{"id":6042,"date":"2016-07-04T08:20:24","date_gmt":"2016-07-04T06:20:24","guid":{"rendered":"https:\/\/www.allresist.de?p=6042"},"modified":"2020-02-26T13:17:52","modified_gmt":"2020-02-26T12:17:52","slug":"resist-wiki-interference-lithography","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/","title":{"rendered":"Interference lithography"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-k8ep0a-d7b3420114503078084bd7a696e29be8\">\n.avia-section.av-k8ep0a-d7b3420114503078084bd7a696e29be8{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-k8ep0a-d7b3420114503078084bd7a696e29be8 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6042'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-im0hzu-81f52c2861bbda91ac925a4c818649b0\">\n.flex_column.av-im0hzu-81f52c2861bbda91ac925a4c818649b0{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-im0hzu-81f52c2861bbda91ac925a4c818649b0 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-1rp2yi-2bbc9689de9e737b5c9fe950a75a51ec '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Interference lithography<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-f9d7yy-441c98761e12a2643989e6626c50cccc\">\n.flex_column.av-f9d7yy-441c98761e12a2643989e6626c50cccc{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-f9d7yy-441c98761e12a2643989e6626c50cccc av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-dltg1m-3f5f022e16b5a5045fc0b48e2499d36c  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-czrz8a-bb618b83eeda44089ac2efb61adf4b5c main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6042'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-avcs0q-6950a780ddb6b273233da7bf9bff0824\">\n.flex_column.av-avcs0q-6950a780ddb6b273233da7bf9bff0824{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-avcs0q-6950a780ddb6b273233da7bf9bff0824 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-v1gfe-5b8da88b8184264cc28f95248b83f1b1 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">Interference lithography is a less frequently used method for patterning. The basic principle is the same as in interferometry or also in holography. The superposition of two or more coherent light waves creates a periodic interference pattern consisting of a series of intensity maxima and minima (superposition or extinction), which can then be transferred into light-sensitive films (photoresists). In the case of two-beam interference, a fringe-to-fringe spacing or period<span class=\"s1\">\u00a0of (\u03bb\/2)\/sin(\u03b8\/<\/span>2) results, whereby<span class=\"s1\">\u00a0\u03b8 is the angle between the waves\u00a0<\/span>superimposed on each other\u00a0<span class=\"s1\">and \u03bb the waveleng<\/span>th of light used. The smallest possible period is determined by the wavelength and given as\u00a0<span class=\"s1\">\u03bb<\/span>\/2. If laser light is used for interference lithography, periodic structures with minimum sizes down to about 100 nm can be produced. Since whole wafers can be exposed at once, the throughput is high and the process accordingly very cost-efficient. Disadvantageously however is that this method is limited to one- or two-dimensional periodic grids. Interference lithography is nevertheless the method of choice for the fabrication of submicron gratings, since no other process enables such high-quality lattices on large surfaces.<span class=\"s2\">\u00a0[Reference: Dissertation \u201cInterferenzlithographisch strukturierte Oberfl\u00e4chen f\u00fcr lichtemittierende Bauelemente\u201c; Dipl.-Phys. Ulf Geyer; University of Karlsruhe (TH), Department of Electrical Engineering and Information Technology; 2009]<\/span><\/p>\n<p class=\"p1\">At the Chinese Academy of Sciences (CAS), sub-\u00b5m gratings with a high resolution of up to 70 nm (line width) could be realized with AR-P 3840. Excerpt from a report by Dai Longgui, Ding Peng and Prof. Chen Hong (Renewable Energy Laboratory, Institute of Physics, IOP): \u201c<i>Using laser interference lithography, we produced sub-\u00b5m photoresist gratings in silicon. We easily managed to generate various sub-\u00b5m periods of 200 to 800 nm. The different gratings could be obtained by varying the interference angle, the exposure dose and the development conditions. Details of the process parameters are presented in the following table<\/i>:\u201d<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2977 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-345x146.jpg\" sizes=\"(max-width: 345px) 100vw, 345px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-345x146.jpg 345w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-768x324.jpg 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-600x253.jpg 600w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg 1045w\" alt=\"Process-parameters-of-laser-interference-lithography\" width=\"345\" height=\"146\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Table 1:\u00a0Process parameters of laser interference lithography with positive resist AR-P 3840<\/span><\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2959 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography-345x67.jpg\" sizes=\"(max-width: 345px) 100vw, 345px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography-345x67.jpg 345w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography-768x149.jpg 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography-600x117.jpg 600w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/experimental-setup-for-laser-interference-lithography.jpg 936w\" alt=\"Experimental-setup-for-laser-interference-lithography\" width=\"345\" height=\"67\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 1:\u00a0Experimental setup for laser interference lithography<\/span><\/p>\n<p class=\"p1\">The following figures demonstrate a selection of the highly regular lattice structures which can be obtained. At a film thickness of 111 nm, the period is 181 nm with a line width of about 100 nm or a period of 323 nm with a line width of only 72 nm!<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/photoresist-grid-with-180-nm-period.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2963 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/photoresist-grid-with-180-nm-period-279x190.jpg\" sizes=\"(max-width: 279px) 100vw, 279px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/photoresist-grid-with-180-nm-period-279x190.jpg 279w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/photoresist-grid-with-180-nm-period-588x400.jpg 588w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/photoresist-grid-with-180-nm-period.jpg 675w\" alt=\"Photoresist-grid-with-180-nm-period\" width=\"279\" height=\"190\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 2:\u00a0Photoresist grid with 180-nm period<\/span><\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/323-nm-period-with-72-nm-line-width.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2957 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/323-nm-period-with-72-nm-line-width-278x190.jpg\" sizes=\"(max-width: 278px) 100vw, 278px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/323-nm-period-with-72-nm-line-width-278x190.jpg 278w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/323-nm-period-with-72-nm-line-width-586x400.jpg 586w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/323-nm-period-with-72-nm-line-width.jpg 678w\" alt=\"323-nm-period-with-72-nm-line-width\" width=\"278\" height=\"190\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 3:\u00a0323-nm period with 72-nm line width<\/span><\/p>\n<p class=\"p1\">Also negative photoresists are suitable for interference lithography. In this case, resist which were crosslinked via the mechanism of chemical amplification (CAR) yield particularly smooth edges and show no distinct first interference minimum in the developed structures. By using a special version of our standard resist AR-N 4340 (SX AR-N 4340\/8), interference lithography could also successfully be carried out under white light conditions (MLU Halle; Center for Material Science, Dr. Fuhrmann):<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2972 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures-253x190.jpg\" sizes=\"(max-width: 253px) 100vw, 253px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures-253x190.jpg 253w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures-768x576.jpg 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures-533x400.jpg 533w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/sxar-n4340-8_line-structures.jpg 864w\" alt=\"SXAR-N4340-8_Line-structures\" width=\"253\" height=\"190\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 4: SX AR-N 4340\/8 line structures with 57 nm line diameter at a film thickness of 191 nm; further parameters: 232 nm period, angle: 35\u00b0, exposure for 750 s at 266 nm with an output power of about 0.01 mW\/cm<sup>2<\/sup>, PEB for 10 minutes at 100 \u00b0C; development: 90 s with AR 300-47 (diluted 1:1).<\/span><\/p>\n<p class=\"p1\">Beautiful and even line structures with vertical walls were produced in this case. At a period of 232 nm, an excellent resolution of only 57 nm was realised!<\/p>\n<p class=\"p1\">Also negative resists which do not crosslink via a CAR-mechanism can be used for laser interference lithography. Our negative resist AR-N 4240 is for example used on a standard basis for lift-off processes. The undercut resulting from standing waves is desired in this case, but nevertheless limits the resolution.<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2974 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240-345x139.jpg\" sizes=\"(max-width: 345px) 100vw, 345px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240-345x139.jpg 345w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240-768x310.jpg 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240-600x242.jpg 600w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/typical-edge-profile-ar-n-4240.jpg 1240w\" alt=\"Typical-edge-profile-AR-N 4240\" width=\"345\" height=\"139\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 5: Typical edge profile of AR-N 4240 (MLU Halle, dilution 1: 2 with AR 300-12, 4000 rpm, SB 85 \u00b0C, exposure: 160 s with about 16-20 mJ at 266 nm, PEB 30 min at 85 \u00b0C; development: 30 s with AR 300-475).<\/span><\/p>\n<p class=\"p1\">The edge shape can be selectively adjusted by varying the PEB temperature.<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/processed-structures.jpg\"><img decoding=\"async\" class=\"alignnone wp-image-2965 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/processed-structures-107x190.jpg\" sizes=\"(max-width: 107px) 100vw, 107px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/processed-structures-107x190.jpg 107w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/processed-structures-226x400.jpg 226w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/processed-structures.jpg 624w\" alt=\"Processed structures\" width=\"107\" height=\"190\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Fig. 6: Processed structures from top to bottom: PEB at 90, 95, 100, 105 and 110 \u00b0C, respectively.<\/span><\/p>\n<p>In order to reduce the processing times, the PEB time was shortened to 5 minutes each while the temperature was simultaneously increased in 5 \u00b0C-steps. At a PEB of 90 \u00b0C, stripes deriving from the first minimum dissolve. Between 95 and 100 \u00b0C, resist profiles are comparable to those obtained under standard conditions. At 105 \u00b0C, the narrowing at the first minimum disappears, and at 110 \u00b0C, the structures could no longer be developed. Optimal turned out to be a PEB temperature of 105 \u00b0C. The undercut disappears completely at this temperature, which allows for smaller periods and makes AR-N 4240 suitable for reactive iron etching (RIE) processes.<\/p>\n<p><span class=\"bildunterschrift\">Further reference (MLU): Johannes de Boor, Nadine Geyer, J\u00f6rg V. Witteman, Ulrich G\u00f6sele and Volker Schmidt: \u201eSub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching\u201c Nanotechnology 21 (2010) 095302 (5pp); doi: 10.1088 \/ 0957-4484 \/ 21\/9\/095302<\/span><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-7q326i-60bdc7709073de4dbd9790c2b3ff4c49\">\n.flex_column.av-7q326i-60bdc7709073de4dbd9790c2b3ff4c49{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-7q326i-60bdc7709073de4dbd9790c2b3ff4c49 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-66xgp6-1e374313b961ed407d4934d4d0792750 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h4 style=\"text-align: left;\">Overview General Process<\/h4>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-4n0fka-e6c0b585229c084b8499c6ef31b70829\">\n#top .hr.hr-invisible.av-4n0fka-e6c0b585229c084b8499c6ef31b70829{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-4n0fka-e6c0b585229c084b8499c6ef31b70829 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-2h12qy-0b90ca3468411ef5d4ef2885d914eac0  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-6042 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-07-04T08:20:24+01:00\" >4. July 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/' title='Link to: Interference lithography'>Interference lithography<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5558 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-01-19T16:46:05+01:00\" >19. January 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-determining-the-conductivity-of-electra-92-layers-on-glass\/' title='Link to: Determining the conductivity of Electra 92 layers on glass'>Determining the conductivity of Electra 92 layers on glass<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4983 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:11:14+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-stabilisation-hardening-of-resist-films\/' title='Link to: Stabilisation\/ hardening of resist films'>Stabilisation\/ hardening of resist films<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10368 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:32:09+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-aluminium-structures-developed-directly\/' title='Link to: Aluminium structures developed directly'>Aluminium structures developed directly<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10363 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:03:13+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-exposure\/' title='Link to: Exposure'>Exposure<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10364 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T11:12:54+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-wet-chemical-etching\/' title='Link to: Wet chemical etching'>Wet chemical etching<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-223 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-08-31T06:57:34+01:00\" >31. August 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemical-dry-etching\/' title='Link to: Chemical dry etching'>Chemical dry etching<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10362 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-30T07:55:21+01:00\" >30. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-uv-curing\/' title='Link to: UV-curing'>UV-curing<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Interference lithography is a less frequently used method for patterning. The basic principle is the same as in interferometry or also in holography.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[112,58],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Resist-Wiki: Interferenzlithographie - Allresist DE<\/title>\n<meta name=\"description\" content=\"Interference lithography\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Resist-Wiki: Interferenzlithographie - Allresist DE\" \/>\n<meta property=\"og:description\" content=\"Interference lithography\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2016-07-04T06:20:24+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2020-02-26T12:17:52+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-345x146.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"7 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/\",\"name\":\"Resist-Wiki: Interferenzlithographie - Allresist DE\",\"isPartOf\":{\"@id\":\"https:\/\/www.allresist.com\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-345x146.jpg\",\"datePublished\":\"2016-07-04T06:20:24+00:00\",\"dateModified\":\"2020-02-26T12:17:52+00:00\",\"author\":{\"@id\":\"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8\"},\"description\":\"Interference lithography\",\"breadcrumb\":{\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#breadcrumb\"},\"inLanguage\":\"en-GB\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en-GB\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage\",\"url\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg\",\"contentUrl\":\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg\",\"width\":1045,\"height\":441},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.allresist.com\/home\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Interference lithography\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.allresist.com\/#website\",\"url\":\"https:\/\/www.allresist.com\/\",\"name\":\"Allresist EN\",\"description\":\"ALLRESIST GmbH - 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Allresist DE","isPartOf":{"@id":"https:\/\/www.allresist.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage"},"image":{"@id":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage"},"thumbnailUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1-345x146.jpg","datePublished":"2016-07-04T06:20:24+00:00","dateModified":"2020-02-26T12:17:52+00:00","author":{"@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8"},"description":"Interference lithography","breadcrumb":{"@id":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#breadcrumb"},"inLanguage":"en-GB","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/"]}]},{"@type":"ImageObject","inLanguage":"en-GB","@id":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#primaryimage","url":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg","contentUrl":"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/07\/process-parameters-of-laser-interference-lithography-1.jpg","width":1045,"height":441},{"@type":"BreadcrumbList","@id":"https:\/\/www.allresist.com\/resist-wiki-interference-lithography\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.allresist.com\/home\/"},{"@type":"ListItem","position":2,"name":"Interference lithography"}]},{"@type":"WebSite","@id":"https:\/\/www.allresist.com\/#website","url":"https:\/\/www.allresist.com\/","name":"Allresist EN","description":"ALLRESIST GmbH - Strausberg, Germany","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.allresist.com\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-GB"},{"@type":"Person","@id":"https:\/\/www.allresist.com\/#\/schema\/person\/5d838b413541e18a3d6cbcfc5854bba8","name":"AllAdmin","url":"https:\/\/www.allresist.com\/author\/alladmin\/"}]}},"_links":{"self":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/6042"}],"collection":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/comments?post=6042"}],"version-history":[{"count":2,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/6042\/revisions"}],"predecessor-version":[{"id":13896,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/posts\/6042\/revisions\/13896"}],"wp:attachment":[{"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/media?parent=6042"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/categories?post=6042"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.allresist.com\/wp-json\/wp\/v2\/tags?post=6042"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}