{"id":5556,"date":"2016-01-19T16:40:58","date_gmt":"2016-01-19T14:40:58","guid":{"rendered":"https:\/\/www.allresist.de?p=5556"},"modified":"2022-06-16T12:16:33","modified_gmt":"2022-06-16T11:16:33","slug":"resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/","title":{"rendered":"Alkali-stable positive resist obtained after treatment with HMDS"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kbi4z8-5589315db74b44ced5fad541dba71285\">\n.avia-section.av-kbi4z8-5589315db74b44ced5fad541dba71285{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kbi4z8-5589315db74b44ced5fad541dba71285 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5556'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jo4vhg-35c9c1ee29bbe494d67edacc0eb5ef17\">\n.flex_column.av-jo4vhg-35c9c1ee29bbe494d67edacc0eb5ef17{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jo4vhg-35c9c1ee29bbe494d67edacc0eb5ef17 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hcvej8-062de4b19dc6cbed6fc574f36ad62afc '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Alkali-stable positive resist obtained after treatment with HMDS<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-g210no-a1c3a703eed882dd8eba3335d03827e4\">\n.flex_column.av-g210no-a1c3a703eed882dd8eba3335d03827e4{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-g210no-a1c3a703eed882dd8eba3335d03827e4 av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1dj63o-dd2389d433471c477d07086e3cd22b25  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-cwg5l0-7122bd9efa48c3d3ff2066884fc7040f main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-5556'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-axfs9g-a65fcf2c9663011d804e13689dc2c872\">\n.flex_column.av-axfs9g-a65fcf2c9663011d804e13689dc2c872{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-axfs9g-a65fcf2c9663011d804e13689dc2c872 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-9814xg-dee605397bf28db5eff9c08d4b2e259b '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p><span style=\"color: #333333\">A large variety of applications include a wet-chemical etching step which very often involves highly alkaline etching baths. While for example negative resists of the\u00a0<\/span>CAR44<span style=\"color: #333333\">\u00a0series can easily be stabilised by a subsequent flood exposure and hard bake against alkaline conditions, a simple hard bake of positive resists is not sufficient to obtain the desired effect since in this case no stabilising crosslinking takes place. A stabilisation can however be achieved by blocking the reactive alkali-soluble groups in the resist layer. The example of\u00a0<\/span>AR-P 3210<span style=\"color: #333333\">\u00a0successfully showed that (already developed) resist structures can sufficiently be stabilised against alkaline solutions such as IPA, PMA and acetone by a subsequent silylation with HMDS. <\/span><\/p>\n<p>Resist structures have been stable in the solvents for several days. For this purpose, it was initially necessary to activate the patterned resist layer by flood exposure. Due to the intense exposure, the photosensitive component (DNQ) is at first converted into indene carboxylic acid. At temperatures in a range between 110 \u00b0C \u2013 120 \u00b0C, HMDS (gas phase) silylates both the OH-groups of the novolac as well as the indene carboxylic acid, thus making them insoluble in these solvents.<\/p>\n<p>Likewise, this treatment increased the alkali stability. Individual samples could remain in 0,5 n NaOH for several hours without impact, but will nevertheless still not withstand a silicon etch (40 % KOH at 85 \u00b0C).<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-83qqf8-bae968983711486f5d1f92c3a927bb2d\">\n.flex_column.av-83qqf8-bae968983711486f5d1f92c3a927bb2d{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-83qqf8-bae968983711486f5d1f92c3a927bb2d av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-60leg4-405c76d55f55f929c8c27f0acac64288 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Other Resists<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-4i7gc4-598c6a349218fd510c46c641874570aa\">\n#top .hr.hr-invisible.av-4i7gc4-598c6a349218fd510c46c641874570aa{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-4i7gc4-598c6a349218fd510c46c641874570aa hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2zfkok-6025e8aa7a3573443dda3c4b1f8dbd92  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17456 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-07T11:09:22+01:00\" >7. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/laser-ablation-of-ppa-phoenix-81\/' title='Link to: Laser ablation of PPA (Phoenix 81)'>Laser ablation of PPA (Phoenix 81)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17445 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-07T10:16:06+01:00\" >7. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/atlas-46-in-general\/' title='Link to: ATLAS 46 in general'>ATLAS 46 in general<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17432 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-01T12:30:36+01:00\" >1. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/black-resist\/' title='Link to: Black resist'>Black resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17426 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-06-01T11:20:07+01:00\" >1. June 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/general-resist-composition\/' title='Link to: General: Resist composition'>General: Resist composition<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:41:18+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/waterfree-developable-special-resist-sx-ar-n-4810-1\/' title='Link to: Waterfree developable special resist SX AR-N 4810\/1'>Waterfree developable special resist SX AR-N 4810\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-17350 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-05-19T11:02:40+01:00\" >19. May 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/top-surface-imaging-photoresist-principles\/' title='Link to: Top surface imaging (TSI) photoresist &#8211; principles'>Top surface imaging (TSI) photoresist &#8211; principles<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8116 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T14:18:50+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-structuring-by-ablation-of-the-resist-materials\/' title='Link to: Structuring by ablation of the resist materials'>Structuring by ablation of the resist materials<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8112 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T08:23:03+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-bleachable-resists\/' title='Link to: Bleachable resists'>Bleachable resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6768 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-04-25T17:05:05+01:00\" >25. April 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-fluorescent-resist-structures-with-photoresists\/' title='Link to: Fluorescent resist structures with photoresists'>Fluorescent resist structures with photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6684 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-01-15T09:18:05+01:00\" >15. January 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-nanoimprint-lithography\/' title='Link to: Atlas 46 for nanoimprint lithography'>Atlas 46 for nanoimprint lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6073 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-07-04T08:48:43+01:00\" >4. July 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-surface-imaging-resist-system-sx-ar-n-7100-silylable-photoresist\/' title='Link to: Surface imaging resist system SX AR-N 7100 \u2013 silylable photoresist'>Surface imaging resist system SX AR-N 7100 \u2013 silylable photoresist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5556 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-01-19T16:40:58+01:00\" >19. January 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/' title='Link to: Alkali-stable positive resist obtained after treatment with HMDS'>Alkali-stable positive resist obtained after treatment with HMDS<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5228 av-magazine-format-standard av-magazine-type-post av-magazine-entry-13 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:13:16+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-structuring-of-polyphthalaldehydes-with-photolithography\/' title='Link to: Structuring of polyphthalaldehydes with photolithography'>Structuring of polyphthalaldehydes with photolithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5221 av-magazine-format-standard av-magazine-type-post av-magazine-entry-14 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T16:04:48+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ethanol-and-toluene-resistant-photoresist-ar-u-4060\/' title='Link to: Ethanol and toluene-resistant photoresist AR-U 4060'>Ethanol and toluene-resistant photoresist AR-U 4060<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5211 av-magazine-format-standard av-magazine-type-post av-magazine-entry-15 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-07-21T15:52:30+01:00\" >21. July 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-two-layer-photoresist-system-for-water-sensitive-substrates\/' title='Link to: Two-layer photoresist system for water-sensitive substrates'>Two-layer photoresist system for water-sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4987 av-magazine-format-standard av-magazine-type-post av-magazine-entry-16 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:17:07+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-negative-car-pmma-resist-sx-ar-n-4810-1\/' title='Link to: Negative CAR PMMA resist SX AR-N 4810\/1'>Negative CAR PMMA resist SX AR-N 4810\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4725 av-magazine-format-standard av-magazine-type-post av-magazine-entry-17 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T11:07:52+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-water-based-resists\/' title='Link to: Water-based resists'>Water-based resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4712 av-magazine-format-standard av-magazine-type-post av-magazine-entry-18 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:47:40+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/thermostable-photoresists\/' title='Link to: Thermostable photoresists'>Thermostable photoresists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4544 av-magazine-format-standard av-magazine-type-post av-magazine-entry-19 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:37:41+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-aqueous-negative-resist-based-on-gelatine\/' title='Link to: Aqueous negative resist based on gelatine'>Aqueous negative resist based on gelatine<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-263 av-magazine-format-standard av-magazine-type-post av-magazine-entry-20 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:52:51+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-positive-polyimide-one-layer-resist\/' title='Link to: Positive polyimide one-layer resist'>Positive polyimide one-layer resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-264 av-magazine-format-standard av-magazine-type-post av-magazine-entry-21 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T09:28:11+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-uv-structuring-of-pmma-resists\/' title='Link to: UV-structuring of PMMA resists'>UV-structuring of PMMA resists<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-262 av-magazine-format-standard av-magazine-type-post av-magazine-entry-22 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T09:12:54+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-polyimide-two-layer-systems\/' title='Link to: Polyimide two-layer systems'>Polyimide two-layer systems<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-260 av-magazine-format-standard av-magazine-type-post av-magazine-entry-23 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:17:51+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-resist-for-near-infrarednir\/' title='Link to: Resist for near infrared (NIR)'>Resist for near infrared (NIR)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-267 av-magazine-format-standard av-magazine-type-post av-magazine-entry-24 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-16T10:09:16+01:00\" >16. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-two-layer-resist-system-for-hydrofluoric-acid-etching\/' title='Link to: Two-layer resist system for hydrofluoric acid etching'>Two-layer resist system for hydrofluoric acid etching<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>A large variety of applications include a wet-chemical etching step which very often involves highly alkaline etching baths.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[119,70],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Alkali-stable positive resist obtained after treatment with HMDS<\/title>\n<meta name=\"description\" content=\"A large variety of applications include a wet-chemical etching step which very often involves highly alkaline etching baths.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Alkali-stable positive resist obtained after treatment with HMDS\" \/>\n<meta property=\"og:description\" content=\"A large variety of applications include a wet-chemical etching step which very often involves highly alkaline etching baths.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2016-01-19T14:40:58+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-06-16T11:16:33+00:00\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"5 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/\",\"name\":\"Alkali-stable positive resist obtained after treatment with HMDS\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"datePublished\":\"2016-01-19T14:40:58+00:00\",\"dateModified\":\"2022-06-16T11:16:33+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"A large variety of applications include a wet-chemical etching step which very often involves highly alkaline etching baths.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/\"]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-alkali-stable-positive-resist-obtained-after-treatment-with-hmds\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Alkali-stable positive resist obtained after treatment with HMDS\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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