{"id":5350,"date":"2015-10-05T09:14:07","date_gmt":"2015-10-05T07:14:07","guid":{"rendered":"https:\/\/www.allresist.de?p=5350"},"modified":"2022-03-03T11:15:55","modified_gmt":"2022-03-03T10:15:55","slug":"resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/","title":{"rendered":"Conductivity under the application conditions of e-beam lithography"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-20pct2-9aefedd50cfc673d88f83fe3106ca09c\">\n.avia-section.av-20pct2-9aefedd50cfc673d88f83fe3106ca09c{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-20pct2-9aefedd50cfc673d88f83fe3106ca09c main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5350'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-itb9c6-c17919641d5724d46c616f9cabe313b3\">\n.flex_column.av-itb9c6-c17919641d5724d46c616f9cabe313b3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-itb9c6-c17919641d5724d46c616f9cabe313b3 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-h2r8t2-897eddad53b39e183c9eae9415c0fed8 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Conductivity under the application conditions of e-beam lithography<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-1mu64m-1cd523c18d878ccc055696a2e99989ff\">\n.flex_column.av-1mu64m-1cd523c18d878ccc055696a2e99989ff{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-1mu64m-1cd523c18d878ccc055696a2e99989ff av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-dh08xy-f9ce73de86a7561d01f9c94febfdb898  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-d79t7a-b132c885a748c3705bf6cf648d5e1082 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5350'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-aygn9i-97f318464fe67d8bc764d52bb3f9da50\">\n.flex_column.av-aygn9i-97f318464fe67d8bc764d52bb3f9da50{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-aygn9i-97f318464fe67d8bc764d52bb3f9da50 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8wftme-291dafe4ee5e6182b7765b32501dda0f '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity. After a softbake, the now almost anhydrous layer gradually takes up water at room temperature from the ambient air due to the slightly hygroscopic properties of the polymer. The measured resistance increases significantly. In order to assess the conductivity properties of Electra 92 under the conditions of e-beam lithography, Mr. Riebe (University of Potsdam) conducted corresponding measurements in a high vacuum. In these tests, Electra 92 was coated on quartz plates (film thickness about 190 nm), the polymer film contacted with clamps, and the measurement arrangement transferred into a vacuum chamber.<\/p>\n<p><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-2553\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg\" alt=\"Messanordnung-Bestimmung-Leitf\u00e4higkeit\" width=\"296\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg 296w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-600x385.jpg 600w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg 1072w\" sizes=\"(max-width: 296px) 100vw, 296px\" \/><\/a><\/p>\n<p><span class=\"bildunterschrift\">Measurement arrangement to determine the conductivity under vacuum conditions<\/span><\/p>\n<p>Under atmospheric conditions, a resistance of &gt; 21 M\u2126 was measured. The resistance decreased rapidly to 16.6 M\u2126 directly after applying the vacuum (2*10<sup>-3<\/sup>\u00a0Torr) and finally decreased further to about 12.7 M\u2126 (at 2*10<sup>-4<\/sup>\u00a0Torr). After ventilation, the measured resistance quickly increased again to 20 M\u2126.<\/p>\n<p>Interestingly, almost a doubling of the measured conductivity is observed in a vacuum (the resistance is accordingly halved). Under these conditions, the conductive layer is virtually anhydrous and thus shows a higher conductivity.<\/p>\n<p>In e-beam applications with a much stronger vacuum consequently a conductivity of up to about 1 S\/m can be assumed, which is completely sufficient for most applications.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-77xbp2-6f74172e643bcd34947d523dae4fa2e5\">\n.flex_column.av-77xbp2-6f74172e643bcd34947d523dae4fa2e5{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-77xbp2-6f74172e643bcd34947d523dae4fa2e5 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-66ql92-1754e0a5ecb3abce62ab76ded787207e '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Other Resists<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-43tehi-148f723e34b68c84908988be2ca4ce0d\">\n#top .hr.hr-invisible.av-43tehi-148f723e34b68c84908988be2ca4ce0d{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-43tehi-148f723e34b68c84908988be2ca4ce0d hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-32z3km-13a6b31277c181857fdb81e4e2da94aa  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17674 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-07-27T11:20:51+01:00\" >27. July 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/polyphthalaldehyde-based-electron-beam-resists-university-of-tubingen\/' title='Link to: Poly(phthalaldehyde)-based electron beam resists, University of T\u00fcbingen'>Poly(phthalaldehyde)-based electron beam resists, University of T\u00fcbingen<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17003 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-22T11:12:11+01:00\" >22. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ppa-for-two-layer-applications\/' title='Link to: PPA for two layer applications'>PPA for two layer applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8122 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:07:57+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/car-44-fuer-die-e-beam-lithographie\/' title='Link to: CAR 44 for e-beam lithography'>CAR 44 for e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-7008 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:06:07+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/' title='Link to: Atlas 46 for e-beam lithography'>Atlas 46 for e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8115 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:52:51+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-phoenix-81-storage-conditions-and-dispatch\/' title='Link to: Phoenix 81 \u2013 Storage conditions and dispatch'>Phoenix 81 \u2013 Storage conditions and dispatch<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8104 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-10-11T16:37:51+01:00\" >11. October 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fluorescent-resist-structures\/' title='Link to: Fluorescent resist structures'>Fluorescent resist structures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6370 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-02-03T14:35:15+01:00\" >3. February 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-e-beamresist\/' title='Link to: Top Surface Imaging E-Beamresist'>Top Surface Imaging E-Beamresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:24:51+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-pmma-lift-off-structures-on-semi-precious-stone-substrates-using-electra-92\/' title='Link to: PMMA lift-off structures on semi-precious stone substrates using Electra 92'>PMMA lift-off structures on semi-precious stone substrates using Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5354 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:20:09+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-electra-92-variant-optimised-for-applications-on-novolac-based-resists\/' title='Link to: Electra 92 variant optimised for applications on novolac-based resists'>Electra 92 variant optimised for applications on novolac-based resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:14:07+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/' title='Link to: Conductivity under the application conditions of e-beam lithography'>Conductivity under the application conditions of e-beam lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5346 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-10-05T09:10:05+01:00\" >5. October 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-long-term-stability-of-electra-92\/' title='Link to: Long-term stability of Electra 92'>Long-term stability of Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5226 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:11:37+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-polyphthalaldehyde-based-electron-beam-resists\/' title='Link to: Poly(phthalaldehyde)-based electron beam resists'>Poly(phthalaldehyde)-based electron beam resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5223 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:09:56+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resists-for-novel-applications-in-lithography-thermally-structurable-polymers\/' title='Link to: Resists for novel applications in lithography \u2013 thermally structurable polymers'>Resists for novel applications in lithography \u2013 thermally structurable polymers<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5219 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:02:19+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-patterning-of-the-conductive-protective-coating-electra-92\/' title='Link to: Patterning of the conductive protective coating Electra 92'>Patterning of the conductive protective coating Electra 92<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5214 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T15:58:06+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-on-quartz-with-electra-92-on-hsq-resists\/' title='Link to: High resolution on quartz with Electra 92 on HSQ resists'>High resolution on quartz with Electra 92 on HSQ resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity. After a softbake, the now almost anhydrous layer gradually takes up water at room temperature from the ambient air due to the slightly hygroscopic properties of the polymer.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[118],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Conductivity under the application conditions of e-beam lithography<\/title>\n<meta name=\"description\" content=\"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Conductivity under the application conditions of e-beam lithography\" \/>\n<meta property=\"og:description\" content=\"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2015-10-05T07:14:07+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-03-03T10:15:55+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/\",\"name\":\"Conductivity under the application conditions of e-beam lithography\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg\",\"datePublished\":\"2015-10-05T07:14:07+00:00\",\"dateModified\":\"2022-03-03T10:15:55+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg\",\"width\":1072,\"height\":687},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Conductivity under the application conditions of e-beam lithography\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - Strausberg, Germany\",\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.allresist.com\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"en-GB\"},{\"@type\":\"Person\",\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\",\"name\":\"AllAdmin\",\"url\":\"https:\/\/www.allresist.com\/author\/alladmin\/\"}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Conductivity under the application conditions of e-beam lithography","description":"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/","og_locale":"en_GB","og_type":"article","og_title":"Conductivity under the application conditions of e-beam lithography","og_description":"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.","og_url":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/","og_site_name":"Allresist EN","article_published_time":"2015-10-05T07:14:07+00:00","article_modified_time":"2022-03-03T10:15:55+00:00","og_image":[{"url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg"}],"author":"AllAdmin","twitter_misc":{"Written by":"AllAdmin","Estimated reading time":"5 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/","url":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/","name":"Conductivity under the application conditions of e-beam lithography","isPartOf":{"@id":"https:\/\/www.allresist.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage"},"image":{"@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage"},"thumbnailUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit-296x190.jpg","datePublished":"2015-10-05T07:14:07+00:00","dateModified":"2022-03-03T10:15:55+00:00","author":{"@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8"},"description":"The measured conductivity of resist layers is strongly influenced not only by the temperature but also directly dependent on the air humidity.","breadcrumb":{"@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#breadcrumb"},"inLanguage":"en-GB","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/"]}]},{"@type":"ImageObject","inLanguage":"en-GB","@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#primaryimage","url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg","contentUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2015\/10\/messanordnung-bestimmung-leitfaehigkeit.jpg","width":1072,"height":687},{"@type":"BreadcrumbList","@id":"https:\/\/www.allresist.com\/resist-wiki-conductivity-under-the-application-conditions-of-e-beam-lithography\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.allresist.com\/home\/"},{"@type":"ListItem","position":2,"name":"Conductivity under the application conditions of e-beam lithography"}]},{"@type":"WebSite","@id":"https:\/\/www.allresist.com\/#website","url":"https:\/\/www.allresist.com\/","name":"Allresist EN","description":"ALLRESIST GmbH - Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8","name":"AllAdmin","url":"https:\/\/www.allresist.com\/author\/alladmin\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/5350"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=5350"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/5350\/revisions"}],"predecessor-version":[{"id":16903,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/5350\/revisions\/16903"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=5350"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=5350"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=5350"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}