{"id":6139,"date":"2016-09-29T12:15:07","date_gmt":"2016-09-29T10:15:07","guid":{"rendered":"https:\/\/www.allresist.de?p=6139"},"modified":"2022-04-05T12:32:45","modified_gmt":"2022-04-05T11:32:45","slug":"resist-wiki-evaluation-of-various-developers-for-e-beam-exposed-csar-62-layers-100-kv-2","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-evaluation-of-various-developers-for-e-beam-exposed-csar-62-layers-100-kv-2\/","title":{"rendered":"Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-kqqf2z-d72e755b9e89418baf78447c2a3e80d1\">\n.avia-section.av-kqqf2z-d72e755b9e89418baf78447c2a3e80d1{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-kqqf2z-d72e755b9e89418baf78447c2a3e80d1 main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6139'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jsghsb-8cdd9519c4eeda37b2e4b7674cbdb247\">\n.flex_column.av-jsghsb-8cdd9519c4eeda37b2e4b7674cbdb247{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jsghsb-8cdd9519c4eeda37b2e4b7674cbdb247 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hsrou3-51b0f5a7f6c9a0342338805d075a072c '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-fhrne3-bf548bcffce61b4f949afb9fb2a417fc\">\n.flex_column.av-fhrne3-bf548bcffce61b4f949afb9fb2a417fc{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-fhrne3-bf548bcffce61b4f949afb9fb2a417fc av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-dqkwyj-69065fe19354ceaabbf84354aabc0832  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-ciy217-f8535412381da8a1ea3942793abb8229 main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6139'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-ajxwff-17f13e6cff609271aad3da34489ace74\">\n.flex_column.av-ajxwff-17f13e6cff609271aad3da34489ace74{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-ajxwff-17f13e6cff609271aad3da34489ace74 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-9a5o0b-7be4d0061c31779bf14217aedb475674 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">To evaluate the suitability of various developers for CSAR 62, Dr. Lothar Hahn (Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology) kindly provided various substrates which had previously been exposed to 100 kV e-beam irradiation (dose variations). The substrates were developed for 60 s in different standard developers and other solvents (indicated is in each case only the main solvent as e.g. MIBK, but not minor additions of other solvents), developed, and the development was stopped in IPA. The layer thickness was scanned using a Dektak 150. If the measured layer thickness divided by the respective initial layer thickness (D\/D<sub>0<\/sub>) is plotted against the radiation dose, characteristic gradation curves for each developer are obtained. The steeper the curve, the higher is the contrast of the developer used. Weaker, high-contrast developer cause no or only low dark erosion (development of unexposed areas). In the case of\u00a0<b>AR 600-546<\/b>\u00a0(amyl acetate) and\u00a0<b>X AR 600-546\/1<\/b>\u00a0(hexyl acetate), an additional rinsing step for 10 s with pure MIBK was conducted after development prior to the stopping with IPA to ensure a complete, particle-free development.<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62.png\"><img decoding=\"async\" class=\"alignnone wp-image-3027 size-medium\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62-272x190.png\" alt=\"dosisstaffel_fuer_csar-62\" width=\"272\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62-272x190.png 272w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62-768x537.png 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62-573x400.png 573w\" sizes=\"(max-width: 272px) 100vw, 272px\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves of selected, high-contrast developers, SB 180 \u00b0C, film thickness: ~240 nm, 100 kV, development time 60 s each at 21.5 \u00b0C, stopper IPA.<\/span><\/p>\n<p class=\"p3\">Of all investigated high-contrast developers, MIBK turned out to be the strongest developer with a dose to clear of about 150 \u00b5C\/cm<sup>2<\/sup>. The developers o-xylene and\u00a0<b>AR 600-546<\/b>\u00a0(standard developer) yield comparable sensitivities of about 230 \u00b5C\/cm<sup>2<\/sup>, whereby amyl acetate leads to a higher contrast than o-xylene. The solvents methyl trimethylacetate and octyl acetate also provide a high-contrast development, are however significantly less sensitive than the standard developer. Developer\u00a0<b>AR 600-55<\/b>\u00a0which is generally used for PMMA films is not suitable for CSAR 62, since even at a dose of 600 \u00b5C\/cm<sup>2<\/sup>\u00a0no complete development was observed.<\/p>\n<p class=\"p5\">Higher sensitivity values can generally be obtained if the development time is extended to 3 minutes. The contrast is in this case slightly reduced since the development process begins already at lower exposure doses (earlier onset).<\/p>\n<p class=\"p5\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3021\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_2-272x190.png\" alt=\"dosisstaffel_fuer_csar-62_2\" width=\"272\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_2-272x190.png 272w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_2-768x537.png 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_2-573x400.png 573w\" sizes=\"(max-width: 272px) 100vw, 272px\" \/><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves of selected, high-contrast developers, SB 180\u00b0C, film thickness: ~240 nm, 100 kV, development times 60 s each at 21.5 \u00b0C, stopper IPA.<\/span><\/p>\n<p class=\"p3\">If strong developers are used for the development of CSAR 62, the resulting contrast is lower, but at the same time the sensitivity increases. The writing times can thus be reduced in particular for larger exposed areas, but a considerable amount of dark erosion has to be taken into account.<\/p>\n<p class=\"p5\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3022\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_3-241x190.png\" alt=\"dosisstaffel_fuer_csar-62_3\" width=\"241\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_3-241x190.png 241w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_3-507x400.png 507w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_3.png 646w\" sizes=\"(max-width: 241px) 100vw, 241px\" \/><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves of selected strong developers (reference MIBK), SB 180 \u00b0C, film thickness: ~240 nm, 100 kV, development times 60 s each at 21.5 \u00b0C, stopper IPA.<\/span><\/p>\n<p class=\"p3\"><b>AR 600-548<\/b>\u00a0showed the highest sensitivity of 50 \u00b5C\/cm<sup>2<\/sup>, and the dark erosion can substantially be reduced if shorter development times are chosen. The strong special developer\u00a0<b>X AR 300-12\/21<\/b>\u00a0(containing PGMEA) causes a lower dark erosion as compared to\u00a0<b>AR 600-548\u00a0<\/b>and is approximately as sensitive as the standard developer\u00a0<b>AR 600-549\u00a0<\/b>(dose to clear of about 125 \u00b5C\/cm<sup>2<\/sup>). Also the ethylbenzene-based developer\u00a0<b>X AR 300-74\/1<\/b>\u00a0is well suited for a sensitive development of CSAR 62 (dose to clear &lt; 125 \u00b5C\/cm<sup>2<\/sup>). Generally are higher sensitivities observed if the development time is extended to 3 minutes; the dose to clear is significantly reduced.<\/p>\n<p class=\"p5\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3023\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_4-268x190.png\" alt=\"dosisstaffel_fuer_csar-62_4\" width=\"268\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_4-268x190.png 268w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_4-564x400.png 564w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_4.png 723w\" sizes=\"(max-width: 268px) 100vw, 268px\" \/><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves of different strong developers, SB 180 \u00b0C, film thickness: ~240 nm, 100 kV, development times 60 s and 180 s in comparison (21.5 \u00b0C), stopper IPA.<\/span><\/p>\n<p class=\"p2\">If developer\u00a0<b>X AR 300-12\/21<\/b>\u00a0is used, a low dark erosion of about 5 % is observed at a development time of 3 minutes. The influence of the development time on the sensitivity was investigated in more detail for the standard developer\u00a0<b>AR 600-549<\/b>.<\/p>\n<p class=\"p5\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3024\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_5-272x190.png\" alt=\"dosisstaffel_fuer_csar-62_5\" width=\"272\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_5-272x190.png 272w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_5-768x537.png 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_5-573x400.png 573w\" sizes=\"(max-width: 272px) 100vw, 272px\" \/><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves for\u00a0<b>AR 600-549<\/b>, SB 180 \u00b0C, film thickness: ~240 nm, 100 kV, development times 60 s \u2013 360 s each at 21.5 \u00b0C, stopper IPA.<\/span><\/p>\n<p class=\"p2\"><span class=\"s2\">If the development time is extended from\u00a0<\/span>1 minute to 6 minutes, the dose to clear can be reduced by more than half from 125 \u00b5C\/cm<sup>2<\/sup>\u00a0to approximately 50 \u00b5C\/cm<sup>2<\/sup>. Despite the very sensitive development, the dark erosion of about 7 % is comparatively moderate. Within 3 minutes of development time, no significant dark erosion occurs.<\/p>\n<p class=\"p3\">Especially in the case of thin resist layers, the process window is small if strong developers are used. Even only moderate dark erosion has a much greater impact in percentage terms when thin layers as compared to thicker layers are concerned. The dark erosion can be significantly reduced by lowering the developer temperature by a few degrees, as shown in the following for\u00a0<b>AR 600-548<\/b>\u00a0as example.<\/p>\n<p class=\"p5\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3025\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_6-272x190.png\" alt=\"dosisstaffel_fuer_csar-62_6\" width=\"272\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_6-272x190.png 272w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_6-768x537.png 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/dosisstaffel_fuer_csar-62_6-573x400.png 573w\" sizes=\"(max-width: 272px) 100vw, 272px\" \/><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Dose variations for CSAR 62 (<b>AR-P 6200<\/b>); gradation curves for AR\u00a0<b>600-548<\/b>\u00a0in dependence on the developer temperature, SB 180 \u00b0C, film thickness: ~240 nm, 100 kV, stopper IPA.<\/span><\/p>\n<p class=\"p3\">While at room temperature a dark erosion of just below 15 % is observed within 60 s, this rate is reduced to only 5 % if the development step is carried out at 15 \u00b0C. At the same time, the dose to\u00a0<span class=\"s1\">clear is reduced from 50 \u00b5C\/cm<sup>2\u00a0<\/sup>to approximately 75 \u00b5C\/cm<sup>2<\/sup>, and the contrast increases slightly.<\/span><\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-86ernv-804da6be3096f44b7d4be0a6708d3798\">\n.flex_column.av-86ernv-804da6be3096f44b7d4be0a6708d3798{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-86ernv-804da6be3096f44b7d4be0a6708d3798 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-6f58x7-81e54e0b62e70c871baca06c2189b1fc '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Process chemicals<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-4qbth7-b8ea3c4e1ab2d2e630874bacb408ef98\">\n#top .hr.hr-invisible.av-4qbth7-b8ea3c4e1ab2d2e630874bacb408ef98{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-4qbth7-b8ea3c4e1ab2d2e630874bacb408ef98 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-20b85n-99fae10809936808f69fd8812eae241e  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17080 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-04-14T11:05:02+01:00\" >14. April 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/types-of-developers\/' title='Link to: Types of developers'>Types of developers<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6477 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-07-11T17:14:56+01:00\" >11. July 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-cascade-2\/' title='Link to: Development cascade'>Development cascade<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6164 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T14:15:33+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-additional-new-experimental-developers-for-ar-p-617\/' title='Link to: Additional new experimental developers for AR-P 617'>Additional new experimental developers for AR-P 617<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6158 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T14:00:00+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developers-for-pmmacoma-ar-p-617-50-kv\/' title='Link to: New developers for PMMAcoMA (AR-P 617, 50 kV)'>New developers for PMMAcoMA (AR-P 617, 50 kV)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6139 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T12:15:07+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-evaluation-of-various-developers-for-e-beam-exposed-csar-62-layers-100-kv-2\/' title='Link to: Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)'>Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5911 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:59:49+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developers-for-ar-p-617\/' title='Link to: New developers for AR-P 617'>New developers for AR-P 617<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4979 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:05:30+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkaline-developers-for-aluminium-substrates\/' title='Link to: Alkaline developers for aluminium substrates'>Alkaline developers for aluminium substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4975 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:00:47+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developer-for-ar-p-5320\/' title='Link to: New developer for AR-P 5320'>New developer for AR-P 5320<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4719 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:50:50+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-developer-ar-300-35-for-alkali-sensitive-substrates\/' title='Link to: Developer AR 300-35 for alkali-sensitive substrates'>Developer AR 300-35 for alkali-sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4533 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:30:09+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-developer-for-csar-62-ar-p-6200\/' title='Link to: Developer for CSAR 62 (AR-P 6200)'>Developer for CSAR 62 (AR-P 6200)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-270 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-30T09:49:21+01:00\" >30. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-procedures\/' title='Link to: Development procedures'>Development procedures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-268 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:53:35+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resisdt-wiki-ageing-of-developer\/' title='Link to: Ageing of developer'>Ageing of developer<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>To evaluate the suitability of various developers for CSAR 62, Dr. Lothar Hahn (Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology) kindly provided various substrates which had previously been exposed to 100 kV e-beam irradiation (dose variations). <\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[120,58],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ 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