{"id":9007,"date":"2019-10-04T20:45:36","date_gmt":"2019-10-04T19:45:36","guid":{"rendered":"https:\/\/www.allresist.de?page_id=9007"},"modified":"2020-04-07T13:39:14","modified_gmt":"2020-04-07T12:39:14","slug":"rd-projects","status":"publish","type":"page","link":"https:\/\/www.allresist.com\/rd\/rd-projects\/","title":{"rendered":"R&#038;D Projects"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-c0bgq7-ae364452dfbda4c5625490ca579ff810\">\n.avia-section.av-c0bgq7-ae364452dfbda4c5625490ca579ff810{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-c0bgq7-ae364452dfbda4c5625490ca579ff810 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-9007'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-aaz69r-179ceaf3ff11d7b8c69a81bf0c257ca3\">\n.flex_column.av-aaz69r-179ceaf3ff11d7b8c69a81bf0c257ca3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-aaz69r-179ceaf3ff11d7b8c69a81bf0c257ca3 av_two_third  avia-builder-el-1  avia-builder-el-no-sibling  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8md8vz-0259b2ab475a4148c2a4dffb9a54f1bd '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/CreativeWork\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>R&amp;D Projects<\/h1>\n<\/div><\/section><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-735i8v-9977a38257e3c5c09116517b7cdc159d main_color avia-section-default avia-no-shadow  avia-builder-el-3  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-9007'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-62f9xr-3841333f52d7a9d7c8f3ddc8b77010ab\">\n.flex_column.av-62f9xr-3841333f52d7a9d7c8f3ddc8b77010ab{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-62f9xr-3841333f52d7a9d7c8f3ddc8b77010ab av_one_full  avia-builder-el-4  el_before_av_hr  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-3momin-c375c3278c2bac69198f7d311150c33a '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/CreativeWork\" ><div class='avia_textblock'  itemprop=\"text\" ><p>We have preserved the joy and amazement that comes with discovering the fascinating world of the nanocosmos which we explore during our research activities. Last but not least is it this joy which drives to us to scientific excellence. For this, our customers are an important driving force.<\/p>\n<p>Since the beginning we could, together with our partners, successfully cimplement this strategy in more than 35 scientific cooperative projects.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-k8pw2cb4-d48e8695ab61abbf90193cd3fe345508\">\n#top .hr.hr-invisible.av-k8pw2cb4-d48e8695ab61abbf90193cd3fe345508{\nheight:50px;\n}\n<\/style>\n<div  class='hr av-k8pw2cb4-d48e8695ab61abbf90193cd3fe345508 hr-invisible  avia-builder-el-6  el_after_av_one_full  el_before_av_textblock '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div>\n<section  class='av_textblock_section av-3momin-c375c3278c2bac69198f7d311150c33a '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/CreativeWork\" ><div class='avia_textblock'  itemprop=\"text\" ><h2>Completed scientific projects of the Allresist GmbH<\/h2>\n<p><strong>2015-2016 BMBF funding measure \u201cTwenty 20 \u2013 Partnership for Innovation\u201d: Smart Processes \u2013 Process Technologies for Smart Materials<\/strong><\/p>\n<p>Cooperation partners: Allresist GmbH, Fraunhofer IWU, Dresden, Fraunhofer IAP, Potsdam, Back Stickers, Waltershausen, Festo AG &amp; Co. KG, Esslingen<\/p>\n<p>Target: The aim is the development of marketable products which utilise so-called smart materials for energy conversion (sensory and\/or actuators). In the long term, a paradigm shift in the design of mechatronic products is intended. Allresist is cooperation partner in a subproject concerned with the evaluation and characterisation of procedures for the manufacture of dielectric elastomer stack actuators. The mail focus of Allresist is the manufacturing of conductive polymer electrodes.<\/p>\n<p><strong>2014-2017 Eurostar Project:\u00a0PPA-Litho \u2013 Commercially available resist materials based on poly(phthalaldehydes) for extended lithography applications<\/strong><\/p>\n<p>Cooperation partners: Allresist GmbH, SwissLitho AG (Zurich, Switzerland), Institute for Thin Film Technology and Micro Sensors (Teltow), JOANNEUM RESEARCH Forschungsgesellschaft mbH (Graz, Austria), Aglycon Dr. Spreitz KG (Allerheiligen, Austria)<\/p>\n<p>Target: Development and subsequent production of thermally structurable resists on the basis of poly(phthalaldehydes) for NanoFrazor technology (analogous to e-beam technology).<\/p>\n<p><strong>2013 \u2013 2014 <\/strong><strong>Project \u201eVEGAS \u2013 Methods and equipment for electronic printable cards with safety attributes, development functional structure resists\u201d<\/strong><\/p>\n<p>Main cooperation partner: Firma L\u00fcth &amp; D\u00fcmchen, Berlin; Technische Universit\u00e4t Berlin; FhG Institut f\u00fcr angewandte Polymerforschung.<\/p>\n<p>Target: Smartcards with visual ascertainable information by using of special photoresists.<\/p>\n<p><strong>2012 \u2013 2014 <\/strong><strong>Project \u201eINNOPEP \u2013 Covering of innovation success in product development and production\u201d<\/strong><\/p>\n<p>Main cooperation partner: InMediasP GmbH, Hennigsdorf, ASG Luftfahrttechnik und Sensorik GmbH, Weinheim, BEAR M\u00fchlen &amp; Beh\u00e4lter GmbH, Berlin, Berliner Glas KGaA, Berlin, Fraunhofer-Institut f\u00fcr Produktionsanlagen und Konstruktionstechnik (IPK), Berlin, INPRO mbH, Berlin, MaTec Gummiwerk GmbH, Schwielowsee, Pumacy Technologies AG, Bernburg, TU Berlin, Universit\u00e4t Augsburg, CEPRA.<\/p>\n<p>Target: Development of application scenarios, assessment, validation, introduction and distribution<\/p>\n<p><strong>2013<\/strong> <strong>Innovation voucher: \u201eDevelopment and synthesis of tailor made electric conductive polymers as resist component for the mask production in the nanometer range\u201d<\/strong><\/p>\n<p>Main cooperation partner: Institut f\u00fcr D\u00fcnnschichttechnologie und Mikrosensorik, Teltow.<\/p>\n<p>Target: Electric conductive resist layer fort he e-beam lithography<\/p>\n<p><strong>2012 <\/strong><strong>Innovation voucher: \u201eSynthesis of structure optimized copolymers for the application in innovative e-beamresists\u201d<\/strong><\/p>\n<p>Main cooperation partner: Institut f\u00fcr D\u00fcnnschichttechnologie und Mikrosensorik, Teltow.<\/p>\n<p>Target: Alternative to the ZEP-resist \u2013 development oft he CSAR 62<\/p>\n<p><strong>2011 Innovation voucher:\u00a0\u201eDevelopment and synthesis tailor made Bisazide for innovating photoresists for laser direct exposures &gt; 400 nm wavelength\u201d<\/strong><\/p>\n<p>Main cooperation partner: Institut f\u00fcr D\u00fcnnschichttechnologie und Mikrosensorik, Teltow.<\/p>\n<p>Target: Innovative photoresists for laser direct exposures &gt; 400 nm wavelength<\/p>\n<p><strong>2009 \u2013 2011 Project:\u00a0\u201eDevelopment of cross linked Epoxystyrene for OLED- OFET- and Microstructur-Applications\u201c<\/strong><\/p>\n<p>Cooperation partner: Fraunhofer Institut f\u00fcr Angewandte Polymerforschung, Golm<\/p>\n<p><strong>2006 \u2013 2008\u00a0 Project: \u201eDevelopment of a simplified procedure for the patterning of silicon and silicon oxide, respectively, using wet-chemical methods\u201c\u00a0<\/strong><\/p>\n<p>Cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.<\/p>\n<p>Target: Resist systems for hydrofluoric acid- and KOH-etching in glass and silicon, respectively.<\/p>\n<p><strong>2006 \u2013 2008 Project: \u201cNano-structures using lift-off-techniques\u201c\u00a0<\/strong><\/p>\n<p>Cooperation partner: Physical Institute, Bavarian Julius-Maximilians-University, W\u00fcrzburg<\/p>\n<p>Target: Sub-50-nm-structures using lift-off-techniques<\/p>\n<p><strong>2004 \u2013 2006 Project:\u00a0\u201cResists for the LIGA and microsystem technology\u201c\u00a0<\/strong><\/p>\n<p>Cooperation partner: Bessy GmbH, Berlin<\/p>\n<p>Target: Resist structures with a film size of up to 500 \u00b5m<\/p>\n<p><strong>2004 \u2013 2006 Project:\u00a0\u201cResists for OLED photo patterning\u201d\u00a0<\/strong><\/p>\n<p>Cooperation partner: FhG Institute for Applied Polymer Research, Golm<\/p>\n<p>Target: Patterning of OLEDs<\/p>\n<p><strong>2002 \u2013 2004 Project:\u00a0\u201cCharacterisation and production of functional films allowing orientation\u201c\u00a0<\/strong><\/p>\n<p>Cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.<\/p>\n<p>Target: Orientation films for displays<strong>\u00a0<\/strong><\/p>\n<p><strong>2001 \u2013 2004 Project:\u00a0\u201cNegative resist for MST\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: Bessy GmbH and CiS Erfurt<\/p>\n<p>Target: Negative resists for the microsystem technology<\/p>\n<p><strong>2001 \u2013 2002 Project:\u00a0\u201cPhotoresists for special applications in micro patterning\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: CiS, Centre for Intelligent Sensors, Erfurt<\/p>\n<p>Target: Thick photoresist films for the microsystem technology<\/p>\n<p><strong>2000 \u2013 2002 Project:\u00a0\u201cThermo-stable resists\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.<\/p>\n<p>Target: Thermostable protective coatings for microelectronic applications<\/p>\n<p><strong>1999-2000 Project:\u00a0\u201cPhoto-polymerizable passive coating for screen printing\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: Fraunhofer Institute Reliability and Microintegration, Teltow<\/p>\n<p>Target: Photo-polymerizable passive coating for high precision resistors<\/p>\n<p><strong>1998 \u2013 1999 Project: \u201cElectron beam analogue resist\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: University of Joensuu, Finland<\/p>\n<p>Target: Manufacturing of three-dimensional resist structures for diffractive optics<\/p>\n<p><strong>1997 \u2013 1999 Project: \u201cActivated photoresists for the additive forming of strip conductors\u201c<\/strong><\/p>\n<p>Main cooperation partner: TU Dresden, Institute for Microsystem Technology<\/p>\n<p>Target: Manufacturing of flexible strip conductors via electro-plating of resist structures<\/p>\n<p><strong>1995 \u2013 1998 Project: \u201cResists for eximer laser\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: CiS Erfurt<\/p>\n<p>Target: Resists for eimer laser<\/p>\n<p><strong>1995 \u2013 1996 Project: \u201cMask resists\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: robotron Meiningen GmbH, Advanced Mask Technology Centre Dresden GmbH<\/p>\n<p>Target: New resist for the production of masks<\/p>\n<p><strong>1995 \u2013 1996 Project: \u201cResist materials for the nanolithography\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.<\/p>\n<p>Target: Defect-free layers of resist materials for nano-structures<\/p>\n<p><strong>1994 \u2013 1996 Project: \u201cMultiprocessing resist\u201c\u00a0<\/strong><\/p>\n<p>Main cooperation partner: Institute for Semiconductor Physics, Frankfurt\/O.<\/p>\n<p>Target: Resist for mix &amp; match technology e-beam \/ photolithography<\/p>\n<p><strong>1993 \u2013 1994 Taking-over of the project \u201cElster\u201c from the \u201cFotochemische Werke\u201c<\/strong><\/p>\n<p>Main cooperation partner: Institute for Semiconductor Physics, Frankfurt\/O.<\/p>\n<p>Target: Dry-developing e-beam resist<\/p>\n<\/div><\/section>\n\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":1,"featured_media":0,"parent":8513,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"yoast_head":"<!-- This site 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