{"id":8120,"date":"2018-10-12T13:59:16","date_gmt":"2018-10-12T12:59:16","guid":{"rendered":"https:\/\/www.allresist.de\/?p=6999"},"modified":"2022-03-14T12:07:52","modified_gmt":"2022-03-14T11:07:52","slug":"resist-wiki-medusa-82-influence-of-post-exposure-bake-peb","status":"publish","type":"post","link":"https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/","title":{"rendered":"Medusa 82: Influence of post exposure bake (PEB)"},"content":{"rendered":"\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-l9iwgo-1b1dad1463fbc790a985736cdc626dda\">\n.avia-section.av-l9iwgo-1b1dad1463fbc790a985736cdc626dda{\nbackground-color:#f0faff;\nbackground-image:unset;\n}\n<\/style>\n<div id='av_section_1'  class='avia-section av-l9iwgo-1b1dad1463fbc790a985736cdc626dda main_color avia-section-default avia-no-shadow  avia-builder-el-0  el_before_av_section  avia-builder-el-first  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-8120'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-jjbqw8-f4181211f81af5f8b99073ababb96080\">\n.flex_column.av-jjbqw8-f4181211f81af5f8b99073ababb96080{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-jjbqw8-f4181211f81af5f8b99073ababb96080 av_two_third  avia-builder-el-1  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-hyehqw-5308be1f50fab1175ee3aca3247e4cc6 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><h1>Medusa 82: Influence of post exposure bake (PEB)<\/h1>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-g9emtk-69d36b135444083d6e1ee1560268854c\">\n.flex_column.av-g9emtk-69d36b135444083d6e1ee1560268854c{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-g9emtk-69d36b135444083d6e1ee1560268854c av_one_third  avia-builder-el-3  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><article  class='iconbox iconbox_left av-eocg7c-a972d8678e944a6820fde240d76b7fde  avia-builder-el-4  avia-builder-el-no-sibling '  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"iconbox_content\"><header class=\"entry-content-header\"><div class=\"iconbox_icon heading-color\" aria-hidden='true' data-av_icon='\ue831' data-av_iconfont='entypo-fontello'><\/div><h3 class='iconbox_content_title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki\/' title='Back to the Resist Wiki Overview'  >Back to the Resist Wiki Overview<\/a><\/h3><\/header><div class='iconbox_content_container '  itemprop=\"text\" ><\/div><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div>\n\n<\/div><\/div><\/main><!-- close content main element --><\/div><\/div><div id='av_section_2'  class='avia-section av-bxz7mw-c2bb2cf937d61179289ba30e753b142e main_color avia-section-default avia-no-shadow  avia-builder-el-5  el_after_av_section  avia-builder-el-last  avia-bg-style-scroll container_wrap fullsize'  ><div class='container av-section-cont-open' ><div class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-8120'><div class='entry-content-wrapper clearfix'>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-bkre08-e83c11e9553f0df1f0dc19ca7b1300e4\">\n.flex_column.av-bkre08-e83c11e9553f0df1f0dc19ca7b1300e4{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-bkre08-e83c11e9553f0df1f0dc19ca7b1300e4 av_two_third  avia-builder-el-6  el_before_av_one_third  avia-builder-el-first  first flex_column_div av-zero-column-padding  '     ><section  class='av_textblock_section av-8l0kns-978f9cd7d76e82807f3fd2991606ccbf '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p class=\"p1\">The addition of photoacid generators (PAGs) can significantly increase the sensitivity of Medusa 82 (see\u00a0<a href=\"https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/\">Medusa with photoacid generator<\/a>). Another option is to add a PEB after e-beam exposure. Even if substrates were previously stored for several days, the sensitivity significantly increases depending on the temperature and the duration of the PEB.<\/p>\n<p><img decoding=\"async\" class=\"alignnone size-full wp-image-16933\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/aa.png\" alt=\"\" width=\"541\" height=\"378\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/aa.png 541w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/aa-272x190.png 272w\" sizes=\"(max-width: 541px) 100vw, 541px\" \/><img decoding=\"async\" class=\"alignnone size-full wp-image-16934\" src=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/bb.png\" alt=\"\" width=\"541\" height=\"378\" srcset=\"https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/bb.png 541w, https:\/\/www.allresist.com\/wp-content\/uploads\/sites\/2\/2022\/03\/bb-272x190.png 272w\" sizes=\"(max-width: 541px) 100vw, 541px\" \/><\/p>\n<p class=\"p1\"><em>Gradation curve after PEB with different developers<\/em><\/p>\n<p class=\"p3\">As developers, 0.20 and 0.26 n TMAH solutions were used. The higher the chosen PEB temperature, the higher is also the sensitivity, and also the contrast increases due to the PEB.<\/p>\n<\/div><\/section><\/div>\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-86miyw-d1d2e9b0e02e16b9b3f6d0772717e77d\">\n.flex_column.av-86miyw-d1d2e9b0e02e16b9b3f6d0772717e77d{\nborder-radius:0px 0px 0px 0px;\npadding:0px 0px 0px 0px;\n}\n<\/style>\n<div  class='flex_column av-86miyw-d1d2e9b0e02e16b9b3f6d0772717e77d av_one_third  avia-builder-el-8  el_after_av_two_third  avia-builder-el-last  flex_column_div av-zero-column-padding  '     ><p><section  class='av_textblock_section av-5rv8p4-9b0c9e523647f9c0d668837d808f1744 '   itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock'  itemprop=\"text\" ><p>Overview E-beam Negative<\/p>\n<\/div><\/section><br \/>\n\n<style type=\"text\/css\" data-created_by=\"avia_inline_auto\" id=\"style-css-av-3ok4e0-aa58dc1759fdede848706688a002475f\">\n#top .hr.hr-invisible.av-3ok4e0-aa58dc1759fdede848706688a002475f{\nheight:25px;\n}\n<\/style>\n<div  class='hr av-3ok4e0-aa58dc1759fdede848706688a002475f hr-invisible  avia-builder-el-10  el_after_av_textblock  el_before_av_magazine '><span class='hr-inner '><span class=\"hr-inner-style\"><\/span><\/span><\/div><br \/>\n<div  id=\"avia-magazine-1\"  class='av-magazine av-37ihc8-f6ce2ae6398e5c07efb462e0ba02221c  avia-builder-el-11  el_after_av_hr  avia-builder-el-last   avia-builder-el-11  el_after_av_hr  avia-builder-el-last ' ><div class='av-magazine-group sort_all'><article class='av-magazine-entry av-magazine-entry-id-16859 av-magazine-format-standard av-magazine-type-post av-magazine-entry-1 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2022-03-02T12:16:20+01:00\" >2. March 2022<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/high-resolution-negative-e-beam-resist-ar-n-7520-17new-for-etching-application\/' title='Link to: High-resolution negative e-beam resist AR-N 7520.17new for etching application'>High-resolution negative e-beam resist AR-N 7520.17new for etching application<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8121 av-magazine-format-standard av-magazine-type-post av-magazine-entry-2 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T14:04:27+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-for-euv-applications\/' title='Link to: Medusa 82 for EUV applications'>Medusa 82 for EUV applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8120 av-magazine-format-standard av-magazine-type-post av-magazine-entry-3 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:59:16+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/' title='Link to: Medusa 82: Influence of post exposure bake (PEB)'>Medusa 82: Influence of post exposure bake (PEB)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8119 av-magazine-format-standard av-magazine-type-post av-magazine-entry-4 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-10-12T13:55:00+01:00\" >12. October 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-with-photoacid-generator-pag\/' title='Link to: Medusa 82 with photoacid generator (PAG)'>Medusa 82 with photoacid generator (PAG)<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-8114 av-magazine-format-standard av-magazine-type-post av-magazine-entry-5 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2018-07-09T09:49:05+01:00\" >9. July 2018<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-medusa-82-the-alternative-to-hsq-resists-storage-stability\/' title='Link to: Medusa 82 \u2013 the alternative to HSQ-resists, storage stability'>Medusa 82 \u2013 the alternative to HSQ-resists, storage stability<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-5906 av-magazine-format-standard av-magazine-type-post av-magazine-entry-6 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2016-04-13T08:50:18+01:00\" >13. April 2016<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-utilising-electra-92-for-sem-applications\/' title='Link to: Utilising Electra 92 for SEM applications'>Utilising Electra 92 for SEM applications<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4522 av-magazine-format-standard av-magazine-type-post av-magazine-entry-7 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:21:16+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-chemically-amplified-highly-sensitive-negative-e-beam-resist-sx-ar-n-7730-37\/' title='Link to: Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37'>Chemically amplified, highly sensitive negative e-beam resist SX AR-N 7730\/37<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-4516 av-magazine-format-standard av-magazine-type-post av-magazine-entry-8 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2014-06-13T16:17:37+01:00\" >13. June 2014<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-ratio-resolution-and-dose-exemplarily-shown-for-e-beam-resist-sx-ar-n-7530-1\/' title='Link to: Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1'>Ratio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530\/1<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-230 av-magazine-format-standard av-magazine-type-post av-magazine-entry-9 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:30:12+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/ar-n-7700-4-thick-proximity-effect\/' title='Link to: AR-N 7700, 4 \u00b5m thick, proximity effect'>AR-N 7700, 4 \u00b5m thick, proximity effect<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10365 av-magazine-format-standard av-magazine-type-post av-magazine-entry-10 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2013-02-27T09:23:27+01:00\" >27. February 2013<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-diffractive-optics-with-the-analogous-e-beam-resist\/' title='Link to: Diffractive optics with the \u201canalogous\u201c e-beam resist'>Diffractive optics with the \u201canalogous\u201c e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10358 av-magazine-format-standard av-magazine-type-post av-magazine-entry-11 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T13:10:36+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-high-resolution-negative-e-beam-resist\/' title='Link to: High-resolution negative e-beam resist'>High-resolution negative e-beam resist<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><article class='av-magazine-entry av-magazine-entry-id-10359 av-magazine-format-standard av-magazine-type-post av-magazine-entry-12 av-magazine-entry-small av-magazine-no-thumb'  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class=\"av-magazine-content-wrap\"><header class=\"entry-content-header\"><time class='av-magazine-time updated'  itemprop=\"datePublished\" datetime=\"2012-07-13T08:46:02+01:00\" >13. July 2012<\/time><h3 class='av-magazine-title entry-title '  itemprop=\"headline\" ><a href='https:\/\/www.allresist.com\/resist-wiki-sensitive-etch-stable-negative-e-beam-resist-for-processes-without-yellow-light\/' title='Link to: Sensitive, etch-stable negative e-beam resist for processes without yellow light'>Sensitive, etch-stable negative e-beam resist for processes without yellow light<\/a><\/h3><\/header><\/div><footer class=\"entry-footer\"><\/footer><\/article><\/div><\/div><\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>The addition of photoacid generators (PAGs) can significantly increase the sensitivity of Medusa 82 (see Resist Wiki \u201cMedusa with photoacid generator\u201d). Another option is to add a PEB after e-beam exposure. Even if substrates were previously stored for several days, the sensitivity significantly increases depending on the temperature and the duration of the PEB.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[105,223],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.5 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Medusa 82: Influence of post exposure bake (PEB) - Allresist EN<\/title>\n<meta name=\"description\" content=\"Medusa 82: Influence of post exposure bake (PEB)\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.allresist.com\/resist-wiki-medusa-82-influence-of-post-exposure-bake-peb\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Medusa 82: Influence of post exposure bake (PEB) - 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