{"id":5228,"date":"2015-07-21T16:13:16","date_gmt":"2015-07-21T14:13:16","guid":{"rendered":"https:\/\/www.allresist.de?p=5228"},"modified":"2022-02-16T09:21:16","modified_gmt":"2022-02-16T08:21:16","slug":"resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/","title":{"rendered":"Structuring of polyphthalaldehydes with photolithography"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-l5i5wc-eb22e4118319517c5991c86fd931713b\">\n.avia-section.av-l5i5wc-eb22e4118319517c5991c86fd931713b{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-l5i5wc-eb22e4118319517c5991c86fd931713b main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5228'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-is4e18-b5a5b00e51bae7b5bc0d6f3e84bdcce3\">\n.flex_column.av-is4e18-b5a5b00e51bae7b5bc0d6f3e84bdcce3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-is4e18-b5a5b00e51bae7b5bc0d6f3e84bdcce3 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1sgpp8-242846753a3a188bdd3696e2705b570b '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Structuring of polyphthalaldehydes with photolithography<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-gh9a24-d340e62f1f9d4c4f8699ea70771c160d\">\n.flex_column.av-gh9a24-d340e62f1f9d4c4f8699ea70771c160d{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-gh9a24-d340e62f1f9d4c4f8699ea70771c160d av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-e6ivu4-0cf97c6ba96d6515ed13ba13a51ca67a  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-c9lquk-7e54456273fd6b509de78c3633077b0d main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5228'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-b0z3cc-31274faa702f3f7f79e6916695a4646a\">\n.flex_column.av-b0z3cc-31274faa702f3f7f79e6916695a4646a{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-b0z3cc-31274faa702f3f7f79e6916695a4646a av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8wc6cs-65111e81d9836c46c97e42dd4bdebfd4 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p lang=\"en-GB\">PPA layers are sensitive to light and can thus be structured directly by photolithography. Irradiation with light of wavelengths &lt; 300 nm (Hg vapour lamp) results in a cleavage of the polymer chains and the formation of volatile components that partly begin to evaporate even at room temperature. This dry (developer-free) development process is completed by heating the exposed substrates to about 100 \u2013 120 \u00b0C. Photosensitivity can generally be increased by adding acid formers (PAGs). Recommend for stripping\/removal is either an etching with plasma or heating the substrate to about 200 \u00b0C, which results in a residue-free evaporation of the PPA.<\/p>\n<p lang=\"en-GB\">The addition of PAGs (photo acid generators) significantly increases the sensitivity. During exposure, acid is released in situ which decomposes the PPA layer during the subsequent PEB step (and sometimes even already at room temperature). The choice of suitable PAGs and the optimal PAG concentration are thus crucial parameters for this process. Numerous PAGs assessed in this respect lead only to an incomplete development. In the case of variant 8100\/3, overexposure even results in higher layer thicknesses which are caused by UV-induced cross-linking reactions:<\/p>\n<p lang=\"en-GB\"><a href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-15896\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1-270x190.jpg\" alt=\"\" width=\"270\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1-270x190.jpg 270w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1.jpg 340w\" sizes=\"(max-width: 270px) 100vw, 270px\" \/><\/a><\/p>\n<p lang=\"en-GB\"><span class=\"bildunterschrift\">Fig. 1: Layer thickness as a function of the exposure dose, no complete development possible<\/span><\/p>\n<p lang=\"en-GB\">PPA variants 8100\/2 and 8100\/3 are considerably more sensitive than 8100\/1 (pure PPA without additives), due to the addition of PAGs. However, a 100 % positive thermal development at 120 \u00b0C could not be observed. In the case of 8100\/3, development occurs already partly at room temperature, but this development is incomplete without subsequent PEB.<\/p>\n<p lang=\"en-GB\">The new samples 8100\/4,5,6, and 7 contain an acid generator that enables complete thermal development already at a PEB of 98 \u00b0C which is well below the decomposition temperature of PPA. Exposure succeeds only at wavelengths &lt; 300 nm. PPA layers with different PAGs are storage-stable for at least a few days.<\/p>\n<p lang=\"en-GB\">The optimised formulations (variation of PAG concentration) allow (almost) complete thermal development (up to the detection limit of layers with a thickness of a few nanometres). A complete development can be achieved with a short plasma etching step.<\/p>\n<p lang=\"en-GB\"><a href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/Unbenanntes-Bild.png\"><img decoding=\"async\" class=\"alignnone size-full wp-image-15897\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/Unbenanntes-Bild.png\" alt=\"\" width=\"173\" height=\"164\" \/><\/a><\/p>\n<p lang=\"en-GB\"><span class=\"bildunterschrift\">Fig. 2: Complete development of irradiated squares with new PAG<\/span><\/p>\n<p lang=\"en-GB\">Decisive influencing factors are:<\/p>\n<ul type=\"disc\">\n<li>PAG concentration (too little results in an incomplete development; too much narrows the process window)<\/li>\n<li>Exposure dose (and wavelength)<\/li>\n<li>Temperature and duration of the PEB<\/li>\n<li>Time interval between exposure and PEB (the observed sensitivities are higher if the PEB is carried out immediately after exposure)<\/li>\n<li>Film thickness (thinner films are more sensitive)!<\/li>\n<\/ul>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-73scy4-84d815ef560b9a8720e16ad4f6bf2180\">\n.flex_column.av-73scy4-84d815ef560b9a8720e16ad4f6bf2180{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-73scy4-84d815ef560b9a8720e16ad4f6bf2180 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-5owvb0-d4ea52594b13469622a57e0ffad3422e '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Other Resists<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3j9avg-8076cccc8948bba5c91495d0fc140aba\">\n#top .hr.hr-invisible.av-3j9avg-8076cccc8948bba5c91495d0fc140aba{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3j9avg-8076cccc8948bba5c91495d0fc140aba hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-34gw7g-5b8210cba148a53dcf0d5098bb35fe53  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17456 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-07T11:09:22+01:00\" >7. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/laser-ablation-of-ppa-phoenix-81\/' title='Link to: Laser ablation of PPA (Phoenix 81)'>Laser ablation of PPA (Phoenix 81)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17445 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-07T10:16:06+01:00\" >7. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/atlas-46-in-general\/' title='Link to: ATLAS 46 in general'>ATLAS 46 in general<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17432 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-01T12:30:36+01:00\" >1. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/black-resist\/' title='Link to: Black resist'>Black resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17426 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-01T11:20:07+01:00\" >1. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/general-resist-composition\/' title='Link to: General: Resist composition'>General: Resist composition<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:41:18+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/' title='Link to: Waterfree developable special resist SX AR-N 4810\/1'>Waterfree developable special resist SX AR-N 4810\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8116 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T14:18:50+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-structuring-by-ablation-of-the-resist-materials\/' title='Link to: Structuring by ablation of the resist materials'>Structuring by ablation of the resist materials<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8112 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T08:23:03+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-bleachable-resists\/' title='Link to: Bleachable resists'>Bleachable resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6768 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-04-25T17:05:05+01:00\" >25. April 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fluorescent-resist-structures-with-photoresists\/' title='Link to: Fluorescent resist structures with photoresists'>Fluorescent resist structures with photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6684 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-01-15T09:18:05+01:00\" >15. January 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-nanoimprint-lithography\/' title='Link to: Atlas 46 for nanoimprint lithography'>Atlas 46 for nanoimprint lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6073 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-07-04T08:48:43+01:00\" >4. July 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-surface-imaging-resist-system-sx-ar-n-7100-silylable-photoresist\/' title='Link to: Surface imaging resist system SX AR-N 7100 \u2013 silylable photoresist'>Surface imaging resist system SX AR-N 7100 \u2013 silylable photoresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5556 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-01-19T16:40:58+01:00\" >19. January 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/' title='Link to: Alkali-stable positive resist obtained after treatment with HMDS'>Alkali-stable positive resist obtained after treatment with HMDS<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5228 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:13:16+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/' title='Link to: Structuring of polyphthalaldehydes with photolithography'>Structuring of polyphthalaldehydes with photolithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5221 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:04:48+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ethanol-and-toluene-resistant-photoresist-ar-u-4060\/' title='Link to: Ethanol and toluene-resistant photoresist AR-U 4060'>Ethanol and toluene-resistant photoresist AR-U 4060<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5211 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T15:52:30+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-two-layer-photoresist-system-for-water-sensitive-substrates\/' title='Link to: Two-layer photoresist system for water-sensitive substrates'>Two-layer photoresist system for water-sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4987 av-magazine-format-standard av-magazine-type-post av-magazine-entry-16 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:17:07+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-car-pmma-resist-sx-ar-n-4810-1\/' title='Link to: Negative CAR PMMA resist SX AR-N 4810\/1'>Negative CAR PMMA resist SX AR-N 4810\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4725 av-magazine-format-standard av-magazine-type-post av-magazine-entry-17 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T11:07:52+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-water-based-resists\/' title='Link to: Water-based resists'>Water-based resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-18 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4544 av-magazine-format-standard av-magazine-type-post av-magazine-entry-19 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:37:41+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-aqueous-negative-resist-based-on-gelatine\/' title='Link to: Aqueous negative resist based on gelatine'>Aqueous negative resist based on gelatine<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-263 av-magazine-format-standard av-magazine-type-post av-magazine-entry-20 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:52:51+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-positive-polyimide-one-layer-resist\/' title='Link to: Positive polyimide one-layer resist'>Positive polyimide one-layer resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-264 av-magazine-format-standard av-magazine-type-post av-magazine-entry-21 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T09:28:11+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/' title='Link to: UV-structuring of PMMA resists'>UV-structuring of PMMA resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-262 av-magazine-format-standard av-magazine-type-post av-magazine-entry-22 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T09:12:54+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-polyimide-two-layer-systems\/' title='Link to: Polyimide two-layer systems'>Polyimide two-layer systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-260 av-magazine-format-standard av-magazine-type-post av-magazine-entry-23 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:17:51+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-near-infrarednir\/' title='Link to: Resist for near infrared (NIR)'>Resist for near infrared (NIR)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-267 av-magazine-format-standard av-magazine-type-post av-magazine-entry-24 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:09:16+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-two-layer-resist-system-for-hydrofluoric-acid-etching\/' title='Link to: Two-layer resist system for hydrofluoric acid etching'>Two-layer resist system for hydrofluoric acid etching<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>PPA layers are sensitive to light and can thus be structured directly by photolithography. Irradiation with light of wavelengths &lt; 300 nm (Hg vapour lamp) results in a cleavage of the polymer chains and the formation of volatile components that partly begin to evaporate even at room temperature.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Structuring of polyphthalaldehydes with photolithography<\/title>\n<meta name=\"description\" content=\"PPA layers are sensitive to light and can thus be structured directly by photolithography.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Structuring of polyphthalaldehydes with photolithography\" \/>\n<meta property=\"og:description\" content=\"PPA layers are sensitive to light and can thus be structured directly by photolithography.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2015-07-21T14:13:16+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-02-16T08:21:16+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1-270x190.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"6 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/\",\"name\":\"Structuring of polyphthalaldehydes with photolithography\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1-270x190.jpg\",\"datePublished\":\"2015-07-21T14:13:16+00:00\",\"dateModified\":\"2022-02-16T08:21:16+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"PPA layers are sensitive to light and can thus be structured directly by photolithography.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/07\/clip_image002-1.jpg\",\"width\":340,\"height\":239},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Structuring of polyphthalaldehydes with photolithography\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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