{"id":6164,"date":"2016-09-29T14:15:33","date_gmt":"2016-09-29T12:15:33","guid":{"rendered":"https:\/\/www.allresist.de?p=6164"},"modified":"2020-03-10T21:45:03","modified_gmt":"2020-03-10T20:45:03","slug":"resist-wiki-additional-new-experimental-developers-for-ar-p-617","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-additional-new-experimental-developers-for-ar-p-617\/","title":{"rendered":"Additional new experimental developers for AR-P 617"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-20hvdg-37e4342754af8ee56c30e553bf960c6e\">\n.avia-section.av-20hvdg-37e4342754af8ee56c30e553bf960c6e{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-20hvdg-37e4342754af8ee56c30e553bf960c6e main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6164'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-iurcys-dfa5c81ab2207e22c663cb844eef4399\">\n.flex_column.av-iurcys-dfa5c81ab2207e22c663cb844eef4399{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-iurcys-dfa5c81ab2207e22c663cb844eef4399 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-gtsos4-915530bd7f26b179d5c34ac256719194 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Additional new experimental developers for AR-P 617<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-ffuf4k-607f2c004ac266aeaedcdfa4bdbcf96a\">\n.flex_column.av-ffuf4k-607f2c004ac266aeaedcdfa4bdbcf96a{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-ffuf4k-607f2c004ac266aeaedcdfa4bdbcf96a av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-1d9ys4-4334d8e12465da2d522ef73c085cae04  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-c9ijtw-5c92f4ee194c67c3457b4cc4228873fe main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-6164'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-asqwhg-87deab46361dcc406fad57811e8bd5e8\">\n.flex_column.av-asqwhg-87deab46361dcc406fad57811e8bd5e8{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-asqwhg-87deab46361dcc406fad57811e8bd5e8 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-9ni7es-4de99e90b1532136e2250c369f7d67ce '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">For some applications are universal developers of advantage, i.e. developers which are simultaneously well suited for a variety of resist families. Multilayer systems can in this case be developed in one step, and no change of the developer in between is required.<\/p>\n<p class=\"p1\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/ar-p617_schichtdicke_1um_3.png\" rel=\"attachment wp-att-3019\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3019\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/ar-p617_schichtdicke_1um_3-268x190.png\" sizes=\"(max-width: 268px) 100vw, 268px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/ar-p617_schichtdicke_1um_3-268x190.png 268w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/ar-p617_schichtdicke_1um_3-564x400.png 564w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/ar-p617_schichtdicke_1um_3.png 753w\" alt=\"ar-p617_schichtdicke_1um_3\" width=\"268\" height=\"190\" \/><\/a><\/p>\n<p class=\"p1\"><b><\/b><span class=\"bildunterschrift\"><b>AR-P 617<\/b>, film thickness: ~1 \u00b5m, SB 10 minutes at 200 \u00b0C, 50 kV, dose variations, dependence of the sensitivity on the developer system and the development time at 21.5\u00b0; stopper: IPA.<\/span><\/p>\n<p class=\"p3\">Experimental special developer\u00a0<b>X AR 600-50\/4<\/b>\u00a0is equally suited for the development of\u00a0<b>AR-P 617<\/b>, CSAR 62, and 950K PMMA and can thus be used as universal developer for two- or three-layer processes (e.g. especially) for the manufacture of T-gates. The sensitivity is again adjusted via changing the development time. The dark erosion, offering advantages for the generation of undercut structures, is moderate and well controllable. After three minutes of development time, the dose to clear is only about 30 \u00b5C\/cm<sup>2<\/sup>.\u00a0<b>X AR 600-50\/4<\/b>\u00a0is significantly more sensitive in comparison to the standard developer\u00a0<b>AR 600-50<\/b>\u00a0(dose to clear ~ 50 \u00b5C\/cm<sup>2<\/sup>). The special developer\u00a0<b>X AR 600-50\/3<\/b>\u00a0is also significantly more sensitive than the standard developer\u00a0<b>AR 600-50<\/b>; the dose to clear is about 36 \u00b5C\/cm<sup>2<\/sup>. The occurring dark erosion of almost 10 % can be exploited to produce a particularly pronounced undercut. Especially in the case of an irradiation at 100 kV, the production of undercut structures is often difficult because the required electron backscattering (proximity effect) barely occurs. Even though developer\u00a0<b>X AR 600-50\/3<\/b>\u00a0not at all or only weakly develops irradiated areas, the production of lift-off structures is nevertheless easily possible (see right image):<\/p>\n<p class=\"p3\"><a class=\"fancybox image\" href=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617.png\" rel=\"attachment wp-att-3017\"><img decoding=\"async\" class=\"alignnone size-medium wp-image-3017\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617-345x75.png\" sizes=\"(max-width: 345px) 100vw, 345px\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617-345x75.png 345w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617-768x167.png 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617-600x131.png 600w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2016\/10\/2-lagensystem_ar-p617.png 772w\" alt=\"2-lagensystem_ar-p617\" width=\"345\" height=\"75\" \/><\/a><\/p>\n<p class=\"p1\"><span class=\"bildunterschrift\">Two-layer system\u00a0<b>AR-P 617\u00a0<\/b>(bottom, SB 200 \u00b0C) \/ CSAR 62 (top, SB 180 \u00b0C), 100 kV, developer 1.\u00a0<b>AR 600-546<\/b>\u00a0(CSAR 62) and 2.\u00a0<b>AR 600-50\u00a0<\/b>for\u00a0<b>AR-P 617<\/b>\u00a0(bottom layer, left) or\u00a0<b>X AR 600-50\/3<\/b>\u00a0(bottom layer, right). Source: Tine Greibe, DTU Danship, Denmark.<\/span><\/p>\n<p class=\"p1\">The experimental special developer\u00a0<b>X AR 600-55\/1\u00a0<\/b>is well suited for the development of both\u00a0<b>AR-P 617<\/b>\u00a0and PMMA. This developer can thus be used as universal developer for two- or three-layer processes, especially e.g. for the fabrication of T-Gates. The sensitivity is again adjustable via the development time. Within a development time of 3 minutes, no significant dark erosion was observed. The forming of the undercut can thus easily be controlled via the exposure dose.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-89gias-a233aa48d9062cd4cace03f3db331310\">\n.flex_column.av-89gias-a233aa48d9062cd4cace03f3db331310{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-89gias-a233aa48d9062cd4cace03f3db331310 av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-jash0-b1ac4f725642dd5bd9547a860a4b2603 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview Developer<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3u9eus-24231a3abebb6a4021f2e84a28e7da72\">\n#top .hr.hr-invisible.av-3u9eus-24231a3abebb6a4021f2e84a28e7da72{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3u9eus-24231a3abebb6a4021f2e84a28e7da72 hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-300lbo-0003b167d7547a12bf061200e124b899  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-17080 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-04-14T11:05:02+01:00\" >14. April 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/types-of-developers\/' title='Link to: Types of developers'>Types of developers<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6477 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2017-07-11T17:14:56+01:00\" >11. July 2017<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-cascade-2\/' title='Link to: Development cascade'>Development cascade<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6164 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T14:15:33+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-additional-new-experimental-developers-for-ar-p-617\/' title='Link to: Additional new experimental developers for AR-P 617'>Additional new experimental developers for AR-P 617<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6158 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T14:00:00+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developers-for-pmmacoma-ar-p-617-50-kv\/' title='Link to: New developers for PMMAcoMA (AR-P 617, 50 kV)'>New developers for PMMAcoMA (AR-P 617, 50 kV)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-6139 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-09-29T12:15:07+01:00\" >29. September 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-evaluation-of-various-developers-for-e-beam-exposed-csar-62-layers-100-kv-2\/' title='Link to: Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)'>Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5911 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:59:49+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developers-for-ar-p-617\/' title='Link to: New developers for AR-P 617'>New developers for AR-P 617<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4979 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:05:30+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-alkaline-developers-for-aluminium-substrates\/' title='Link to: Alkaline developers for aluminium substrates'>Alkaline developers for aluminium substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4975 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2015-05-20T12:00:47+01:00\" >20. May 2015<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-new-developer-for-ar-p-5320\/' title='Link to: New developer for AR-P 5320'>New developer for AR-P 5320<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4719 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-10-27T10:50:50+01:00\" >27. October 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-developer-ar-300-35-for-alkali-sensitive-substrates\/' title='Link to: Developer AR 300-35 for alkali-sensitive substrates'>Developer AR 300-35 for alkali-sensitive substrates<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4533 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:30:09+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-developer-for-csar-62-ar-p-6200\/' title='Link to: Developer for CSAR 62 (AR-P 6200)'>Developer for CSAR 62 (AR-P 6200)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-270 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-30T09:49:21+01:00\" >30. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-development-procedures\/' title='Link to: Development procedures'>Development procedures<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-268 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:53:35+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resisdt-wiki-ageing-of-developer\/' title='Link to: Ageing of developer'>Ageing of developer<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"<p>For some applications are universal developers of advantage, i.e. developers which are simultaneously well suited for a variety of resist families. Multilayer systems can in this case be developed in one step, and no change of the developer in between is required.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[120],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Additional new experimental developers for AR-P 617 - Allresist EN<\/title>\n<meta name=\"description\" content=\"Universelle Entwickler sind meist von Vorteil, da mehrlagige Systeme am St\u00fcck\u00a0ohne Wechsel des Entwicklers\u00a0entwickelt werden k\u00f6nnen.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-additional-new-experimental-developers-for-ar-p-617\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Additional new experimental developers for AR-P 617 - 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