A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography). This procedure uses scattering masks with a sheet that is partly transparent for electrons. Due to the interposed mask, certain parts of the electron beam are shadowed. The scattering layer strongly deflects incident electrons. A great advantage of this procedure as compared to electron absorption is less loading and less heating of the mask.
Overview E-beam Other Resists