{"id":17432,"date":"2022-06-01T12:30:36","date_gmt":"2022-06-01T11:30:36","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17432"},"modified":"2022-06-02T09:47:14","modified_gmt":"2022-06-02T08:47:14","slug":"black-resist","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/black-resist\/","title":{"rendered":"Black resist"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kek326-70cedfa9bf2573121894248952524038\">\n.avia-section.av-kek326-70cedfa9bf2573121894248952524038{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kek326-70cedfa9bf2573121894248952524038 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17432'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae\">\n.flex_column.av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hio5pq-8fd48e8de588c3d08eb50f460a1737e6 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2 style=\"margin: 0in;font-family: Calibri;font-size: 17.0pt\">Black resist<\/h2>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307\">\n.flex_column.av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-ecqv3y-0f91849a6417f4b8089bb0cccaac316b  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-comify-5a908c44ee5b1ef7fdba329e7372b2a2 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17432'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-a3l3qm-f8bafea6a62d5217deda004aa9756767\">\n.flex_column.av-a3l3qm-f8bafea6a62d5217deda004aa9756767{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-a3l3qm-f8bafea6a62d5217deda004aa9756767 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8xpori-0edf1d984b57dad0e2203d2654df4dc8 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>For a surprisingly high number of applications, it is important to disable the transparency of the substrates completely, while still having the option to generate structures.\u00a0 The optically protected area should possibly cover the whole UV\/VIS range from 200 &#8211; 1.000 nm. For the area of 200 -350 nm this is quite simple, since the resist components already absorb sufficiently there. For wave lengths &gt; 350 nm, colorants must be added, which generate the desired absorption for longer waves.<\/p>\n<p>We now have developed a resist which fulfills the requirements. First experiments resulted in a sufficiently high absorption up to 800 nm, the layer thus can be regarded as optically dense. We have mixed a negative resist with black and dark blue colorants and measured the absorption of the resulting layer thickness. Fig. 1 shows the absorption spectrums. At a thickness of 23 \u00b5m, the area of 300 &#8211; 800 nm is optically dense.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-gallery wp-image-17433\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png\" alt=\"\" width=\"845\" height=\"684\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png 845w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-495x400.png 495w\" sizes=\"(max-width: 845px) 100vw, 845px\" \/><\/p>\n<p>Fig. 1 UV\/VIS spectrums of the black resist layers<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-gallery wp-image-17434\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/111-845x684.png\" alt=\"\" width=\"845\" height=\"684\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/111-845x684.png 845w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/111-495x400.png 495w\" sizes=\"(max-width: 845px) 100vw, 845px\" \/><\/p>\n<p>Fig. 2 Visual image of the optical density (5 \u00b5m, 10 \u00b5m, 23 \u00b5m)<\/p>\n<p>Even at a layer thickness of 23 \u00b5m, structuring is still possible. Common photolithography can be used here. This layer, however, needs a very strong aqueous-alkaline developer\u00a0 (AR 300-26 or AR 300-73 1 : 1 diluted).<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-gallery wp-image-17435\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/222-845x684.png\" alt=\"\" width=\"845\" height=\"684\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/222-845x684.png 845w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/222-495x400.png 495w\" sizes=\"(max-width: 845px) 100vw, 845px\" \/><\/p>\n<p>Fig. 3 AR logo structures in black resist<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5\">\n.flex_column.av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-58m8ha-9f37fa8b86fbae82304ef44f0261dcd3 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Positive<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f\">\n#top .hr.hr-invisible.av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2ngyvy-14997817dda1cb1c88dfefa930ae4b7b  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17557 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-14T10:15:10+01:00\" >14. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/' title='Link to: Positive two- layer lift-off system'>Positive two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17418 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-25T13:20:00+01:00\" >25. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermally-stable-two-layer-lift-off-systems\/' title='Link to: Thermally stable two-layer lift-off systems'>Thermally stable two-layer lift-off systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17242 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-12T11:54:33+01:00\" >12. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-resist-for-temperature-sensitive-substrates\/' title='Link to: Positive resist for temperature sensitive substrates'>Positive resist for temperature sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:16:54+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-adaptable-two-layer-resist-ar-br-5460-for-variable-lift-off-structures\/' title='Link to: Adaptable two-layer resist AR-BR 5460 for variable lift-off structures'>Adaptable two-layer resist AR-BR 5460 for variable lift-off structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4524 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:25:44+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/' title='Link to: Laser direct exposure with AR-P 3540'>Laser direct exposure with AR-P 3540<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4514 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:13:35+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/alkali-stable-easily-structurable-positive-resist-sx-ar-p-5900-8\/' title='Link to: Alkali-stable, easily structurable positive resist SX AR-P 5900\/8'>Alkali-stable, easily structurable positive resist SX AR-P 5900\/8<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-253 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:42:32+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-procedure-for-the-spray-coating-of-deep-topologies\/' title='Link to: New procedure for the spray coating of deep topologies with SX AR-P 1250\/20'>New procedure for the spray coating of deep topologies with SX AR-P 1250\/20<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-249 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:25:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-photoresist-coatings-on-teflon-substrates\/' title='Link to: Photoresist coatings on Teflon substrates'>Photoresist coatings on Teflon substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-254 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:46:52+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-positive-and-negative\/' title='Link to: Spray resists for different topologies (positive and negative)'>Spray resists for different topologies (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-252 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T06:59:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-488-nm-exposure-wavelength\/' title='Link to: Resist for 488 nm exposure wavelength'>Resist for 488 nm exposure wavelength<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>For a surprisingly high number of applications, it is important to disable the transparency of the substrates completely, while still having the option to generate structures.<\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Black resist<\/title>\n<meta name=\"description\" content=\"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/black-resist\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Black resist\" \/>\n<meta property=\"og:description\" content=\"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/black-resist\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-06-01T11:30:36+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-06-02T08:47:14+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/black-resist\/\",\"url\":\"https:\/\/www.allresist.com\/black-resist\/\",\"name\":\"Black resist\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/black-resist\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/black-resist\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png\",\"datePublished\":\"2022-06-01T11:30:36+00:00\",\"dateModified\":\"2022-06-02T08:47:14+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/black-resist\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/black-resist\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/black-resist\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000.png\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000.png\",\"width\":3420,\"height\":2388},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/black-resist\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Black resist\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - Strausberg, Germany\",\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.allresist.com\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"en-GB\"},{\"@type\":\"Person\",\"@id\":\"\",\"url\":\"https:\/\/www.allresist.com\/author\/\"}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Black resist","description":"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.allresist.com\/black-resist\/","og_locale":"en_GB","og_type":"article","og_title":"Black resist","og_description":"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.","og_url":"https:\/\/www.allresist.com\/black-resist\/","og_site_name":"Allresist EN","article_published_time":"2022-06-01T11:30:36+00:00","article_modified_time":"2022-06-02T08:47:14+00:00","og_image":[{"url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png"}],"twitter_misc":{"Written by":"","Estimated reading time":"5 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/www.allresist.com\/black-resist\/","url":"https:\/\/www.allresist.com\/black-resist\/","name":"Black resist","isPartOf":{"@id":"https:\/\/www.allresist.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.allresist.com\/black-resist\/#primaryimage"},"image":{"@id":"https:\/\/www.allresist.com\/black-resist\/#primaryimage"},"thumbnailUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000-845x684.png","datePublished":"2022-06-01T11:30:36+00:00","dateModified":"2022-06-02T08:47:14+00:00","author":{"@id":""},"description":"For some applications, it is important to disable the transparency of the substrates completely, while still generating structures.","breadcrumb":{"@id":"https:\/\/www.allresist.com\/black-resist\/#breadcrumb"},"inLanguage":"en-GB","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.allresist.com\/black-resist\/"]}]},{"@type":"ImageObject","inLanguage":"en-GB","@id":"https:\/\/www.allresist.com\/black-resist\/#primaryimage","url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000.png","contentUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/000.png","width":3420,"height":2388},{"@type":"BreadcrumbList","@id":"https:\/\/www.allresist.com\/black-resist\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.allresist.com\/home\/"},{"@type":"ListItem","position":2,"name":"Black resist"}]},{"@type":"WebSite","@id":"https:\/\/www.allresist.com\/#website","url":"https:\/\/www.allresist.com\/","name":"Allresist EN","description":"ALLRESIST GmbH - Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"","url":"https:\/\/www.allresist.com\/author\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/17432"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/5"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=17432"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/17432\/revisions"}],"predecessor-version":[{"id":17464,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/17432\/revisions\/17464"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=17432"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=17432"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=17432"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}