Novolac-based e-beam resists have other surface properties than e.g. CSAR 62, PMMA, or HSQ resists. Due to a higher solvent content of the conductive resist as for example is the case with SX AR-PC 5000/90.2, these novolac-resists are already moderately attacked. Therefore, SX AR-PC 5000/91.1 was designed which is characterised by improved coating properties for the coating of e-beam resists such as AR-N 7520, AR-N 7700, or AR-P 7400.
60 – 150 nm squares of AR-N7700.08 (100 nm height) on glass
AR-N 7700.08 as shown in the figure was spin-deposited on glass, dried, coated with SX AR-PC 5000/91.1, and baked at 50 °C. After exposure, the Electra 92 layer was removed with water (2 x 15 seconds) and the e-beam resist subsequently developed. This resulted in a resolution of approximately up to 60 nm which is a very good value for a chemically enhanced resist.