During the exposure and subsequent development of large structures (> 1 µm), occasionally particles are deposited on fully developed surfaces; a phenomenon which is not observed for small structures. This effect can be eliminated if after development at first a brief rinsing in MIBK or PMMA developer AR 600-56 or AR 600-55 is carried out. Thereafter, stopper AR 600-60 should be used as usual.
Another preventive option is to choose a higher exposure dose of approximately 20 % for large structures. The higher dose removes all particles and development can be performed as usual.
Overview E-beam positive