{"id":213,"date":"2012-07-13T12:33:51","date_gmt":"2012-07-13T10:33:51","guid":{"rendered":"https:\/\/www.allresist.depost\/allgemein-grundlegendechemie-zusammensetzungphotoresist\/"},"modified":"2021-12-16T12:32:54","modified_gmt":"2021-12-16T11:32:54","slug":"resist-wiki-composition-of-photoresists","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/","title":{"rendered":"Composition of photoresists"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-20c7ph-dc8c9a0ce492adc95dd23871dcd8de14\">\n.avia-section.av-20c7ph-dc8c9a0ce492adc95dd23871dcd8de14{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-20c7ph-dc8c9a0ce492adc95dd23871dcd8de14 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-213'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1uxn2t-de6437d2606700757205445db04626dc\">\n.flex_column.av-1uxn2t-de6437d2606700757205445db04626dc{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1uxn2t-de6437d2606700757205445db04626dc av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1qrgfx-074ac0105806c048a551696b07b0e2d7 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Composition of photoresists<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-5uql1-f2a2cd434b1a7e8cddbf8dbdcf5e0b48\">\n.flex_column.av-5uql1-f2a2cd434b1a7e8cddbf8dbdcf5e0b48{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-5uql1-f2a2cd434b1a7e8cddbf8dbdcf5e0b48 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1diyw5-322521d9b48447627f1fa20ce89540bb  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-18lr9h-39bcb16772e20fe18bdee750c541dc7c main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-213'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-152qqd-f98e6b81e08522fb0bf1a712882aef37\">\n.flex_column.av-152qqd-f98e6b81e08522fb0bf1a712882aef37{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-152qqd-f98e6b81e08522fb0bf1a712882aef37 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-vquwt-fb0fa073886228fa6896c2449c5d94c0 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Photoresists are particularly employed in microelectronics and in microsystems technology to generate \u00b5m- and sub-\u00b5m structures.<\/p>\n<p>Allresist covers a wide range of resist types for a multitude of applications.<\/p>\n<p><strong>Positive photoresist<\/strong><\/p>\n<p>Positive-tone photoresists produced by Allresist are composed of a combination of film formers like e.g. cresol novolac resins and photosensitive components like e.g. naphthoquinone diazide in solvents like e.g. methoxypropylacetate (PGMEA).<\/p>\n<p><strong>Negative photoresist<\/strong><\/p>\n<p>For the manufacture of negative-tone photoresists, in addition to novolac bisazide, acidifier and aminic compounds are dissolved in suitable solvents (e.g. methoxypropylacetate).<\/p>\n<p><strong>Protective coatings<\/strong><\/p>\n<p>Protective coatings (polymeric PMMA, polymeric hydrocarbons) are used for intensive etching processes and prevent a destruction of the substrates.<\/p>\n<p><strong>Other resists<\/strong><\/p>\n<p>Image reversal resists are positive resists with an additional amine. Depending on the manufacturing process, either positive or negative images may be generated. Furthermore available are resists for special applications like positive polyimide resists (high-temperature applications &gt; 300 \u00b0C, polymer polyimide), negative PMMA photoresists (water-free development for sensitive substrates, polymer PMMA and cross-linker), positive and negative two-layer photoresists (lift-off technologies, polymer copolymer PMMA).<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-2ytud-9771c48b866696c4443674dabe4a2754\">\n.flex_column.av-2ytud-9771c48b866696c4443674dabe4a2754{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-2ytud-9771c48b866696c4443674dabe4a2754 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-jildh-6ba04f961e33fcb119c07efead518a8a '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h4 style=\"text-align: left\">Overview Basic Chemistry<\/h4>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-gabf1-f63e28b87381890a3962b13d0ea34611\">\n#top .hr.hr-invisible.av-gabf1-f63e28b87381890a3962b13d0ea34611{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-gabf1-f63e28b87381890a3962b13d0ea34611 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-7nfad-6304eff68a80851b6e061689c20c7a25  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-15496 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2020-05-20T10:56:57+01:00\" >20. May 2020<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/forays-through-the-lithography-of-microelectronics-matthias-schirmer\/' title='Link to: Forays through the lithography of microelectronics (Matthias Schirmer)'>Forays through the lithography of microelectronics (Matthias Schirmer)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-209 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-03-20T10:13:48+01:00\" >20. March 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-polymers-film-formers\/' title='Link to: Polymers (film formers)'>Polymers (film formers)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-210 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-24T12:37:11+01:00\" >24. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-principle-and-functioning\/' title='Link to: Principle and functioning'>Principle and functioning<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-207 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T09:28:57+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-other-resist-components\/' title='Link to: Other resist components'>Other resist components<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-213 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T12:33:51+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/' title='Link to: Composition of photoresists'>Composition of photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-208 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T12:22:20+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-photosensitive-components\/' title='Link to: Photosensitive components'>Photosensitive components<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-212 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T12:16:54+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-cross-linker\/' title='Link to: Cross linker'>Cross linker<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>Photoresists are particularly employed in microelectronics and in microsystems technology to generate \u00b5m- and sub-\u00b5m structures.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[104],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Composition of photoresist<\/title>\n<meta name=\"description\" content=\"Photoresists are particularly employed in microelectronics and in microsystems technology to generate \u00b5m- and sub-\u00b5m structures.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Composition of photoresist\" \/>\n<meta property=\"og:description\" content=\"Photoresists are particularly employed in microelectronics and in microsystems technology to generate \u00b5m- and sub-\u00b5m structures.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2012-07-13T10:33:51+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2021-12-16T11:32:54+00:00\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"4 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/\",\"name\":\"Composition of photoresist\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"datePublished\":\"2012-07-13T10:33:51+00:00\",\"dateModified\":\"2021-12-16T11:32:54+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"Photoresists are particularly employed in microelectronics and in microsystems technology to generate \u00b5m- and sub-\u00b5m structures.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-composition-of-photoresists\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Composition of photoresists\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8","name":"AllAdmin","url":"https:\/\/www.allresist.com\/author\/alladmin\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/213"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=213"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/213\/revisions"}],"predecessor-version":[{"id":16545,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/213\/revisions\/16545"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=213"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=213"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=213"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}