{"id":10358,"date":"2012-07-13T13:10:36","date_gmt":"2012-07-13T13:10:36","guid":{"rendered":"https:\/\/www.allresist.depost\/ebeamresist-negativ-hochaufloesend-eb\/"},"modified":"2022-05-24T11:16:43","modified_gmt":"2022-05-24T10:16:43","slug":"resist-wiki-high-resolution-negative-e-beam-resist","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/","title":{"rendered":"High-resolution negative e-beam resist"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-239h2k-01bc4a0f7457fd80ab0ae2e26ea41c52\">\n.avia-section.av-239h2k-01bc4a0f7457fd80ab0ae2e26ea41c52{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-239h2k-01bc4a0f7457fd80ab0ae2e26ea41c52 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-10358'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1w0s1g-0bd76117f054292d40149fa0cf2c3688\">\n.flex_column.av-1w0s1g-0bd76117f054292d40149fa0cf2c3688{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1w0s1g-0bd76117f054292d40149fa0cf2c3688 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1rgk04-1cd9c498f851d84f3ebfd74e719c0ebd '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>High-resolution negative e-beam resist<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1ml9tg-5434b9115d7a09d9b4fe30822246609f\">\n.flex_column.av-1ml9tg-5434b9115d7a09d9b4fe30822246609f{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1ml9tg-5434b9115d7a09d9b4fe30822246609f av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1e4t64-76d7c2475c1a745d4a58397e720e6629  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-1apsxg-6dca2c5e45b44e7aaca86eb250e64b21 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-10358'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-15e9v8-beaadf18d9430a63f22022264fb6c0eb\">\n.flex_column.av-15e9v8-beaadf18d9430a63f22022264fb6c0eb{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-15e9v8-beaadf18d9430a63f22022264fb6c0eb av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-zb7ak-253066db6b6409377fa7ef51823b74cb '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography. Chemically enhanced e-beam resists may meet all demands for a high sensitivity, but so far allow only a resolution of &gt; 100 nm. PMMA resists and non-chemically enhanced e-beam resists (e.g. AR-N 7500 or AR-N 7520 ) have the potential to achieve resolutions of &lt; 30 nm, but these resists are not sensitive enough and require uneconomically long writing times. The long-term research concept of the Allresist is strongly aimed at the development of economical high-resolution e-beam resists.<\/p>\n<p>Resist AR-N 7520new (former SX AR-N 7520\/4) was presented on the MNE 2010 in Geneva which possessed a sevenfold higher sensitivity as compared to the standard resist AR-N 7520 ( see 21st AR NEWS ). Continuing our recent developments since 2011, new synthetic cross-linkers were tested which resulted in a small further increase of sensitivity. In single measurements, a line width of less than 30 nm was confirmed (see figure).<\/p>\n<p><strong><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-1055\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-253x190.jpg\" alt=\"Hochaufloesender_Negativ_Ebeam\" width=\"253\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-253x190.jpg 253w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-533x400.jpg 533w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg 1024w\" sizes=\"(max-width: 253px) 100vw, 253px\" \/><\/a><\/strong><\/p>\n<p>Fig. 1: 29 nm-ridge with experimental sample SX AR-N 7520\/15.2.<\/p>\n<p>A further advantage is the improved solubility in the resist solvent. A higher solid matter content allows the production of films with higher thicknesses. Special applications for electron-beam lithography up to a film thickness of 5 \u00b5m can thus be realized with these resists.<\/p>\n<p>It is commonly known that smaller structures require higher exposure doses. This also became evident in our investigations. For a structural width of 5 \u00b5m, only a dose of approx. 15 \u00b5C\/cm\u00b2 (30 kV) was required. For 100 nm-lines, the required dose ranged from 30 \u2013 50 \u00b5C\/cm\u00b2 for the three samples.<\/p>\n<p>Application features of the new resist are significantly improved as compared to the parameters of our standard resist AR-N 7520 . We therefore intend to replace the standard e-beam resist with this new development. Users are already now invited to test the new resists before the standard resist is replaced.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-pvqm4-4cb645b1ce4e46643fea9c7ad05f77d6\">\n.flex_column.av-pvqm4-4cb645b1ce4e46643fea9c7ad05f77d6{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-pvqm4-4cb645b1ce4e46643fea9c7ad05f77d6 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-m4uwk-62872320d1b643ba088423babe894523 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-e6hho-af1c6874c445a47d26f582652c2854f9\">\n#top .hr.hr-invisible.av-e6hho-af1c6874c445a47d26f582652c2854f9{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-e6hho-af1c6874c445a47d26f582652c2854f9 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-7ljec-e7728d41bc02a567d813b4c5ae95aa70  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-16859 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-02T12:16:20+01:00\" >2. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/high-resolution-negative-e-beam-resist-ar-n-7520-17new-for-etching-application\/' title='Link to: High-resolution negative e-beam resist AR-N 7520.17new for etching application'>High-resolution negative e-beam resist AR-N 7520.17new for etching application<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8121 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:04:27+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-for-euv-applications\/' title='Link to: Medusa 82 for EUV applications'>Medusa 82 for EUV applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8120 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:59:16+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/' title='Link to: Medusa 82: Influence of post exposure bake (PEB)'>Medusa 82: Influence of post exposure bake (PEB)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8119 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:55:00+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/' title='Link to: Medusa 82 with photoacid generator (PAG)'>Medusa 82 with photoacid generator (PAG)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8114 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:49:05+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-the-alternative-to-hsq-resists-storage-stability\/' title='Link to: Medusa 82 \u2013 the alternative to HSQ-resists, storage stability'>Medusa 82 \u2013 the alternative to HSQ-resists, storage stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5906 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:50:18+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-utilising-electra-92-for-sem-applications\/' title='Link to: Utilising Electra 92 for SEM applications'>Utilising Electra 92 for SEM applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4522 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:21:16+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-amplified-highly-sensitive-negative-e-beam-resist-sx-ar-n-7730-37\/' title='Link to: Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37'>Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4516 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:17:37+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ratio-resolution-and-dose-exemplarily-shown-for-e-beam-resist-sx-ar-n-7530-1\/' title='Link to: Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1'>Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:30:12+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/' title='Link to: AR-N 7700, 4 \u00b5m thick, proximity effect'>AR-N 7700, 4 \u00b5m thick, proximity effect<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10365 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:23:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-diffractive-optics-with-the-analogous-e-beam-resist\/' title='Link to: Diffractive optics with the \u201canalogous\u201c e-beam resist'>Diffractive optics with the \u201canalogous\u201c e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:10:36+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/' title='Link to: High-resolution negative e-beam resist'>High-resolution negative e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T08:46:02+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/' title='Link to: Sensitive, etch-stable negative e-beam resist for processes without yellow light'>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography. <\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[105],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - 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class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/\",\"name\":\"Resist-Wiki: High-resolution negative e-beam resist\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-253x190.jpg\",\"datePublished\":\"2012-07-13T13:10:36+00:00\",\"dateModified\":\"2022-05-24T10:16:43+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg\",\"width\":1024,\"height\":768},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"High-resolution negative e-beam resist\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - Strausberg, Germany\",\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.allresist.com\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"en-GB\"},{\"@type\":\"Person\",\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\",\"name\":\"AllAdmin\",\"url\":\"https:\/\/www.allresist.com\/author\/alladmin\/\"}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Resist-Wiki: High-resolution negative e-beam resist","description":"A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/","og_locale":"en_GB","og_type":"article","og_title":"Resist-Wiki: High-resolution negative e-beam resist","og_description":"A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography.","og_url":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/","og_site_name":"Allresist EN","article_published_time":"2012-07-13T13:10:36+00:00","article_modified_time":"2022-05-24T10:16:43+00:00","og_image":[{"url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-253x190.jpg"}],"author":"AllAdmin","twitter_misc":{"Written by":"AllAdmin","Estimated reading time":"5 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/","url":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/","name":"Resist-Wiki: High-resolution negative e-beam resist","isPartOf":{"@id":"https:\/\/www.allresist.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage"},"image":{"@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage"},"thumbnailUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam-253x190.jpg","datePublished":"2012-07-13T13:10:36+00:00","dateModified":"2022-05-24T10:16:43+00:00","author":{"@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8"},"description":"A process-stable, sufficiently sensitive e-beam resist with a resolution of about 30 nm is urgently needed to accelerate the progress in electron beam lithography.","breadcrumb":{"@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#breadcrumb"},"inLanguage":"en-GB","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/"]}]},{"@type":"ImageObject","inLanguage":"en-GB","@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#primaryimage","url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg","contentUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/hochaufloesender_negativ_ebeam.jpg","width":1024,"height":768},{"@type":"BreadcrumbList","@id":"https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.allresist.com\/home\/"},{"@type":"ListItem","position":2,"name":"High-resolution negative e-beam resist"}]},{"@type":"WebSite","@id":"https:\/\/www.allresist.com\/#website","url":"https:\/\/www.allresist.com\/","name":"Allresist EN","description":"ALLRESIST GmbH - Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8","name":"AllAdmin","url":"https:\/\/www.allresist.com\/author\/alladmin\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/10358"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=10358"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/10358\/revisions"}],"predecessor-version":[{"id":17393,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/10358\/revisions\/17393"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=10358"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=10358"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=10358"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}