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Welcome to Allresist

We develop, produce and distribute resists for optical and electron beam lithography, as well as respective process chemicals associated with these resists for the fabrication of electronic components. Our unique selling points are resist developments upon customer demands. Based on our high level of know-how and great flexibility, we are able to specifically produce technology-adapted resists cost-effectively within a short time.

Julia Otto

Latest Resist of the Month

October 2025: Medusa 84 – the reliable alternative to HSQ resist

Medusa 84 samples were furthermore stored for 3.5 months at -30 °C, at 0 °C, and at room temperature. Surprisingly, there was hardly any difference between the three storage conditions with respect to the quality of the resist. Regardless of the storage temperature, all samples exhibited a minimum line width between 3.6 and 4.2 nm.
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Latest News

Allresist presents new product development at the EIPBN Conference (USA)

The focus is on our new choline-based developer, a safer and more environmentally friendly alternative to conventional TMAH developers. While TMAH poses significant health and environmental risks due to its high acute toxicity, choline hydroxide offers a considerably safer and more biodegradable solution. Studies have shown that the new developer still achieves comparable — and in some applications even superior — performance.
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Latest Resist Wiki Post

Poly(phthalaldehyde)-based electron beam resists, University of Tübingen

A direct positive patterning of PPA layers is possible by electron bombardment. Similar to the irradiation of normally used e-beam resists like e.g. CSAR 62 or PMMA, the electron beam causes a fragmentation of the polymer chains.
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    Do you already know our Resist Wiki?

    There you will find high-quality answers to your technical questions.
    The Resist Wiki is a knowledge platform on current microelectronics technologies.
    It is continuously supplemented by further information from our research and development.

    Resist Wiki

    What our customers say to us

    “The Allresist can always be relied on. When in 2003 our new clean room was set up, we got quick assistance at any time when we had problems with our technology. Batch uniformity and on schedule delivery of our annual 300 litres of resist guaranteed first-class product quality and efficient process flows for us.”

    ”In research, a high flexibility of resists as well as a competent advisory service is required. We experienced both with Allresist, especially with the e-beam resist AR-N 7520 as one example.

    ”A fair and cooperative collaboration is of great importance to us. For this reason we feel in good hands at Allresist with our new PMMA e-beam resist.”

    “With the coating AR-P 3110 of Allresist, we got on well right from the start. The price is also all right. We thus recommended this resist to our business partners from the Dresden Chip Academy.”

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