdminCSAR 62 – Experimental studies on new, sensitive developers
5. October 2015/by AllAdminCSAR structures on glass
5. October 2015/by AllAdminCustomer information Corona virus
15. May 2020/by AllAdminDetermining the conductivity of Electra 92 layers on glass
19. January 2016/by AllAdminDeveloper AR 300-35 for alkali-sensitive substrates
27. October 2014/by AllAdminDeveloper for CSAR 62 (AR-P 6200)
13. June 2014/by AllAdminDevelopment cascade
11. July 2017/by AllAdminDevelopment of thick negative resist layer
7. October 2013/by AllAdminDevelopment procedures
30. July 2012/by AllAdminDiffractive optics with the “analogous“ e-beam resist
27. February 2013/by AllAdminDose-dependent structure size with negative resists
20. May 2015/by AllAdminE-Beam Resist
3. April 2017/by AllAdminEinweihung des neuen 450 m² großen Anbaues zum 26. Firmenjubiläum
16. October 2018/by AllAdminElectra 92 variant optimised for applications on novolac-based resists
5. October 2015/by AllAdminEthanol and toluene-resistant photoresist AR-U 4060
21. July 2015/by AllAdminEurostar-Projekt: PPA-Litho
31. March 2017/by AllAdminEurostar-Projekt: PPA-Litho
31. March 2017/by AllAdminEvaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)
4. July 2016/by AllAdminEvaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)
29. September 2016/by AllAdminExposure
27. February 2013/by AllAdminExtension of the production facilities
29. April 2019/by AllAdminFabrication of vertical flanks with CAR 44
20. January 2017/by AllAdminFachartikel im Magazin für Oberflächentechnik
22. November 2014/by AllAdminFachartikel in der Nanotechnologie (CSAR 62)
22. January 2015/by AllAdminFachartikel in der Nanotechnologie (Electra 92)
12. October 2015/by AllAdminFluorescent resist structures
11. October 2017/by AllAdminFluorescent resist structures with photoresists
25. April 2018/by AllAdminForays through the lithography of microelectronics (Matthias Schirmer)
20. May 2020/by AllAdminFörderung unternehmensWert:Mensch
4. October 2019/by AllAdminForschungsprojekte
4. April 2017/by AllAdminGeneration of undercut structures with negative resists
20. May 2015/by AllAdminGreat success with Medusa 82 at the MNE
28. September 2018/by AllAdminHF etching of GaAs with CSAR 62 masks
13. April 2016/by AllAdminHigh resolution on quartz with Electra 92 on HSQ resists
21. July 2015/by AllAdminHigh-resolution negative e-beam resist
13. July 2012/by AllAdminHigh-resolution PMMA one layer resist
31. August 2012/by AllAdminHighly sensitive e-beam resist AR-P 617 (PMMA-copolymer)
13. April 2016/by AllAdminImproved protective coating SX AR-PC 5000/31
13. June 2014/by AllAdminInnovative new development at the MNE 2017
28. September 2017/by AllAdminInterference lithography
4. July 2016/by AllAdminJanuary 2020: Black resist SX AR-N 8355/7
25. February 2020/by AllAdmin
January 2021: Optimised process for negative photoresist Atlas 46
20. January 2021/by uschirmer