{"id":17350,"date":"2022-05-19T11:02:40","date_gmt":"2022-05-19T10:02:40","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17350"},"modified":"2022-05-19T11:12:50","modified_gmt":"2022-05-19T10:12:50","slug":"top-surface-imaging-photoresist-principles","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/","title":{"rendered":"Top surface imaging (TSI) photoresist &#8211; principles"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kufpd4-3d3c1991cf20512a244f12d0179c342b\">\n.avia-section.av-kufpd4-3d3c1991cf20512a244f12d0179c342b{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kufpd4-3d3c1991cf20512a244f12d0179c342b main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17350'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jhml6w-d9e1a0f01e53431de60ae20145ad1d86\">\n.flex_column.av-jhml6w-d9e1a0f01e53431de60ae20145ad1d86{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jhml6w-d9e1a0f01e53431de60ae20145ad1d86 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-h4o160-782dd7041bc601dd2e2a92f71789e6da '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p style=\"margin: 0in;font-family: Calibri;font-size: 17.0pt\">Top surface imaging (TSI) photoresist &#8211; principles<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1it9l4-503a0ac5cbc4280bca4cb48955101f5c\">\n.flex_column.av-1it9l4-503a0ac5cbc4280bca4cb48955101f5c{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1it9l4-503a0ac5cbc4280bca4cb48955101f5c av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-e1c6rc-f3c7f2f7cd7a87ab511b9d1d98f597f0  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-c5bubs-4de3c249a9ece4bb4848d44411273354 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17350'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-bi2v5k-b8a99257590c17d3b2bcf63af8c59607\">\n.flex_column.av-bi2v5k-b8a99257590c17d3b2bcf63af8c59607{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-bi2v5k-b8a99257590c17d3b2bcf63af8c59607 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8ht6so-f8d53e3a54d88755f334ec0554862cd4 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Roland and Coopmans (Proc. SPIE 631, 34 (1986)) intensively studied the fundamentals of the top surface imaging technology which is based on a selective resist silylation process (DESIRE process). A positive photoresist specifically optimised for this purpose with considerably increased content of light-sensitive components (LSCs) is exposed image-wise. In exposed areas, indene carboxylic acid is formed from naphthoquinone diazide (LSC; see Wiki Photosensitive components). At the same time, the inhibitory effect of the LSCs protecting the OH-groups of the novolac is reversed (see Wiki Photosensitive components. If now a gas-phase silylation of the surface is performed, organosilicon components (for example HMDS) penetrate the resist layer in irradiated areas and react with exposed OH groups of the novolac. In unexposed areas however, the protection due to the inhibitory effect is still maintained and HMDS is not able to diffuse into the layer. If then an oxygen plasma etching step is carried out, non-volatile silicon oxides (SiOx) are formed in exposed structures (silicon-containing), while volatile oxidation products are formed in non-silylated regions. The resist is consequently removed in these places (dry development of the resist). Since the exposed areas remain, the resist works as negative-tone resist.<\/p>\n<p>It is already sufficient for this process if the organosilicon compound penetrates only 100-200 nm deep into the exposed areas. The resulting SiOx mask of this depth is enough to completely develop also significantly thicker photoresist layers. A high resolution can be achieved due to this thin structure imaging on the surface (top surface imaging). Likewise, a coating and at the same time planarization of topologically structured substrates is very well possible since the imaging process takes only place on the surface. A development with oxygen plasma can easily remove the different layer thicknesses (topologies). This system is furthermore suitable for highly reflective substrates (e.g. aluminium) since no complete exposure down to the bottom is required.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17351\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/a.png\" alt=\"\" width=\"227\" height=\"168\" \/><\/p>\n<p>Plasma-developed structures on topologies<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17352\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/b.png\" alt=\"\" width=\"225\" height=\"169\" \/><\/p>\n<p>SiOx mask of SX AR-N 7100\/2<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17353\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/c.jpg\" alt=\"\" width=\"190\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/c.jpg 190w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/c-80x80.jpg 80w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/c-36x36.jpg 36w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/c-180x180.jpg 180w\" sizes=\"(max-width: 190px) 100vw, 190px\" \/><\/p>\n<p>Resist lines after O2-RIE development over aluminum structures with SX AR-N 7100<\/p>\n<p>Allresist now developed a TSI photoresist. Negative resist SX AR-N 7100\/2 is a safer solvent-based experimental sample suitable for g- and i-line lithography. After image-wise exposure and gas phase silylation, the resist mask is developed plasma-chemically (O2-plasma). The handling process comprises the following steps:<\/p>\n<ul>\n<li>Spin coating<\/li>\n<li>Tempering (100 \u00b0C bis 130 \u00b0C)<\/li>\n<li>Exposure (436 nm, 365 nm)<\/li>\n<li>Pre-tempering silylation (175 \u00b0C for HMDS respectively 110 \u2013 130 \u00b0C for TMDS)<\/li>\n<li>Gas phase silylation (165 \u00b0C for HMDS respectively 110 \u2013 130 \u00b0C for tetramethyldisilazane)<\/li>\n<li>Dry development (O2 plasma)<\/li>\n<\/ul>\n<p>The duration of the silylation step depends on the specific technical conditions.<\/p>\n<p>The gas phase silylation can be replaced by liquid silylation.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-73upfc-857d86b82425dd7f35eefc0c77a1574c\">\n.flex_column.av-73upfc-857d86b82425dd7f35eefc0c77a1574c{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-73upfc-857d86b82425dd7f35eefc0c77a1574c av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-60sgfc-a0c28c6edffe3ce1a3cd7416286635ce '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Positive<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-gvqmw-32c7522e2c0f597242dac5c3c061452c\">\n#top .hr.hr-invisible.av-gvqmw-32c7522e2c0f597242dac5c3c061452c{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-gvqmw-32c7522e2c0f597242dac5c3c061452c hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-1w85ug-b938733f47997e444c5bf5aee949cfb8  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17557 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-14T10:15:10+01:00\" >14. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/' title='Link to: Positive two- layer lift-off system'>Positive two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17418 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-25T13:20:00+01:00\" >25. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermally-stable-two-layer-lift-off-systems\/' title='Link to: Thermally stable two-layer lift-off systems'>Thermally stable two-layer lift-off systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17242 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-12T11:54:33+01:00\" >12. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-resist-for-temperature-sensitive-substrates\/' title='Link to: Positive resist for temperature sensitive substrates'>Positive resist for temperature sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:16:54+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-adaptable-two-layer-resist-ar-br-5460-for-variable-lift-off-structures\/' title='Link to: Adaptable two-layer resist AR-BR 5460 for variable lift-off structures'>Adaptable two-layer resist AR-BR 5460 for variable lift-off structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4524 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:25:44+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/' title='Link to: Laser direct exposure with AR-P 3540'>Laser direct exposure with AR-P 3540<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4514 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:13:35+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/alkali-stable-easily-structurable-positive-resist-sx-ar-p-5900-8\/' title='Link to: Alkali-stable, easily structurable positive resist SX AR-P 5900\/8'>Alkali-stable, easily structurable positive resist SX AR-P 5900\/8<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-253 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:42:32+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-procedure-for-the-spray-coating-of-deep-topologies\/' title='Link to: New procedure for the spray coating of deep topologies with SX AR-P 1250\/20'>New procedure for the spray coating of deep topologies with SX AR-P 1250\/20<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-249 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:25:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-photoresist-coatings-on-teflon-substrates\/' title='Link to: Photoresist coatings on Teflon substrates'>Photoresist coatings on Teflon substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-254 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:46:52+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-positive-and-negative\/' title='Link to: Spray resists for different topologies (positive and negative)'>Spray resists for different topologies (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-252 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T06:59:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-488-nm-exposure-wavelength\/' title='Link to: Resist for 488 nm exposure wavelength'>Resist for 488 nm exposure wavelength<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Roland and Coopmans intensively studied the fundamentals of the top surface imaging technology which is based on a selective resist silylation process (DESIRE process). A positive photoresist specifically optimised for this purpose with considerably increased content of light-sensitive components (LSCs) is exposed image-wise.<\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119,109],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Resist-Wiki: Top surface imaging (TSI) photoresist - principles<\/title>\n<meta name=\"description\" content=\"Roland and Coopmans intensively studied the fundamentals of top surface imaging technology based on a selective resist silylation process.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Resist-Wiki: Top surface imaging (TSI) photoresist - principles\" \/>\n<meta property=\"og:description\" content=\"Roland and Coopmans intensively studied the fundamentals of top surface imaging technology based on a selective resist silylation process.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-05-19T10:02:40+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-05-19T10:12:50+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/a.png\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"6 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/\",\"url\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/\",\"name\":\"Resist-Wiki: Top surface imaging (TSI) photoresist - principles\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/a.png\",\"datePublished\":\"2022-05-19T10:02:40+00:00\",\"dateModified\":\"2022-05-19T10:12:50+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"Roland and Coopmans intensively studied the fundamentals of top surface imaging technology based on a selective resist silylation process.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/a.png\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/05\/a.png\",\"width\":227,\"height\":168},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Top surface imaging (TSI) photoresist &#8211; 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