{"id":17478,"date":"2022-06-07T12:13:31","date_gmt":"2022-06-07T11:13:31","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17478"},"modified":"2022-06-07T12:18:03","modified_gmt":"2022-06-07T11:18:03","slug":"scalpel","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/scalpel\/","title":{"rendered":"SCALPEL"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-248esh-db6ce65c1aa198a26dd831225db2157c\">\n.avia-section.av-248esh-db6ce65c1aa198a26dd831225db2157c{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-248esh-db6ce65c1aa198a26dd831225db2157c main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17478'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1y7kgp-de77334a1e594ce42a55b7e1719c0a3b\">\n.flex_column.av-1y7kgp-de77334a1e594ce42a55b7e1719c0a3b{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1y7kgp-de77334a1e594ce42a55b7e1719c0a3b av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1qrr9d-14c3205707d119a6e3ef540269cca602 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h2><span style=\"font-weight: bold\">SCALPEL<\/span><\/h2>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1ik3qp-b4dbc1525af4221ef94ea7675f99f211\">\n.flex_column.av-1ik3qp-b4dbc1525af4221ef94ea7675f99f211{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1ik3qp-b4dbc1525af4221ef94ea7675f99f211 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1eff49-967b263452434a9f5e68ee250004c3c5  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-18nvo1-244f06cf52ef5de412717b0e1acc69f0 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17478'><div class='entry-content-wrapper clearfix'>\n<section  class='av_textblock_section av-uxcfd-cf88686fe40d32170288aedb842a03d1 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography). This procedure uses scattering masks with a sheet that is partly transparent for electrons. Due to the interposed mask, certain parts of the electron beam are shadowed. The scattering layer strongly deflects incident electrons. A great advantage of this procedure as compared to electron absorption is less loading and less heating of the mask.<\/p>\n<\/div><\/section>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-px6bd-fe3b9762b476578267ad38c02e52990f\">\n.flex_column.av-px6bd-fe3b9762b476578267ad38c02e52990f{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-px6bd-fe3b9762b476578267ad38c02e52990f av_one_third  avia-builder-el-7  el_after_av_textblock  avia-builder-el-last  first flex_column_div av-zero-column-padding  column-top-margin'     ><p><section  class='av_textblock_section av-6y6h-e184a13ec7ec68317570029a2113d94e '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Other Resists<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-cj8s1-a67e345e692fd59878f2ef36ce418b21\">\n#top .hr.hr-invisible.av-cj8s1-a67e345e692fd59878f2ef36ce418b21{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-cj8s1-a67e345e692fd59878f2ef36ce418b21 hr-invisible  avia-builder-el-9  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-xc0x-43ebc05a0f8ae1b4dd0745404cd4f4e1  avia-builder-el-10  el_after_av_hr  avia-builder-el-last   avia-builder-el-10  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17674 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-07-27T11:20:51+01:00\" >27. July 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/polyphthalaldehyde-based-electron-beam-resists-university-of-tubingen\/' title='Link to: Poly(phthalaldehyde)-based electron beam resists, University of T\u00fcbingen'>Poly(phthalaldehyde)-based electron beam resists, University of T\u00fcbingen<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17003 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-22T11:12:11+01:00\" >22. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ppa-for-two-layer-applications\/' title='Link to: PPA for two layer applications'>PPA for two layer applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8122 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:07:57+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/car-44-fuer-die-e-beam-lithographie\/' title='Link to: CAR 44 for e-beam lithography'>CAR 44 for e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-7008 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:06:07+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/' title='Link to: Atlas 46 for e-beam lithography'>Atlas 46 for e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8115 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:52:51+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-phoenix-81-storage-conditions-and-dispatch\/' title='Link to: Phoenix 81 \u2013 Storage conditions and dispatch'>Phoenix 81 \u2013 Storage conditions and dispatch<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8104 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-10-11T16:37:51+01:00\" >11. October 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fluorescent-resist-structures\/' title='Link to: Fluorescent resist structures'>Fluorescent resist structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6370 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-02-03T14:35:15+01:00\" >3. February 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-e-beamresist\/' title='Link to: Top Surface Imaging E-Beamresist'>Top Surface Imaging E-Beamresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:24:51+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-pmma-lift-off-structures-on-semi-precious-stone-substrates-using-electra-92\/' title='Link to: PMMA lift-off structures on semi-precious stone substrates using Electra 92'>PMMA lift-off structures on semi-precious stone substrates using Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5354 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:20:09+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-electra-92-variant-optimised-for-applications-on-novolac-based-resists\/' title='Link to: Electra 92 variant optimised for applications on novolac-based resists'>Electra 92 variant optimised for applications on novolac-based resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:14:07+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/' title='Link to: Conductivity under the application conditions of e-beam lithography'>Conductivity under the application conditions of e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5346 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:10:05+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-long-term-stability-of-electra-92\/' title='Link to: Long-term stability of Electra 92'>Long-term stability of Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5226 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:11:37+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-polyphthalaldehyde-based-electron-beam-resists\/' title='Link to: Poly(phthalaldehyde)-based electron beam resists'>Poly(phthalaldehyde)-based electron beam resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5223 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:09:56+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resists-for-novel-applications-in-lithography-thermally-structurable-polymers\/' title='Link to: Resists for novel applications in lithography \u2013 thermally structurable polymers'>Resists for novel applications in lithography \u2013 thermally structurable polymers<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5219 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:02:19+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-patterning-of-the-conductive-protective-coating-electra-92\/' title='Link to: Patterning of the conductive protective coating Electra 92'>Patterning of the conductive protective coating Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5214 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T15:58:06+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-on-quartz-with-electra-92-on-hsq-resists\/' title='Link to: High resolution on quartz with Electra 92 on HSQ resists'>High resolution on quartz with Electra 92 on HSQ resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography). Due to the interposed mask, certain parts of the electron beam are shadowed. The scattering layer strongly deflects incident electrons. A great advantage of this procedure as compared to electron absorption is less loading and less heating of the mask.<\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[117],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>SCALPEL<\/title>\n<meta name=\"description\" content=\"A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography).\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/scalpel\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"SCALPEL\" \/>\n<meta property=\"og:description\" content=\"A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography).\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/scalpel\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-06-07T11:13:31+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-06-07T11:18:03+00:00\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"4 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/scalpel\/\",\"url\":\"https:\/\/www.allresist.com\/scalpel\/\",\"name\":\"SCALPEL\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"datePublished\":\"2022-06-07T11:13:31+00:00\",\"dateModified\":\"2022-06-07T11:18:03+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"A further mask-based technology is SCALPEL (Scattering with Angular Limitation Projection Electron-beam Lithography).\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/scalpel\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/scalpel\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/scalpel\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"SCALPEL\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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