{"id":10359,"date":"2012-07-13T08:46:02","date_gmt":"2012-07-13T08:46:02","guid":{"rendered":"https:\/\/www.allresist.depost\/ebeamresist-negativ-negativ-eb-ohnegelblicht\/"},"modified":"2022-03-01T10:56:54","modified_gmt":"2022-03-01T09:56:54","slug":"resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/","title":{"rendered":"Sensitive, etch-stable negative e-beam resist for processes without yellow light"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-24lyfx-412dcf162eefaf1fc4d57da47032d533\">\n.avia-section.av-24lyfx-412dcf162eefaf1fc4d57da47032d533{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-24lyfx-412dcf162eefaf1fc4d57da47032d533 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-10359'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1z2plp-0d89558f10b9fc49088e5b9d36be52f3\">\n.flex_column.av-1z2plp-0d89558f10b9fc49088e5b9d36be52f3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1z2plp-0d89558f10b9fc49088e5b9d36be52f3 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1rtvxx-1d674867c4d34b7f91bc5227e2348967 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1jui9h-f76a2cf1486ddabd11962ee98a87fa84\">\n.flex_column.av-1jui9h-f76a2cf1486ddabd11962ee98a87fa84{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1jui9h-f76a2cf1486ddabd11962ee98a87fa84 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1dondp-b0beebc83dcd9fda42e48ed8064a3a12  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-1a5lb1-b540987f010b955b294836f2f41ac478 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-10359'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-10sog5-6e60ba6b5db147dcef295bc73fe3182d\">\n.flex_column.av-10sog5-6e60ba6b5db147dcef295bc73fe3182d{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-10sog5-6e60ba6b5db147dcef295bc73fe3182d av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-32kvx-e7f29e61babebae6fbe13cdda38c9d9c '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>The success story of electron beam lithography began in the 1980th with the development of the first PMMA resists. These resists are absolutely light-insensitive in the UV-wavelength range above 300 nm. Clean rooms in which e-beam lithography is performed with PMMA resists require therefore no yellow light.<\/p>\n<p>We have already frequently been asked by e-beam users to also provide negative-tone resists which can be processed under white light conditions. Our negative e-beam resists of the series 7500 \u2013 7700 are all also sensitive in the broadband UV (300 \u2013 405 nm).<\/p>\n<p>These resists are thus well suited for mix&amp;match technologies (e-beam- and UV-lithography in a single process), but absolutely require yellow light. Employing new acid generators which are characterized by a UV-absorption &lt; 280 nm, we developed the chemically enhanced e-beam resist SX AR-N 7700\/46 which can also be processed under daylight conditions.<\/p>\n<p>Wafers coated with SX AR-N 7700\/46 were openly placed in a white-light lab for several hours and then exposed and developed together with resist-coated wafers not subjected to daylight conditions before. Sensitivity and gradation were identical in both test series.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-qfi19-64e27ab76c7a3da6b67d68355a80fe1d\">\n.flex_column.av-qfi19-64e27ab76c7a3da6b67d68355a80fe1d{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-qfi19-64e27ab76c7a3da6b67d68355a80fe1d av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-7rhx-b3aa91310d37e9f6d0637d15ba0ebb54 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1obh1-1295a612fda35422f412bd2fd663e9d2\">\n#top .hr.hr-invisible.av-1obh1-1295a612fda35422f412bd2fd663e9d2{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-1obh1-1295a612fda35422f412bd2fd663e9d2 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-90sb1-05aab7e689687d4c7b4c88254d0ae5ee  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-16859 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-02T12:16:20+01:00\" >2. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/high-resolution-negative-e-beam-resist-ar-n-7520-17new-for-etching-application\/' title='Link to: High-resolution negative e-beam resist AR-N 7520.17new for etching application'>High-resolution negative e-beam resist AR-N 7520.17new for etching application<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8121 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:04:27+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-for-euv-applications\/' title='Link to: Medusa 82 for EUV applications'>Medusa 82 for EUV applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8120 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:59:16+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/' title='Link to: Medusa 82: Influence of post exposure bake (PEB)'>Medusa 82: Influence of post exposure bake (PEB)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8119 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:55:00+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/' title='Link to: Medusa 82 with photoacid generator (PAG)'>Medusa 82 with photoacid generator (PAG)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8114 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:49:05+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-the-alternative-to-hsq-resists-storage-stability\/' title='Link to: Medusa 82 \u2013 the alternative to HSQ-resists, storage stability'>Medusa 82 \u2013 the alternative to HSQ-resists, storage stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5906 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:50:18+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-utilising-electra-92-for-sem-applications\/' title='Link to: Utilising Electra 92 for SEM applications'>Utilising Electra 92 for SEM applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4522 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:21:16+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-amplified-highly-sensitive-negative-e-beam-resist-sx-ar-n-7730-37\/' title='Link to: Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37'>Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4516 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:17:37+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ratio-resolution-and-dose-exemplarily-shown-for-e-beam-resist-sx-ar-n-7530-1\/' title='Link to: Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1'>Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:30:12+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/' title='Link to: AR-N 7700, 4 \u00b5m thick, proximity effect'>AR-N 7700, 4 \u00b5m thick, proximity effect<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10365 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:23:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-diffractive-optics-with-the-analogous-e-beam-resist\/' title='Link to: Diffractive optics with the \u201canalogous\u201c e-beam resist'>Diffractive optics with the \u201canalogous\u201c e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:10:36+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/' title='Link to: High-resolution negative e-beam resist'>High-resolution negative e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T08:46:02+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/' title='Link to: Sensitive, etch-stable negative e-beam resist for processes without yellow light'>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>The success story of electron beam lithography began in the 1980th with the development of the first PMMA resists. These resists are absolutely light-insensitive in the UV-wavelength range above 300 nm.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[105],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/title>\n<meta name=\"description\" content=\"The success story of electron beam lithography began in the 1980th with the development of the first PMMA resists.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Sensitive, etch-stable negative e-beam resist for processes without yellow light\" \/>\n<meta property=\"og:description\" content=\"The success story of electron beam lithography began in the 1980th with the development of the first PMMA resists.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2012-07-13T08:46:02+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-03-01T09:56:54+00:00\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/\",\"name\":\"Sensitive, etch-stable negative e-beam resist for processes without yellow light\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"datePublished\":\"2012-07-13T08:46:02+00:00\",\"dateModified\":\"2022-03-01T09:56:54+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"The success story of electron beam lithography began in the 1980th with the development of the first PMMA resists.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Sensitive, etch-stable negative e-beam resist for processes without yellow light\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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