{"id":7008,"date":"2018-10-12T14:06:07","date_gmt":"2018-10-12T12:06:07","guid":{"rendered":"https:\/\/www.allresist.de\/?p=7008"},"modified":"2022-02-17T13:40:15","modified_gmt":"2022-02-17T12:40:15","slug":"resist-wiki-atlas-46-for-e-beam-lithography","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/","title":{"rendered":"Atlas 46 for e-beam lithography"},"content":{"rendered":"<section  class='av_textblock_section av-k8r88h9v-f325c523dbbb05d679d2538bed1e31f5 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Atlas 46 for e-beam lithography<\/h1>\n<\/div><\/section>\n<section  class='av_textblock_section av-k8r89af8-47a85aed0c267b53b310dc765fd41734 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">A new application field for Atlas 46 is electron beam lithography, as experiments with a thin Atlas resist layer patterned by e-beam lithography demonstrated<span class=\"s1\">. At a layer thickness of 450 nm, 200 nm lines were written into this layer. The sensitivity was 70 \u03bcC\/cm\u00b2 at an acceleration voltage of 100 kV. The solvent-based development was carried\u00a0<\/span>out with AR 300-12, followed by a short post treatment with acetone.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-medium wp-image-16779\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99-253x190.jpg\" alt=\"\" width=\"253\" height=\"190\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99-253x190.jpg 253w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99-768x576.jpg 768w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99-705x529.jpg 705w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99.jpg 1024w\" sizes=\"(max-width: 253px) 100vw, 253px\" \/><\/p>\n<p class=\"p1\"><em>200 nm lines generated with Atlas resist<\/em><\/p>\n<p class=\"p2\">Atlas 46 is thus also suitable for a use as electron beam resist.<\/p>\n<\/div><\/section>\n<\/div><\/div><\/div><!-- close content main div 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data-created_by=\"avia_inline_auto\" id=\"style-css-av-4jqs74-bd9b07476a7c71a068380242cd38dba3\">\n.flex_column.av-4jqs74-bd9b07476a7c71a068380242cd38dba3{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-4jqs74-bd9b07476a7c71a068380242cd38dba3 av_one_third  avia-builder-el-7  avia-builder-el-no-sibling  flex_column_div av-zero-column-padding  '     ><p>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3afp28-ee9b2d8d89f6cedd1e5e3c9e33de3357\">\n#top .hr.hr-invisible.av-3afp28-ee9b2d8d89f6cedd1e5e3c9e33de3357{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3afp28-ee9b2d8d89f6cedd1e5e3c9e33de3357 hr-invisible  avia-builder-el-8  el_before_av_magazine  avia-builder-el-first '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-k8r88zcc-b23bf6beec6c995ae8274062e07dcb01  avia-builder-el-9  el_after_av_hr  avia-builder-el-last   avia-builder-el-9  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-16859 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-02T12:16:20+01:00\" >2. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/high-resolution-negative-e-beam-resist-ar-n-7520-17new-for-etching-application\/' title='Link to: High-resolution negative e-beam resist AR-N 7520.17new for etching application'>High-resolution negative e-beam resist AR-N 7520.17new for etching application<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8121 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:04:27+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-for-euv-applications\/' title='Link to: Medusa 82 for EUV applications'>Medusa 82 for EUV applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8120 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:59:16+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/' title='Link to: Medusa 82: Influence of post exposure bake (PEB)'>Medusa 82: Influence of post exposure bake (PEB)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8119 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:55:00+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/' title='Link to: Medusa 82 with photoacid generator (PAG)'>Medusa 82 with photoacid generator (PAG)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8114 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:49:05+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-the-alternative-to-hsq-resists-storage-stability\/' title='Link to: Medusa 82 \u2013 the alternative to HSQ-resists, storage stability'>Medusa 82 \u2013 the alternative to HSQ-resists, storage stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5906 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:50:18+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-utilising-electra-92-for-sem-applications\/' title='Link to: Utilising Electra 92 for SEM applications'>Utilising Electra 92 for SEM applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4522 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:21:16+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-amplified-highly-sensitive-negative-e-beam-resist-sx-ar-n-7730-37\/' title='Link to: Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37'>Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4516 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:17:37+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ratio-resolution-and-dose-exemplarily-shown-for-e-beam-resist-sx-ar-n-7530-1\/' title='Link to: Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1'>Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:30:12+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/' title='Link to: AR-N 7700, 4 \u00b5m thick, proximity effect'>AR-N 7700, 4 \u00b5m thick, proximity effect<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10365 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:23:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-diffractive-optics-with-the-analogous-e-beam-resist\/' title='Link to: Diffractive optics with the \u201canalogous\u201c e-beam resist'>Diffractive optics with the \u201canalogous\u201c e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:10:36+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/' title='Link to: High-resolution negative e-beam resist'>High-resolution negative e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T08:46:02+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/' title='Link to: Sensitive, etch-stable negative e-beam resist for processes without yellow light'>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n<\/p>\n","protected":false},"excerpt":{"rendered":"<p>A new application field for Atlas 46 is electron beam lithography, as experiments with a thin Atlas resist layer patterned by e-beam lithography demonstrated. At a layer thickness of 450 nm, 200 nm lines were written into this layer. The sensitivity was 70 \u03bcC\/cm\u00b2 at an acceleration voltage of 100 kV.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[118,71],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Atlas 46 for e-beam lithography - Allresist EN<\/title>\n<meta name=\"description\" content=\"Atlas 46 for e-beam lithography\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Atlas 46 for e-beam lithography - Allresist EN\" \/>\n<meta property=\"og:description\" content=\"Atlas 46 for e-beam lithography\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/\" \/>\n<meta property=\"og:site_name\" content=\"Allresist EN\" \/>\n<meta property=\"article:published_time\" content=\"2018-10-12T12:06:07+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2022-02-17T12:40:15+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/02\/99-253x190.jpg\" \/>\n<meta name=\"author\" content=\"AllAdmin\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"AllAdmin\" \/>\n\t<meta name=\"twitter:label2\" content=\"Estimated reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"4 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/\",\"url\":\"https:\/\/www.allresist.com\/resist-wiki-atlas-46-for-e-beam-lithography\/\",\"name\":\"Atlas 46 for e-beam lithography - 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