{"id":17445,"date":"2022-06-07T10:16:06","date_gmt":"2022-06-07T09:16:06","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17445"},"modified":"2022-06-07T10:18:34","modified_gmt":"2022-06-07T09:18:34","slug":"atlas-46-in-general","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/atlas-46-in-general\/","title":{"rendered":"ATLAS 46 in general"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kek326-70cedfa9bf2573121894248952524038\">\n.avia-section.av-kek326-70cedfa9bf2573121894248952524038{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kek326-70cedfa9bf2573121894248952524038 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17445'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae\">\n.flex_column.av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jgmdku-8e03c35a56882b8858d64bb2d07fb7ae av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hio5pq-8fd48e8de588c3d08eb50f460a1737e6 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2 style=\"margin: 0in;font-family: 'Calibri Light';font-size: 20.0pt\">ATLAS 46 in general<\/h2>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307\">\n.flex_column.av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-fxxjri-38b7e816dc3ea06fbc0581fd4a49e307 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-ecqv3y-0f91849a6417f4b8089bb0cccaac316b  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-comify-5a908c44ee5b1ef7fdba329e7372b2a2 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17445'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-a3l3qm-f8bafea6a62d5217deda004aa9756767\">\n.flex_column.av-a3l3qm-f8bafea6a62d5217deda004aa9756767{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-a3l3qm-f8bafea6a62d5217deda004aa9756767 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8xpori-0edf1d984b57dad0e2203d2654df4dc8 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>The resists Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10 are photoresists with negative effect and high layer thickness with extremely stable resist structures. In addition, AR-N 4650-10 is removable easily and thus very well suited for photolithographic and electro-plating applications. The characteristics of AR-N 4600-10 are comparable to those of SU-8.<\/p>\n<p>The resists consist of poly[(o-cresyl glycidyl ether)-co-formaldehyde] in an organic solvent mixture with the main ingredient 1-methoxy-2-propyl-acetate (PGMEA) and various acid generators. Both resists are developed within a few seconds with the solvent mixtures <b>AR 300\u201312 <\/b>or<b> AR 600-70<\/b>. For a slower and higher-contrast development, AR 600-07 is suitable.<\/p>\n<p>The layer thicknesses of both resists are adjusted to 10 \u00b5m at 1000 rpm, further layer thicknesses in the range of 100 nm up to 100\u00a0 \u00b5m are available upon request. It is recommended to softbake on the hot plate at 65\u00b0 5 min over 3min ramp at 95 \u00b0C for 5 min.<\/p>\n<p>Both resists can be structured by i-line or UV exposure. Prior to exposure, the substrates should be cooled down to room temperature. It is recommended to temper subsequently on the hot plate at 105\u00b0C &#8211; 110\u00b0C for about 2 min, to achieve cross-linking.<\/p>\n<p>For a quick development of a few seconds (5 &#8211; 10 s), AR 300-12 or AR 600-70 is recommended. Developing for too long may cause an increase of dark erosion in the case of AR-N 4650-10. A suitable stopper is AR 600-60. The resist layers must be rinsed with DI-water and dried immediately after developing.<\/p>\n<p>The sensitivity for a layer thickness of 10 \u00b5m is approximately 120 \u2013 140 mJ\/cm2 in broadband UV.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17448\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png\" alt=\"\" width=\"397\" height=\"302\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png 397w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1-250x190.png 250w\" sizes=\"(max-width: 397px) 100vw, 397px\" \/><\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17449\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/2.png\" alt=\"\" width=\"401\" height=\"302\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/2.png 401w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/2-252x190.png 252w\" sizes=\"(max-width: 401px) 100vw, 401px\" \/><\/p>\n<p>Fig. 1 and 2: Atlas 46S and Atlas 46R are very well suited for the generation of defined structures with vertical walls.<\/p>\n<p>Atlas 46S can be structured at a wavelength of 365nm (i-line), but it is significantly more sensitive in the wavelength range of 250 &#8211; 320nm and nearly transparent at 405nm or respectively 436nm (h- or respectively g-line). By use of optimized PAG&#8217;s, the photosensitivity of the resist version SX AR-N 4610-10\/1 can be significantly increased at 365nm:<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17450\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/3.png\" alt=\"\" width=\"499\" height=\"285\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/3.png 499w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/3-333x190.png 333w\" sizes=\"(max-width: 499px) 100vw, 499px\" \/><\/p>\n<p>Fig. 3: Overlap spectrum of a mercury vapor discharge lamp (blue line) and the absorption curve of SX AR-N 4610-10\/1<\/p>\n<p>The new special resist SX AR-N 4620-10\/1 can even be structured in the wavelength range of 405 nm up to 436 nm.<\/p>\n<p>The different absorption characteristics can be used to generate well-defined 3d structures:<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17451\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/4.png\" alt=\"\" width=\"740\" height=\"141\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/4.png 740w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/4-345x66.png 345w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/4-705x134.png 705w\" sizes=\"(max-width: 740px) 100vw, 740px\" \/><\/p>\n<p>Fig. 4: Process overview for the generation of three-dimensional architectures in the two-layer process with AR-N 4600-10 as bottom resist and SX AR-N 4610-10\/1 or respectively SX AR-N 4620-10\/1 as top resist<\/p>\n<p>The process was applied successfully for the generation of bridged resist structures:<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17452\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/5.png\" alt=\"\" width=\"582\" height=\"206\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/5.png 582w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/5-345x122.png 345w\" sizes=\"(max-width: 582px) 100vw, 582px\" \/><\/p>\n<p>Fig. 5: 3d structures generated in two-layer process<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5\">\n.flex_column.av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-6s6u32-2004cf6f0d3ae36173ab7439f67428c5 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-58m8ha-9f37fa8b86fbae82304ef44f0261dcd3 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Positive<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f\">\n#top .hr.hr-invisible.av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3x2rtq-0305cc4178fd5239b6803b2c47cab20f hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2ngyvy-14997817dda1cb1c88dfefa930ae4b7b  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17557 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-14T10:15:10+01:00\" >14. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/' title='Link to: Positive two- layer lift-off system'>Positive two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17418 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-25T13:20:00+01:00\" >25. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermally-stable-two-layer-lift-off-systems\/' title='Link to: Thermally stable two-layer lift-off systems'>Thermally stable two-layer lift-off systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17242 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-12T11:54:33+01:00\" >12. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-resist-for-temperature-sensitive-substrates\/' title='Link to: Positive resist for temperature sensitive substrates'>Positive resist for temperature sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:16:54+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-adaptable-two-layer-resist-ar-br-5460-for-variable-lift-off-structures\/' title='Link to: Adaptable two-layer resist AR-BR 5460 for variable lift-off structures'>Adaptable two-layer resist AR-BR 5460 for variable lift-off structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4524 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:25:44+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/' title='Link to: Laser direct exposure with AR-P 3540'>Laser direct exposure with AR-P 3540<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4514 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:13:35+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/alkali-stable-easily-structurable-positive-resist-sx-ar-p-5900-8\/' title='Link to: Alkali-stable, easily structurable positive resist SX AR-P 5900\/8'>Alkali-stable, easily structurable positive resist SX AR-P 5900\/8<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-253 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:42:32+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-procedure-for-the-spray-coating-of-deep-topologies\/' title='Link to: New procedure for the spray coating of deep topologies with SX AR-P 1250\/20'>New procedure for the spray coating of deep topologies with SX AR-P 1250\/20<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-249 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:25:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-photoresist-coatings-on-teflon-substrates\/' title='Link to: Photoresist coatings on Teflon substrates'>Photoresist coatings on Teflon substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-254 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:46:52+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-positive-and-negative\/' title='Link to: Spray resists for different topologies (positive and negative)'>Spray resists for different topologies (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-252 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T06:59:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-488-nm-exposure-wavelength\/' title='Link to: Resist for 488 nm exposure wavelength'>Resist for 488 nm exposure wavelength<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n<\/p>\n","protected":false},"excerpt":{"rendered":"<p>The resists Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10 are photoresists  with negative effect and high layer thickness with extremely stable resist structures. In addition, AR-N 4650-10 is removable easily and thus very well suited for photolithographic and electro-plating applications. The characteristics of AR-N 4600-10 are comparable to those of SU-8.<\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>ATLAS 46 in general<\/title>\n<meta name=\"description\" content=\"Atlas 46 are photoresists with negative effect and high layer thickness with extremely stable resist structures.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/atlas-46-in-general\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"ATLAS 46 in general\" \/>\n<meta property=\"og:description\" content=\"Atlas 46 are photoresists with negative effect and high layer thickness with extremely stable resist structures.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/atlas-46-in-general\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-06-07T09:16:06+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-06-07T09:18:34+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"6 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/\",\"url\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/\",\"name\":\"ATLAS 46 in general\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png\",\"datePublished\":\"2022-06-07T09:16:06+00:00\",\"dateModified\":\"2022-06-07T09:18:34+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"Atlas 46 are photoresists with negative effect and high layer thickness with extremely stable resist structures.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/atlas-46-in-general\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/1.png\",\"width\":397,\"height\":302},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/atlas-46-in-general\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"ATLAS 46 in general\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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