{"id":4533,"date":"2014-06-13T16:30:09","date_gmt":"2014-06-13T14:30:09","guid":{"rendered":"https:\/\/www.allresist.de?p=4533"},"modified":"2022-03-24T13:03:34","modified_gmt":"2022-03-24T12:03:34","slug":"resist-wiki-developer-for-csar-62-ar-p-6200","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-developer-for-csar-62-ar-p-6200\/","title":{"rendered":"Developer for CSAR 62 (AR-P 6200)"},"content":{"rendered":"

Developer for CSAR 62 (AR-P 6200)<\/h1>\n<\/div><\/section>\n

For a development of exposed\u00a0CSAR 62\u00a0resist films generally performed by immersion development with development times of approximately 30-60 seconds, developers\u00a0AR 600-546, 600-548 and 600-549\u00a0are well suited.<\/p>\n

As weakest developer, AR 600-546 can be utilised universally and enables to achieve a very high contrast of more than 14. This developer does not attack unexposed areas. Even after a development time of 10 minutes, no significant dark erosion is observed. Developer AR 600-546 is furthermore very well suited for the development of thick CSAR 62<\/strong>\u00a0layers up to 2 \u00b5m. The medium-strength developer\u00a0AR 600-549\u00a0results in a doubling of the sensitivity as compared to\u00a0AR 600-546. Likewise, no dark erosion occurs with this developer and the contrast reaches a value of about 4.<\/p>\n

If the strongest developer AR 600-548 is used, the sensitivity can be increased sixfold to less than 10 \u03bcC\/cm\u00b2 with a contrast of approximately 3. Developer AR 600-548 attacks unexposed resist areas at 22\u00b0C already within two minutes considerably. A reduction of the development bath temperature to about 3\u00b0C effectively reduces the dark erosion, results however at the same time in a loss of sensitivity.<\/p>\n<\/div><\/section>\n<\/div><\/div><\/div><\/div><\/div>\n