As an alternative to the polyhydroxystyrene negative resist, a CAR negative resist based on the copolymer poly(hydroxystyrene- co -MMA) was designed which can also be developed under aqueous-alkaline conditions. The resist is stable up to temperatures of approximately 300°C and thus also well suited for the generation of high-temperature stable structure. Similar to polyhydroxystyrenes, this resist is characterised by good insulating properties and a high thermal resistance. Resist layers of PSOH co MMA show only very low moisture absorption from the air.
Overview Photoresists- Negative