The new, highly insulating protective coating SX AR-PC 5060 F-Protect represents a good alternative to the well-known resist Cytop®.
The resist consists of an amorphous perfluorinated copolymer, dissolved in a solvent mixture of perfluorotri-n-butylamine and perfluoro-n-dibutylmethylamine (Fluorinert™ FC-40). Resist layers are characterized by a low refractive index, very high optical transparency, excellent insulating properties and an excellent stability against solvents and etching media. In particular the very good insulating properties and the high thermal stability (dissociation of the polymer occurs only above approx. 350 °C) are crucial properties for a use in organic field-effect transistors.
Fig. 1: Schematic structure of an organic field effect transistor (OFET) with SX AR-PC 5060
Fig. 2: Characteristic curves of an OFET, top-gate based on TIPS-pentacene with SX AR PC 5060 as insulating layer; stable up to VGS = -160 V.