{"id":20,"date":"2008-08-18T13:28:02","date_gmt":"2008-08-18T11:28:02","guid":{"rendered":"https:\/\/www.allresist.depost\/faqphotoresists-0040vorbehandlungsubstrat\/"},"modified":"2021-12-16T13:12:14","modified_gmt":"2021-12-16T12:12:14","slug":"resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/","title":{"rendered":"4.What is the optimal pre-treatment of substrates for photoresists?"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-7iwps-7203ed2f69d84846e1083e9c4a85f48a\">\n.avia-section.av-7iwps-7203ed2f69d84846e1083e9c4a85f48a{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-7iwps-7203ed2f69d84846e1083e9c4a85f48a main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-20'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-6y53w-51aca31c7f55f277551cbcdf7253ed96\">\n.flex_column.av-6y53w-51aca31c7f55f277551cbcdf7253ed96{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-6y53w-51aca31c7f55f277551cbcdf7253ed96 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-6bavw-a1d0180cdfc935455b7b200686a6ce7e '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>4.What is the optimal pre-treatment of substrates for photoresists?<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-5u72g-02e65ade4923a0bae40ab525e240d1ba\">\n.flex_column.av-5u72g-02e65ade4923a0bae40ab525e240d1ba{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-5u72g-02e65ade4923a0bae40ab525e240d1ba av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-54ai8-166e891ef6e8bdc1fa30a5fa9a5b8307  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-gzl8-a8adcc9f4c2f3ada688230cc47c56016 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-20'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3pl9w-d8ba023952a12037e09b021ba49ff052\">\n.flex_column.av-3pl9w-d8ba023952a12037e09b021ba49ff052{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-3pl9w-d8ba023952a12037e09b021ba49ff052 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-bcqg-f22504bedb35dc0be14491010744eeee '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">The adhesion between substrate and resist is of major importance for the safe processing of resists. Smallest changes in the cleaning procedure or the technology itself can exhibit a significant influence on the adhesive strength. Silicon, silicon nitride and base metals (aluminium, copper) are generally characterised by good resist adhesion properties, while adhesion is reduced on SiO<sub>2<\/sub>, glass, noble metals such as gold and silver or on gallium arsenide. For these substrates, adhesion promoters are absolutely required to improve the adhesion strength. A too high air humidity (&gt; 60 %) also reduces the adhesion substantially. If new clean substrates (wafers) are used, a bake at approximately 200 \u00b0C minutes (3 min, hot plate) is sufficient for drying, but substrates should be processed quickly thereafter. A temporary storage in a desiccator is highly recommended in order to prevent rehydration.<\/p>\n<p class=\"p1\">Pre-used wafers or wafers which are contaminated with organic agents require previous cleaning steps, e.g. in easy cases cleaning in acetone, followed by isopropanol or ethanol treatment and subsequent bake ( Section 1). This procedure improves the adhesion features of the resist. On no account only acetone should be used, since the evaporative heat loss during the bake causes a condensation of air humidity on the wafer. If only acetone is used for cleaning, the substrate must be dried in a drying oven to remove the condensed moisture.<\/p>\n<p class=\"p1\">If a technology involves repeated processing of wafers or subjecting these to various conditions, a thorough cleaning is recommended. The cleaning procedure is however highly process- and substrate-dependent (and also on the structures already deposited). The use of removers or acids (e.g. piranha) with subsequent rinse and bake step ( Section 1) may be required in this case. For very difficult cases, a treatment with ultra- or megasound is advisable.<\/p>\n<p class=\"p1\"><span class=\"s1\">To improve the adhesion features, adhesive agents such as e.g. adhesion promoter AR 300-80 may be used, which is applied directly before the resist coating by spin coating as a thin layer of approx. 15 nm thickness. It is also possible to evaporate HMDS onto the substrates. The monomolecular layer on the wafer surface improves adhesion features since this layer is hydrophobic and absorbs the resist better.<\/span><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-2rchc-bfee70db051b4f38fb96c3d42fd12b3b\">\n.flex_column.av-2rchc-bfee70db051b4f38fb96c3d42fd12b3b{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-2rchc-bfee70db051b4f38fb96c3d42fd12b3b av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-25mow-f2f6968d9dd9bb211cc12d84c2d4c2f8 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresist FAQs<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1pf7c-19c302043dc8f6099a7f87e55c049251\">\n#top .hr.hr-invisible.av-1pf7c-19c302043dc8f6099a7f87e55c049251{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-1pf7c-19c302043dc8f6099a7f87e55c049251 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-14zsc-4aa73055f9320f6cade6473107ab9650  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-21T12:38:35+01:00\" >21. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-are-photoresists-composed-of-and-how-do-they-work\/' title='Link to: 1. What are photoresists composed of, and how do they work?'>1. What are photoresists composed of, and how do they work?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-18 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-20T12:52:40+01:00\" >20. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wikiresist-wiki-for-how-long-are-photoresists-stable-and-what-are-the-optimal-storage-conditions\/' title='Link to: 2. For how long are photoresists stable, and what are the optimal storage conditions?'>2. For how long are photoresists stable, and what are the optimal storage conditions?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-19 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-19T13:19:43+01:00\" >19. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-may-age-related-changes-influence-the-quality-of-a-photoresist\/' title='Link to: 3. How may age-related changes influence the quality of a photoresist?'>3. How may age-related changes influence the quality of a photoresist?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-20 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-18T13:28:02+01:00\" >18. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/' title='Link to: 4.What is the optimal pre-treatment of substrates for photoresists?'>4.What is the optimal pre-treatment of substrates for photoresists?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-21 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-17T13:33:22+01:00\" >17. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-are-the-adhesion-features-of-photoresists-on-different-wafers\/' title='Link to: 5. What are the adhesion features of photoresists on different wafers?'>5. What are the adhesion features of photoresists on different wafers?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-22 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-16T13:41:08+01:00\" >16. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-are-the-optimum-coating-parameters-for-photoresists-in-order-to-achieve-good-film-images\/' title='Link to: 6. What are the optimum coating parameters for photoresists in order to achieve good film images?'>6. What are the optimum coating parameters for photoresists in order to achieve good film images?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-23 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-15T13:52:24+01:00\" >15. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-why-may-air-bubbles-develop-in-photoresist-films-and-how-can-they-be-avoided\/' title='Link to: 7. Why may air bubbles develop in photoresist films, and how can they be avoided?'>7. Why may air bubbles develop in photoresist films, and how can they be avoided?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-24 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-14T13:58:35+01:00\" >14. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-is-the-function-of-the-softbake-of-photoresist-films-after-the-coating\/' title='Link to: 8. What is the function of the softbake of photoresist films after the coating?'>8. What is the function of the softbake of photoresist films after the coating?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-26 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-13T14:01:22+01:00\" >13. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-are-photo-resists-exposed-and-how-can-the-optimum-exposure-dose-be-determined\/' title='Link to: 9. How are photo resists exposed, and how can the optimum exposure dose be determined?  How long can coated and exposed substrates be stored prior to exposure?'>9. How are photo resists exposed, and how can the optimum exposure dose be determined?  How long can coated and exposed substrates be stored prior to exposure?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-27 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-12T14:05:26+01:00\" >12. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-which-developers-are-optimal-for-photoresist\/' title='Link to: 10. Which developers are optimal for photoresist, and how do factors like developer concentration and temperature influence the result?'>10. Which developers are optimal for photoresist, and how do factors like developer concentration and temperature influence the result?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-28 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-11T14:09:57+01:00\" >11. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-can-resist-coatings-be-removed-again\/' title='Link to: 11.  How can resist coatings be removed again?'>11.  How can resist coatings be removed again?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-29 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-10T14:16:10+01:00\" >10. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-what-is-the-application-range-of-protective-coatings\/' title='Link to: 12. What is the application range of protective coatings?'>12. What is the application range of protective coatings?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-30 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-09T14:19:38+01:00\" >9. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-do-image-reversal-resists-work\/' title='Link to: 13. How do image reversal resists work?'>13. How do image reversal resists work?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-31 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-08T14:21:37+01:00\" >8. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-can-undercut-patterns-lift-off-structures-be-produced-in-one-or-two-layer-systems\/' title='Link to: 14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?'>14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-32 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-07T14:23:58+01:00\" >7. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-can-thick-films-of-10-%c2%b5m-be-processed-in-an-optimal-way\/' title='Link to: 15. How can thick films of &gt; 10 \u00b5m be processed in an optimal way?'>15. How can thick films of > 10 \u00b5m be processed in an optimal way?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-33 av-magazine-format-standard av-magazine-type-post av-magazine-entry-16 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-06T09:37:59+01:00\" >6. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-which-resolution-and-which-contrast-can-be-obtained-with-photoresists\/' title='Link to: 16. Which resolution and which contrast can be obtained with photoresists?'>16. Which resolution and which contrast can be obtained with photoresists?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-34 av-magazine-format-standard av-magazine-type-post av-magazine-entry-17 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-05T10:02:18+01:00\" >5. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-high-is-the-plasma-etch-resistance-of-photoresists\/' title='Link to: 17. How high is the plasma etch resistance of photoresists?'>17. How high is the plasma etch resistance of photoresists?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-36 av-magazine-format-standard av-magazine-type-post av-magazine-entry-18 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-04T10:11:04+01:00\" >4. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-how-high-is-the-etch-resistance-of-photoresist-in-the-presence-of-strong-acids\/' title='Link to: 18. How high is the etch resistance of photoresist in the presence of strong acids?'>18. How high is the etch resistance of photoresist in the presence of strong acids?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-37 av-magazine-format-standard av-magazine-type-post av-magazine-entry-19 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-03T10:17:43+01:00\" >3. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-which-photoresists-are-suitable-for-hydrofluoric-acid-hf-etching\/' title='Link to: 19. Which photoresists are suitable for hydrofluoric acid (HF) etching?'>19. Which photoresists are suitable for hydrofluoric acid (HF) etching?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-38 av-magazine-format-standard av-magazine-type-post av-magazine-entry-20 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2008-08-02T10:23:18+01:00\" >2. August 2008<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/faqphotoresists-0200loesemittelbestaendigkeit\/' title='Link to: 20. How high is the solvent resistance of photoresist films?'>20. How high is the solvent resistance of photoresist films?<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>If new and clean substrates (wafers) are used, a bake at approximately 200 \u00b0C for several minutes is sufficient for drying, but the substrates have to be processed quickly afterwards.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[121],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>4.What is the optimal pre-treatment of substrates for photoresists? - Allresist EN<\/title>\n<meta name=\"description\" content=\"If new and clean substrates (wafers) are used, a bake at approximately 200 \u00b0C for several minutes is sufficient for drying.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"4.What is the optimal pre-treatment of substrates for photoresists? 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- Allresist EN","description":"If new and clean substrates (wafers) are used, a bake at approximately 200 \u00b0C for several minutes is sufficient for drying.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/","og_locale":"en_GB","og_type":"article","og_title":"4.What is the optimal pre-treatment of substrates for photoresists? - Allresist EN","og_description":"If new and clean substrates (wafers) are used, a bake at approximately 200 \u00b0C for several minutes is sufficient for drying.","og_url":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/","og_site_name":"Allresist EN","article_published_time":"2008-08-18T11:28:02+00:00","article_modified_time":"2021-12-16T12:12:14+00:00","author":"AllAdmin","twitter_misc":{"Written by":"AllAdmin","Estimated reading time":"5 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/","url":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/","name":"4.What is the optimal pre-treatment of substrates for photoresists? - Allresist EN","isPartOf":{"@id":"https:\/\/www.allresist.com\/#website"},"datePublished":"2008-08-18T11:28:02+00:00","dateModified":"2021-12-16T12:12:14+00:00","author":{"@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8"},"description":"If new and clean substrates (wafers) are used, a bake at approximately 200 \u00b0C for several minutes is sufficient for drying.","breadcrumb":{"@id":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/#breadcrumb"},"inLanguage":"en-GB","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/"]}]},{"@type":"BreadcrumbList","@id":"https:\/\/www.allresist.com\/resist-wiki-what-is-the-optimal-pre-treatment-of-substrates-for-photoresists\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.allresist.com\/home\/"},{"@type":"ListItem","position":2,"name":"4.What is the optimal pre-treatment of substrates for photoresists?"}]},{"@type":"WebSite","@id":"https:\/\/www.allresist.com\/#website","url":"https:\/\/www.allresist.com\/","name":"Allresist EN","description":"ALLRESIST GmbH - Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8","name":"AllAdmin","url":"https:\/\/www.allresist.com\/author\/alladmin\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/20"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=20"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/20\/revisions"}],"predecessor-version":[{"id":16553,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/20\/revisions\/16553"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=20"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=20"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=20"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}