Raster scan principle is a procedure in which the electron beam is led line by line over the exposure area, comparable to the beam guidance in an electron microscope. The structures are exposed by switching the electron beam on and off while continuously moving the substrate (XY regulation).
The vector scan principle needs shorter process times and, in contrast to the raster scan method, the electron beam is systematically led onto the areas meant to be exposed and writing in a waved or spiral movement. After exposure in the deflecting field, the X-Y-table moves on to the next defined position.
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