{"id":17359,"date":"2022-05-19T11:41:18","date_gmt":"2022-05-19T10:41:18","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17359"},"modified":"2022-05-19T12:49:18","modified_gmt":"2022-05-19T11:49:18","slug":"waterfree-developable-special-resist-sx-ar-n-4810-1","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/","title":{"rendered":"Waterfree developable special resist SX AR-N 4810\/1"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-lcbzth-95c44de986ca9e65ef504777323a698e\">\n.avia-section.av-lcbzth-95c44de986ca9e65ef504777323a698e{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-lcbzth-95c44de986ca9e65ef504777323a698e main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17359'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-iz2i9x-5d2c894aa3d234674f6d7404f6b0f516\">\n.flex_column.av-iz2i9x-5d2c894aa3d234674f6d7404f6b0f516{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-iz2i9x-5d2c894aa3d234674f6d7404f6b0f516 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-guv8k5-052a666356e9726dcab6715401765ba4 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Waterfree developable special resist SX AR-N 4810\/1<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-f3pczp-a06ab6313720eafe57800b5342888c19\">\n.flex_column.av-f3pczp-a06ab6313720eafe57800b5342888c19{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-f3pczp-a06ab6313720eafe57800b5342888c19 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-dj31d1-c70ee2fad1203e86542958c0b6b36786  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-clou1h-2999aba29df21d0f2c09906e7f4d5dea main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17359'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-avglw5-88a494efe2c284fa865ac0526bf986b8\">\n.flex_column.av-avglw5-88a494efe2c284fa865ac0526bf986b8{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-avglw5-88a494efe2c284fa865ac0526bf986b8 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8nm5yd-dc60cf83e9bfb9b7d414488e46fd6e54 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p style=\"margin-top: 0pt;margin-bottom: 6pt;font-family: Calibri;font-size: 11.0pt;color: black\"><span lang=\"en-GB\">The new special resist <\/span><span lang=\"de\">SX AR-N 4810\/1 is a chemically enhanced photo resist based on PMMA, which can be developed waterfree \u2013 crucial in the case of moisture-sensitive substrates \u2013 with organic solvents. SX AR-N 4810\/1 is offered as a solution in anisole and contains, besides PMMA, crosslinkers and aminic components. X AR 300-74\/1 or MIBK are suitable developers.<\/span><\/p>\n<p style=\"margin-top: 0pt;margin-bottom: 6pt;font-size: 11.0pt;color: black\"><span style=\"font-family: Calibri\">With the resist system, thicker layers up to 3,5 \u00b5m can be realized as well. Our developer X AR 300-74\/3 is particularly well suited for maximum coating thickness, the sensitivity is in the range of approximately 600 \u2013 650 mJ\/cm<\/span><span style=\"vertical-align: super;font-family: inherit\">2<\/span><span style=\"font-family: Calibri\">\u00a0(broadband UV). The resulting structures are stable up to 230 \u00b0C and transparent in the optical wavelength range &gt;300 nm.<\/span><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-7nl851-e398b4876cd58e5dc12dcc0d6aa65822\">\n.flex_column.av-7nl851-e398b4876cd58e5dc12dcc0d6aa65822{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-7nl851-e398b4876cd58e5dc12dcc0d6aa65822 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-5pci6t-ef6dd366e1d1fa70379882821fd7a74a '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-45ajl1-edff02f60eac6b6e5e0657ad4550a195\">\n#top .hr.hr-invisible.av-45ajl1-edff02f60eac6b6e5e0657ad4550a195{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-45ajl1-edff02f60eac6b6e5e0657ad4550a195 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2o8tl1-36b229c2b42b7dcf02b02d09c6a28d92  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17225 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-11T12:38:06+01:00\" >11. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/chemically-enhanced-negative-resist-without-cross-linking\/' title='Link to: Chemically enhanced negative resist without cross-linking'>Chemically enhanced negative resist without cross-linking<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-16697 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-01-13T10:29:09+01:00\" >13. January 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/negative-polyhydroxystyrene-and-hydroxystyrene-co-mma-photoresist-with-high-temperature-stability\/' title='Link to: Negative poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability'>Negative poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8103 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-10-11T14:19:19+01:00\" >11. October 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-coloured-negative-photoresists\/' title='Link to: Coloured negative photoresists'>Coloured negative photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6475 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-07-11T17:13:56+01:00\" >11. July 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/car-44-on-copper\/' title='Link to: CAR 44 on copper'>CAR 44 on copper<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6355 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-01-20T10:11:07+01:00\" >20. January 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fabrication-of-vertical-flanks-with-car-44\/' title='Link to: Fabrication of vertical flanks with CAR 44'>Fabrication of vertical flanks with CAR 44<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5001 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T13:37:34+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-dose-dependent-structure-size-with-negative-resists\/' title='Link to: Dose-dependent structure size with negative resists'>Dose-dependent structure size with negative resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4996 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:28:43+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-generation-of-undercut-structures-with-negative-resists\/' title='Link to: Generation of undercut structures with negative resists'>Generation of undercut structures with negative resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4990 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:23:52+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-negative-resist-for-405-nm-laser-direct-exposureempfindlicher-negativresist-fuer-405-nm-laser-direktbelichter\/' title='Link to: Sensitive negative resist for 405 nm laser direct exposure'>Sensitive negative resist for 405 nm laser direct exposure<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4722 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:53:42+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-nir-laser-structurable-photoresists\/' title='Link to: NIR-laser structurable photoresists'>NIR-laser structurable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4701 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:35:29+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-negative-pmma-resist-car\/' title='Link to: Sensitive negative PMMA resist (CAR)'>Sensitive negative PMMA resist (CAR)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-241 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-10-07T08:04:26+01:00\" >7. October 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-of-thick-negative-resist-layer\/' title='Link to: Development of thick negative resist layer'>Development of thick negative resist layer<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-239 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-07-09T07:25:22+01:00\" >9. July 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-enhanced-negative-resist\/' title='Link to: Chemically enhanced negative resist (Process parameters and resolution)'>Chemically enhanced negative resist (Process parameters and resolution)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-248 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-07-09T07:08:36+01:00\" >9. July 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-two-layer-lift-off-system\/' title='Link to: Negative two- layer lift-off system'>Negative two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-244 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:07:23+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-polyimide-photoresist\/' title='Link to: Negative polyimide photoresist'>Negative polyimide photoresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-246 av-magazine-format-standard av-magazine-type-post av-magazine-entry-16 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:49:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-negative\/' title='Link to: Spray resists for different topologies (negative)'>Spray resists for different topologies (negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-238 av-magazine-format-standard av-magazine-type-post av-magazine-entry-17 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:05:28+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkali-stable-and-solvent-stable-negative-resist\/' title='Link to: Alkali-stable and solvent-stable negative resist'>Alkali-stable and solvent-stable negative resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-247 av-magazine-format-standard av-magazine-type-post av-magazine-entry-18 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:04:26+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-temperature-stable-negative-resist\/' title='Link to: Temperature-stable negative resist'>Temperature-stable negative resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>The new special resist SX AR-N 4810\/1 is a chemically enhanced photo resist based on PMMA, which can be developed waterfree \u2013 crucial in the case of moisture-sensitive substrates \u2013 with organic solvents. <\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Resist-Wiki: Waterfree developable special resist SX AR-N 4810\/1<\/title>\n<meta name=\"description\" content=\"The new special resist can be developed waterfree \u2013 crucial in the case of moisture-sensitive substrates \u2013 with organic solvents.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Resist-Wiki: Waterfree developable special resist SX AR-N 4810\/1\" \/>\n<meta property=\"og:description\" content=\"The new special resist can be developed waterfree \u2013 crucial in the case of moisture-sensitive substrates \u2013 with organic solvents.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-05-19T10:41:18+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-05-19T11:49:18+00:00\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"4 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/\",\"url\":\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/\",\"name\":\"Resist-Wiki: Waterfree developable special resist SX AR-N 4810\/1\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"datePublished\":\"2022-05-19T10:41:18+00:00\",\"dateModified\":\"2022-05-19T11:49:18+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"The new special resist can be developed waterfree \u2013 crucial in the case of moisture-sensitive substrates \u2013 with organic solvents.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Waterfree developable special resist SX AR-N 4810\/1\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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