The protective coatings AR-PC 503 and AR-PC 504 have been successfully used for many years in aggressive KOH etching procedures. These resists are traditionally produced with the solvent chlorobenzene. Motivated to not only offer the best quality, but also the highest possible level of health protection for our users, now a PMMA resist with the safer solvent anisole was designed.
First in-house tests demonstrated that the excellent protective effect of the PMMA layer is retained even in anisole, only the good adhesion properties to different customer substrates still have to be experimentally confirmed. Samples of SX AR-PC 5040/1 are currently being tested by users.