{"id":230,"date":"2013-02-27T09:30:12","date_gmt":"2013-02-27T09:30:12","guid":{"rendered":"https:\/\/www.allresist.depost\/ebeamresist-negativ-spezialanwendungen-arn7700\/"},"modified":"2022-05-23T08:30:13","modified_gmt":"2022-05-23T07:30:13","slug":"ar-n-7700-4-thick-proximity-effect","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/","title":{"rendered":"AR-N 7700, 4 \u00b5m thick, proximity effect"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-230phi-d0d5ebce5bffaa6c58ef112617aaf622\">\n.avia-section.av-230phi-d0d5ebce5bffaa6c58ef112617aaf622{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-230phi-d0d5ebce5bffaa6c58ef112617aaf622 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-230'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-6wbzq-ae52e3ddf41524b774fa07414267c188\">\n.flex_column.av-6wbzq-ae52e3ddf41524b774fa07414267c188{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-6wbzq-ae52e3ddf41524b774fa07414267c188 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1oqe1y-e8a24bddd7c8efbfa43189c128694d23 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p style=\"margin-top: 0pt;margin-bottom: 6pt;font-family: 'Calibri Light';font-size: 20.0pt;color: #1f497d\"><span style=\"font-weight: bold\">AR-N 7700, 4 \u00b5m thick, proximity effect<\/span><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1ijcqe-93674164e65c3beb52af8c64c5ae84b5\">\n.flex_column.av-1ijcqe-93674164e65c3beb52af8c64c5ae84b5{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1ijcqe-93674164e65c3beb52af8c64c5ae84b5 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1emhqu-dd5f86de87e5549a25a1117f50a9abf4  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-16l17y-5a730180588af9973f1f13edb0d96eae main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-230'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-13ojna-82b6e65dcebeb45aac7e1684b455f898\">\n.flex_column.av-13ojna-82b6e65dcebeb45aac7e1684b455f898{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-13ojna-82b6e65dcebeb45aac7e1684b455f898 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-39tou-999e5af657d5b464354099a5d9cc13b8 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>The general aim of electron beam lithography is to achieve a maximum resolution, and therefore mostly very thin layers are used (50 \u2013 500 nm). In a few cases however also very small structures with high aspect ratio are of interest. Examples for possible applications are electroforming processes or the generation of a nano-library for the storage of smallest substance samples. For this purpose, 4 \u03bcm-thick layers of the e-beam resist SX AR-N 7700.38 were exposed, tempered and developed (AR 300-47).<\/p>\n<p>The acceleration voltage was 20 kV, the current 50 pA. Structural width values were strongly dose-dependent. In the case of an overexposure, the proximity effect (which is particularly pronounced at an acceleration voltage of 20 kV) becomes clearly visible as evident from the broadening of structures (Fig. 2).<\/p>\n<p><strong><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-893\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700-193x190.jpg\" alt=\"AR-N7700\" width=\"193\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700-193x190.jpg 193w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700.jpg 256w\" sizes=\"(max-width: 193px) 100vw, 193px\" \/><\/a><\/strong><\/p>\n<p><em>Fig. 1 Bars: 500 nm, height: 4 \u03bc m, 30 \u03bc C\/cm\u00b2, 20 kV<\/em><\/p>\n<p>If an optimal dose is applied, 500-nm bars can be generated with a film thickness of 4 \u03bcm (aspect ratio 8). The aspect ratio is expected to improve further at higher acceleration voltages.<\/p>\n<p><strong><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700_2.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-892\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700_2-203x190.jpg\" alt=\"AR-N7700_2\" width=\"203\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700_2-203x190.jpg 203w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/ar-n7700_2.jpg 280w\" sizes=\"(max-width: 203px) 100vw, 203px\" \/><\/a><\/strong><\/p>\n<p><em>Fig. 2 Bars: 1 \u03bc m, height: 4 \u03bc m, 50 \u03bc C\/cm\u00b2, 20 kV<\/em><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-ot5q6-035bdfa793d3f704b68d446495360340\">\n.flex_column.av-ot5q6-035bdfa793d3f704b68d446495360340{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-ot5q6-035bdfa793d3f704b68d446495360340 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-jhbv2-535101da1e8ea161b66f10a0cba0014e '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-e1hpi-b5ea450968f107f8c40f23a86c1a76cb\">\n#top .hr.hr-invisible.av-e1hpi-b5ea450968f107f8c40f23a86c1a76cb{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-e1hpi-b5ea450968f107f8c40f23a86c1a76cb hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-6vkzi-46a1fc30379d857b8a1c4b5961b1fa04  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-16859 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-02T12:16:20+01:00\" >2. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/high-resolution-negative-e-beam-resist-ar-n-7520-17new-for-etching-application\/' title='Link to: High-resolution negative e-beam resist AR-N 7520.17new for etching application'>High-resolution negative e-beam resist AR-N 7520.17new for etching application<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8121 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:04:27+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-for-euv-applications\/' title='Link to: Medusa 82 for EUV applications'>Medusa 82 for EUV applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8120 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:59:16+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/' title='Link to: Medusa 82: Influence of post exposure bake (PEB)'>Medusa 82: Influence of post exposure bake (PEB)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8119 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:55:00+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/' title='Link to: Medusa 82 with photoacid generator (PAG)'>Medusa 82 with photoacid generator (PAG)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8114 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:49:05+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-the-alternative-to-hsq-resists-storage-stability\/' title='Link to: Medusa 82 \u2013 the alternative to HSQ-resists, storage stability'>Medusa 82 \u2013 the alternative to HSQ-resists, storage stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5906 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:50:18+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-utilising-electra-92-for-sem-applications\/' title='Link to: Utilising Electra 92 for SEM applications'>Utilising Electra 92 for SEM applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4522 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:21:16+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-amplified-highly-sensitive-negative-e-beam-resist-sx-ar-n-7730-37\/' title='Link to: Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37'>Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4516 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:17:37+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ratio-resolution-and-dose-exemplarily-shown-for-e-beam-resist-sx-ar-n-7530-1\/' title='Link to: Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1'>Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:30:12+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/' title='Link to: AR-N 7700, 4 \u00b5m thick, proximity effect'>AR-N 7700, 4 \u00b5m thick, proximity effect<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10365 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:23:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-diffractive-optics-with-the-analogous-e-beam-resist\/' title='Link to: Diffractive optics with the \u201canalogous\u201c e-beam resist'>Diffractive optics with the \u201canalogous\u201c e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:10:36+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/' title='Link to: High-resolution negative e-beam resist'>High-resolution negative e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T08:46:02+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/' title='Link to: Sensitive, etch-stable negative e-beam resist for processes without yellow light'>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n<\/p>\n","protected":false},"excerpt":{"rendered":"<p>The general aim of electron beam lithography is to achieve a maximum resolution, and therefore mostly very thin layers are used (50 &#8211; 500 nm). In a few cases however also very small structures with high aspect ratio are of interest.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[105],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>AR-N 7700, 4 \u00b5m thick, proximity effect<\/title>\n<meta name=\"description\" content=\"The general aim of electron beam lithography is to achieve a maximum resolution, and therefore mostly very thin layers are used (50 - 500 nm).\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"AR-N 7700, 4 \u00b5m thick, proximity effect\" \/>\n<meta property=\"og:description\" content=\"The general aim of electron beam lithography is to achieve a maximum resolution, and therefore mostly very thin layers are used (50 - 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