{"id":264,"date":"2012-08-31T09:28:11","date_gmt":"2012-08-31T09:28:11","guid":{"rendered":"https:\/\/www.allresist.depost\/photorestist-umkehrlack-uvstrukturierung\/"},"modified":"2022-07-27T11:39:47","modified_gmt":"2022-07-27T10:39:47","slug":"resist-wiki-uv-structuring-of-pmma-resists","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/","title":{"rendered":"UV-structuring of PMMA resists"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-20f354-7a5735fde636888191a7c1f9f5caf529\">\n.avia-section.av-20f354-7a5735fde636888191a7c1f9f5caf529{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-20f354-7a5735fde636888191a7c1f9f5caf529 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-264'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-6mimg-4637d9227549f6bc5ec936368a18d357\">\n.flex_column.av-6mimg-4637d9227549f6bc5ec936368a18d357{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-6mimg-4637d9227549f6bc5ec936368a18d357 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1rodo0-82b9a68b07509ac441fac040acebdd62 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>UV-structuring of PMMA resists<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1jixmg-44dbe429452be36a4697c4cb83775349\">\n.flex_column.av-1jixmg-44dbe429452be36a4697c4cb83775349{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1jixmg-44dbe429452be36a4697c4cb83775349 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1gek3k-707b9de34d2625905b04e8ca9cdc30e8  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the resist wiki Overview'  >Back to the resist wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-1bgn08-aba10d031fcb459ca0dd4b6a6bf8968b main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-264'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-12hnow-8892379df1c774578941d38c25e8ce42\">\n.flex_column.av-12hnow-8892379df1c774578941d38c25e8ce42{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-12hnow-8892379df1c774578941d38c25e8ce42 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-x76fs-7e55709de38b771ff368ceb384484058 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>PMMA resists can also be patterned using UV-lithography, but only at exposure wavelengths of 200 \u2013 270 nm (deep UV light). Typically used is the wavelength-range of the lowest line of high-pressure mercury lamps at 254 nm. The image shows the UV absorption spectrum of a PMMA resist. Above a wavelength of 280 nm, the polymer shows no absorption and can thus not be exposed in this wavelength range.<\/p>\n<p><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-1242\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung-279x190.jpg\" alt=\"UV-Strukturierung\" width=\"279\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung-279x190.jpg 279w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung-588x400.jpg 588w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung.jpg 771w\" sizes=\"(max-width: 279px) 100vw, 279px\" \/><\/a><\/p>\n<p>Absorption spectrum of a PMMA.<\/p>\n<p>The sensitivity of PMMA at this wavelength is however low, in particular if high-pressure mercury lamps are used since only a small portion of the radiation is emitted at 254 nm. In addition it has to be ensured that no glass (lenses, filters) are present in the beam paths, since glass is impermeable for light less than 300 nm. Only quartz glass is suitable for 254-nm lithography. If laser light is used as source for the deep UV-lithography, more energy is available for exposure and PMMA resists can consequently be exposed with acceptable exposure times. After exposure, PMMA films are developed according to the procedure used in e-beam lithography (see Development PMMA films).<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-ri6t4-abf5426cbfb559f137ccbac4dd1cd4f3\">\n.flex_column.av-ri6t4-abf5426cbfb559f137ccbac4dd1cd4f3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-ri6t4-abf5426cbfb559f137ccbac4dd1cd4f3 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-29pk8-0c8e97a946215f255ec08c07b793fc44 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Image Reversal Resists<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-feaog-023015001419efb43597e07238266c99\">\n#top .hr.hr-invisible.av-feaog-023015001419efb43597e07238266c99{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-feaog-023015001419efb43597e07238266c99 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-bdcbc-2086ed765023b5fbba84f490ef6f7ac6  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17426 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-01T11:20:07+01:00\" >1. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/general-resist-composition\/' title='Link to: General: Resist composition'>General: Resist composition<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17414 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-25T10:15:28+01:00\" >25. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/dilution-of-resists\/' title='Link to: Dilution of resists'>Dilution of resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17411 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-24T12:13:42+01:00\" >24. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/adhesive-strength\/' title='Link to: Adhesive strength'>Adhesive strength<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17395 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-24T11:36:13+01:00\" >24. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/one-layer-and-two-layer-lift-off\/' title='Link to: One-layer and two-layer lift-off'>One-layer and two-layer lift-off<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10357 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T12:54:59+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-lift-off-one-layer-two-layer\/' title='Link to: Lift off (one layer \u2013 two layer)'>Lift off (one layer \u2013 two layer)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n<\/p>\n","protected":false},"excerpt":{"rendered":"<p>PMMA resists can also be patterned using UV-lithography, but only at exposure wavelengths of 200 \u2013 270 nm (deep UV light). Typically used is the wavelength-range of the lowest line of high-pressure mercury lamps at 254 nm. <\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>UV-structuring of PMMA resists<\/title>\n<meta name=\"description\" content=\".PMMA resists can also be patterned using UV-lithography, but only at exposure wavelengths of 200 \u2013 270 nm (deep UV light).\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"UV-structuring of PMMA resists\" \/>\n<meta property=\"og:description\" content=\".PMMA resists can also be patterned using UV-lithography, but only at exposure wavelengths of 200 \u2013 270 nm (deep UV light).\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2012-08-31T09:28:11+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-07-27T10:39:47+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung-279x190.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/\",\"name\":\"UV-structuring of PMMA resists\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung-279x190.jpg\",\"datePublished\":\"2012-08-31T09:28:11+00:00\",\"dateModified\":\"2022-07-27T10:39:47+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\".PMMA resists can also be patterned using UV-lithography, but only at exposure wavelengths of 200 \u2013 270 nm (deep UV light).\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/02\/uv-strukturierung.jpg\",\"width\":771,\"height\":524},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"UV-structuring of PMMA resists\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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