{"id":17557,"date":"2022-06-14T10:15:10","date_gmt":"2022-06-14T09:15:10","guid":{"rendered":"https:\/\/www.allresist.com\/?p=17557"},"modified":"2022-06-14T10:33:30","modified_gmt":"2022-06-14T09:33:30","slug":"positive-two-layer-lift-off-system","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/","title":{"rendered":"Positive two- layer lift-off system"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-21fsw0-fe15192da7653765c1c7d63ae1041f38\">\n.avia-section.av-21fsw0-fe15192da7653765c1c7d63ae1041f38{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-21fsw0-fe15192da7653765c1c7d63ae1041f38 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17557'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1x1cew-0725f501b9cec6d1e2662a55487f74e4\">\n.flex_column.av-1x1cew-0725f501b9cec6d1e2662a55487f74e4{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1x1cew-0725f501b9cec6d1e2662a55487f74e4 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1pa368-4198a0fc72b6d04076ceeb1c991bf383 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Positive two- layer lift-off system<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1jgtzs-73cae072a60b6dfb9791525110fecf84\">\n.flex_column.av-1jgtzs-73cae072a60b6dfb9791525110fecf84{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1jgtzs-73cae072a60b6dfb9791525110fecf84 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1h63lk-ff8d6bb00e04a00e343f1069d4e66407  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-17yql4-a148f8f390969788dfc0764acd28b79e main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-17557'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-12jxgw-35e94cf277d940418560948b604d3113\">\n.flex_column.av-12jxgw-35e94cf277d940418560948b604d3113{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-12jxgw-35e94cf277d940418560948b604d3113 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-wg3w0-662ba0c36cdb3861e03a011582c67da9 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Currently, two positive-tone two-layer lift-off systems have successfully been employed for a couple of years; the AR-P 5400-3510 series (Allresist) and PMGI positive resist variant.<\/p>\n<p>These systems have a bottom resist that is not photosensitive but soluble in alkali.\u00a0 The polymers must be composed in such a way that the lacquer coat withstands a coating with a photoresist with the solvent PMA (PGMEA) without any problems. Otherwise there would be a mixing of both resist layers. The dissolving speed can be adjusted by tempering of the bottom layer. The variation of the temperature is between 95 \u2013 150 \u00b0C. The higher the temperature, the lower the dissolving rate. A second coating with a photoresist is followed by image-wise exposure and development. The photoresist is quickly developed at the exposed areas, and then the developer begins to dissolve the bottom layer in an isotrop way (in all directions). Thus, it also develops below the photresist, which now (unexposed) is no longer affected by the developer.<\/p>\n<p>By varying the development time, users are able to adjust the desired undercut of the AR-P 5400-3510 series as needed.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17558\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y1.jpg\" alt=\"\" width=\"237\" height=\"190\" \/><\/p>\n<p>Fig. 1: 0.8 \u00b5m undercut<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-17559\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y2.jpg\" alt=\"\" width=\"239\" height=\"190\" \/><\/p>\n<p>Fig. 2: 4.6 \u00b5m undercut<\/p>\n<p>Undercut structures are almost exclusively used for lift-off processes. During evaporation and particularly during sputtering however high temperatures (of up to 200 \u00b0C) may occur, so that a high thermal stability of the upper layer is mandatory. In large undercuts as shown in the second picture, the upper layer tends to melt and flows off; a lift-off process is no longer possible under these conditions. Experiments to develop a thermally more stable positive resist for two-layer systems resulted in no significant improvement so far.<\/p>\n<p>Investigations with negative-tone resists as upper layer in contrast showed promising results. These two-component resist developments could quickly be optimized and produced the desired undercut. For this purpose, resists of the AR-N 4300 -series and bottom layer AR-P 5400 were varied. Resists of the 4300-series are significantly more thermostable than generally used positive resists (see <a href=\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-and-solvent-stable-negative-resist\/\">Alkali- and solvent-stable negative resist<\/a>)<\/p>\n<p>&#8212;&gt;\u00a0 See\u00a0 <a href=\"https:\/\/www.allresist.com\/thermally-stable-two-layer-lift-off-systems\/\">Thermally stable two-layer lift-off systems<\/a><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-2leug-72e9c06b3f20dbfb84e828d189b6f3e3\">\n.flex_column.av-2leug-72e9c06b3f20dbfb84e828d189b6f3e3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-2leug-72e9c06b3f20dbfb84e828d189b6f3e3 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-jv05s-db545b78e854cbd479b564510c904f86 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-cn580-2e0537d1e2b6f4c4fd499829bacf94a4\">\n#top .hr.hr-invisible.av-cn580-2e0537d1e2b6f4c4fd499829bacf94a4{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-cn580-2e0537d1e2b6f4c4fd499829bacf94a4 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-6s400-80d5d6f0e955eff30b21b08a54c0a3d8  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17225 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-11T12:38:06+01:00\" >11. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/chemically-enhanced-negative-resist-without-cross-linking\/' title='Link to: Chemically enhanced negative resist without cross-linking'>Chemically enhanced negative resist without cross-linking<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-16697 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-01-13T10:29:09+01:00\" >13. January 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/negative-polyhydroxystyrene-and-hydroxystyrene-co-mma-photoresist-with-high-temperature-stability\/' title='Link to: Negative poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability'>Negative poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8103 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-10-11T14:19:19+01:00\" >11. October 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-coloured-negative-photoresists\/' title='Link to: Coloured negative photoresists'>Coloured negative photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6475 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-07-11T17:13:56+01:00\" >11. July 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/car-44-on-copper\/' title='Link to: CAR 44 on copper'>CAR 44 on copper<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6355 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-01-20T10:11:07+01:00\" >20. January 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fabrication-of-vertical-flanks-with-car-44\/' title='Link to: Fabrication of vertical flanks with CAR 44'>Fabrication of vertical flanks with CAR 44<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5001 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T13:37:34+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-dose-dependent-structure-size-with-negative-resists\/' title='Link to: Dose-dependent structure size with negative resists'>Dose-dependent structure size with negative resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4996 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:28:43+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-generation-of-undercut-structures-with-negative-resists\/' title='Link to: Generation of undercut structures with negative resists'>Generation of undercut structures with negative resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4990 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:23:52+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-negative-resist-for-405-nm-laser-direct-exposureempfindlicher-negativresist-fuer-405-nm-laser-direktbelichter\/' title='Link to: Sensitive negative resist for 405 nm laser direct exposure'>Sensitive negative resist for 405 nm laser direct exposure<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4722 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:53:42+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-nir-laser-structurable-photoresists\/' title='Link to: NIR-laser structurable photoresists'>NIR-laser structurable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4701 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:35:29+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-negative-pmma-resist-car\/' title='Link to: Sensitive negative PMMA resist (CAR)'>Sensitive negative PMMA resist (CAR)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-241 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-10-07T08:04:26+01:00\" >7. October 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-of-thick-negative-resist-layer\/' title='Link to: Development of thick negative resist layer'>Development of thick negative resist layer<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-239 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-07-09T07:25:22+01:00\" >9. July 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-enhanced-negative-resist\/' title='Link to: Chemically enhanced negative resist (Process parameters and resolution)'>Chemically enhanced negative resist (Process parameters and resolution)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-248 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-07-09T07:08:36+01:00\" >9. July 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-two-layer-lift-off-system\/' title='Link to: Negative two- layer lift-off system'>Negative two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-244 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:07:23+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-polyimide-photoresist\/' title='Link to: Negative polyimide photoresist'>Negative polyimide photoresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-246 av-magazine-format-standard av-magazine-type-post av-magazine-entry-16 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:49:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-negative\/' title='Link to: Spray resists for different topologies (negative)'>Spray resists for different topologies (negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-238 av-magazine-format-standard av-magazine-type-post av-magazine-entry-17 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:05:28+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkali-stable-and-solvent-stable-negative-resist\/' title='Link to: Alkali-stable and solvent-stable negative resist'>Alkali-stable and solvent-stable negative resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-247 av-magazine-format-standard av-magazine-type-post av-magazine-entry-18 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:04:26+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-temperature-stable-negative-resist\/' title='Link to: Temperature-stable negative resist'>Temperature-stable negative resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>These systems have a bottom resist that is not photosensitive but soluble in alkali.  The polymers must be composed in such a way that the lacquer coat withstands a coating with a photoresist with the solvent PMA (PGMEA) without any problems. Otherwise there would be a mixing of both resist layers. <\/p>\n","protected":false},"author":5,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[109],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Positive two-layer lift-off system<\/title>\n<meta name=\"description\" content=\"The lacquer coat must withstand a coating with a photoresist with the solvent PMA (PGMEA) without any problems.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Positive two-layer lift-off system\" \/>\n<meta property=\"og:description\" content=\"The lacquer coat must withstand a coating with a photoresist with the solvent PMA (PGMEA) without any problems.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2022-06-14T09:15:10+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-06-14T09:33:30+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y1.jpg\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/\",\"url\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/\",\"name\":\"Positive two-layer lift-off system\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y1.jpg\",\"datePublished\":\"2022-06-14T09:15:10+00:00\",\"dateModified\":\"2022-06-14T09:33:30+00:00\",\"author\":{\"@id\":\"\"},\"description\":\"The lacquer coat must withstand a coating with a photoresist with the solvent PMA (PGMEA) without any problems.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y1.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/06\/y1.jpg\",\"width\":237,\"height\":190},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Positive two- layer lift-off system\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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