{"id":4524,"date":"2014-06-13T16:25:44","date_gmt":"2014-06-13T14:25:44","guid":{"rendered":"https:\/\/www.allresist.de?p=4524"},"modified":"2022-01-11T12:13:41","modified_gmt":"2022-01-11T11:13:41","slug":"resist-wiki-laser-direct-exposure-with-ar-p-3540","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/","title":{"rendered":"Laser direct exposure with AR-P 3540"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-ki8bbg-d84cd744b7a771b8888af77b17b056e2\">\n.avia-section.av-ki8bbg-d84cd744b7a771b8888af77b17b056e2{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-ki8bbg-d84cd744b7a771b8888af77b17b056e2 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-4524'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-j1dvnw-860dd8a59857545480947114bc1b47ad\">\n.flex_column.av-j1dvnw-860dd8a59857545480947114bc1b47ad{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-j1dvnw-860dd8a59857545480947114bc1b47ad av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-h0xn24-9419d8bd7027561c4503c48b1ea36da5 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Laser direct exposure with AR-P 3540<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-gavhws-495afbf509b4d1d808df739acbd9808c\">\n.flex_column.av-gavhws-495afbf509b4d1d808df739acbd9808c{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-gavhws-495afbf509b4d1d808df739acbd9808c av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1czffg-27763747a7a048582c11b0670a02e74a  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-d0zgf0-124d959920945c1285486ab825d8a791 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-4524'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-b052jw-857807dd890b2a00dd55e273c005c421\">\n.flex_column.av-b052jw-857807dd890b2a00dd55e273c005c421{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-b052jw-857807dd890b2a00dd55e273c005c421 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-9jx530-476bb987eb1d712ff55f495be4d1c263 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>In addition to a structuring with photomasks which is frequently used in lithography, is it also possible to write the structures directly, i.e. without masks, with laser beams. The most commonly used wavelength for this purpose is the 405 nm line.<\/p>\n<p>By merging classical mask-based exposure methods (contact, proximity and projection exposure) with modern maskless lithography (laser and electron beam exposure), mix &amp; match technologies are possible which combine the high throughput of mask technology with a high resolution in the sub-\u00b5m range (laser).<\/p>\n<p>This technology is in particular aimed at increasing the user\u2019s efficiency of exposure techniques, in particular for MEMS and sensor technology processes.<\/p>\n<p>In analogy to well-known photolithographic structuring procedures (see Resist-Wiki General Basic Chemistry), AR-P 3540 is chemically modified using a controlled laser beam and dissolved in the subsequent development. In test series, new fields of application for AR-P 3540 in maskless lithography were investigated and evaluated.<\/p>\n<p>Good results are presented in the following figures \u2013 resolutions of significantly less than 1.0 \u00b5m were achieved.<\/p>\n<p><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures_holes-under-1um.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-2044\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures-bars-under-1um.jpg\" alt=\"Resolved-structures-bars-under-1\u00b5m\" width=\"218\" height=\"168\" \/><\/a><\/p>\n<p><span class=\"bildunterschrift\">Fig. 1 Resolved structures (bars) &lt;1.0 \u00b5m in AR-P 3540<\/span><\/p>\n<p><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures_holes-under-1um.jpg\"><img decoding=\"async\" class=\"alignnone size-full wp-image-2043\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures_holes-under-1um.jpg\" alt=\"Resolved-structures_holes-under-1\u00b5m\" width=\"220\" height=\"169\" \/><\/a><\/p>\n<p><span class=\"bildunterschrift\">Fig. 2 Resolved structures (holes) &lt;1.0 \u00b5m in AR-P 3540<\/span><\/p>\n<p>According to information provided by Klaus-Dieter Preu\u00df \u2013 development engineer at the CiS Research Institute for Micro Sensors and Photovoltaics GmbH and Dr. Axel Weidner \u2013 managing director of the ML Microlithography Service GmbH Jena (see also\u00a0<a href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/06\/arnews_28_may_2014_eng.pdf\">AR NEWS 28. issue<\/a>)<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-81d6x8-d1da11a5cba785e5639d2c9f51cf3387\">\n.flex_column.av-81d6x8-d1da11a5cba785e5639d2c9f51cf3387{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-81d6x8-d1da11a5cba785e5639d2c9f51cf3387 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-5ylkrw-cc686d00067620256d7fb29b69db22bc '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Photoresists- Positive<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3w2bjw-465192c7b4915967fab5384df8957142\">\n#top .hr.hr-invisible.av-3w2bjw-465192c7b4915967fab5384df8957142{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3w2bjw-465192c7b4915967fab5384df8957142 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2ayf7g-6fd6f2bf8c1f9ef08cb60475d99dd868  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17557 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-14T10:15:10+01:00\" >14. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-two-layer-lift-off-system\/' title='Link to: Positive two- layer lift-off system'>Positive two- layer lift-off system<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17422 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-31T12:43:25+01:00\" >31. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ready-to-use-spray-resists-with-evg-devices-positive-and-negative\/' title='Link to: Ready-to-use spray resists with EVG devices (positive and negative)'>Ready-to-use spray resists with EVG devices (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17418 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-25T13:20:00+01:00\" >25. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermally-stable-two-layer-lift-off-systems\/' title='Link to: Thermally stable two-layer lift-off systems'>Thermally stable two-layer lift-off systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17242 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-12T11:54:33+01:00\" >12. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/positive-resist-for-temperature-sensitive-substrates\/' title='Link to: Positive resist for temperature sensitive substrates'>Positive resist for temperature sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:16:54+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-adaptable-two-layer-resist-ar-br-5460-for-variable-lift-off-structures\/' title='Link to: Adaptable two-layer resist AR-BR 5460 for variable lift-off structures'>Adaptable two-layer resist AR-BR 5460 for variable lift-off structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4524 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:25:44+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/' title='Link to: Laser direct exposure with AR-P 3540'>Laser direct exposure with AR-P 3540<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4514 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:13:35+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/alkali-stable-easily-structurable-positive-resist-sx-ar-p-5900-8\/' title='Link to: Alkali-stable, easily structurable positive resist SX AR-P 5900\/8'>Alkali-stable, easily structurable positive resist SX AR-P 5900\/8<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-253 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:42:32+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-procedure-for-the-spray-coating-of-deep-topologies\/' title='Link to: New procedure for the spray coating of deep topologies with SX AR-P 1250\/20'>New procedure for the spray coating of deep topologies with SX AR-P 1250\/20<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-249 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:25:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-photoresist-coatings-on-teflon-substrates\/' title='Link to: Photoresist coatings on Teflon substrates'>Photoresist coatings on Teflon substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-254 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T08:46:52+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-spray-resists-for-different-topologies-positive-and-negative\/' title='Link to: Spray resists for different topologies (positive and negative)'>Spray resists for different topologies (positive and negative)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-252 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T06:59:41+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-488-nm-exposure-wavelength\/' title='Link to: Resist for 488 nm exposure wavelength'>Resist for 488 nm exposure wavelength<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>In addition to a structuring with photomasks which is frequently used in lithography, is it also possible to write the structures directly, i.e. without masks, with laser beams.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[109],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Resist-Wiki: Laser direct exposure with AR-P 3540<\/title>\n<meta name=\"description\" content=\"In addition to a structuring with photomasks, is it also possible to write the structures directly with laser beams.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Resist-Wiki: Laser direct exposure with AR-P 3540\" \/>\n<meta property=\"og:description\" content=\"In addition to a structuring with photomasks, is it also possible to write the structures directly with laser beams.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2014-06-13T14:25:44+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-01-11T11:13:41+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures-bars-under-1um.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/\",\"name\":\"Resist-Wiki: Laser direct exposure with AR-P 3540\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures-bars-under-1um.jpg\",\"datePublished\":\"2014-06-13T14:25:44+00:00\",\"dateModified\":\"2022-01-11T11:13:41+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"In addition to a structuring with photomasks, is it also possible to write the structures directly with laser beams.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures-bars-under-1um.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2014\/09\/resolved-structures-bars-under-1um.jpg\",\"width\":218,\"height\":168},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-laser-direct-exposure-with-ar-p-3540\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Laser direct exposure with AR-P 3540\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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