{"id":4979,"date":"2015-05-20T12:05:30","date_gmt":"2015-05-20T10:05:30","guid":{"rendered":"https:\/\/www.allresist.de?p=4979"},"modified":"2022-03-24T11:14:27","modified_gmt":"2022-03-24T10:14:27","slug":"resist-wiki-alkaline-developers-for-aluminium-substrates","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-alkaline-developers-for-aluminium-substrates\/","title":{"rendered":"Alkaline developers for aluminium substrates"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kgey9v-fe86b7dbc0e216ad61ee4f1ed3df829a\">\n.avia-section.av-kgey9v-fe86b7dbc0e216ad61ee4f1ed3df829a{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kgey9v-fe86b7dbc0e216ad61ee4f1ed3df829a main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-4979'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jcbeoj-9f5f2549a1956a1f141ee1c76a780adc\">\n.flex_column.av-jcbeoj-9f5f2549a1956a1f141ee1c76a780adc{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jcbeoj-9f5f2549a1956a1f141ee1c76a780adc av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hl2bdf-d4b8b9e0aea0820f52c2405fc8f07812 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Alkaline developers for aluminium substrates<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-g79emb-d5924de232ccbf725cf50038b14acf42\">\n.flex_column.av-g79emb-d5924de232ccbf725cf50038b14acf42{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-g79emb-d5924de232ccbf725cf50038b14acf42 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-dqadz7-ff8c99c65cda8efd5a0786f9e452f658  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist WIki Overview'  >Back to the Resist WIki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-cavlw3-dcaa7995ebd118319acab948878ae17f main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-4979'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-b96fv7-ccbd3915291d8666fd52c154b572e876\">\n.flex_column.av-b96fv7-ccbd3915291d8666fd52c154b572e876{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-b96fv7-ccbd3915291d8666fd52c154b572e876 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8m7dg3-c1ac468f9017822743d08855a70bd1c6 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Some of our customers use alkali-sensitive aluminium substrates. This leads to problems if the metal surface should not be etched in this process. While our MIF-developer (AR 300-40\u00a0series) and developer\u00a0AR 300-26\u00a0strongly attack aluminium surfaces, the metal surface remains largely unchanged if developer\u00a0AR 300-35\u00a0is used. Quite likely, a passivation layer is formed on the metal surface which reliably protects the metal from further attack. The aluminium foil survives the contact with\u00a0AR 300-35\u00a0for hours basically unchanged, while the foil in contrast quickly dissolves in AR 300-47.<\/p>\n<p>It furthermore became evident that also concentrated variants of\u00a0AR 300-35\u00a0can successfully be employed as remover. A large number of resists are only difficult or impossible to remove in organic removers after an application in high-temperature processes, e.g. sputtering, ion etching, or also ion implantation. The utilisation of efficient alkaline removers was so far however only possible to a limited extent if alkali-sensitive substrates like e.g. aluminium were used. Stronger variants of\u00a0AR 300-35\u00a0now demonstrated similarly good cleaning results as our TMAH-based alkaline remover\u00a0AR 300-73, and without attacking aluminium surfaces significantly.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-79w1pf-e856457bae33db756907b7ba6c67a226\">\n.flex_column.av-79w1pf-e856457bae33db756907b7ba6c67a226{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-79w1pf-e856457bae33db756907b7ba6c67a226 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-5y183n-6f1c8b71363a2a15489c70458544c9a3 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Developer<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-4scvr7-fb5066b8a029a99e9b45cf4a3e55d34e\">\n#top .hr.hr-invisible.av-4scvr7-fb5066b8a029a99e9b45cf4a3e55d34e{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-4scvr7-fb5066b8a029a99e9b45cf4a3e55d34e hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>Some of our customers use alkali-sensitive aluminium substrates. This leads to problems if the metal surface should not be etched in this process.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[120,59],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Resist-Wiki: Alkaline developers for aluminium substrates<\/title>\n<meta name=\"description\" content=\"Some of our customers use alkali-sensitive aluminium substrates. 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