All 34 /Adhesions Promoter 0 /AR 300-12 0 /AR 300-26 0 /AR 300-35 0 /AR 300-44 0 /AR 300-46 0 /AR 300-47 0 /AR 300-475 0 /AR 300-72 0 /AR 300-73 0 /AR 300-76 0 /AR 300-80 0 /AR 600-01 0 /AR 600-02 0 /AR 600-07 0 /AR 600-09 0 /AR 600-50 0 /AR 600-51 0 /AR 600-546 0 /AR 600-548 0 /AR 600-549 0 /AR 600-55 0 /AR 600-56 0 /AR 600-60 0 /AR 600-61 0 /AR 600-70 0 /AR 600-71 0 /AR-BR 5400 0 /AR-N 2210 0 /AR-N 2220 0 /AR-N 2230 0 /AR-N 4200 0 /AR-N 4300 0 /AR-N 4400 0 /AR-N 4400-25 0 /AR-N 4400-50 0 /AR-N 4450 0 /AR-N 4600 0 /AR-N 7400 0 /AR-N 7500 0 /AR-N 7520 0 /AR-N 7520 neu 0 /AR-N 7700 0 /AR-N 7720 0 /AR-P 1200 0 /AR-P 3100 0 /AR-P 3200 0 /AR-P 3500 0 /AR-P 3500T 0 /AR-P 3700 0 /AR-P 3800 0 /AR-P 5300 0 /AR-P 5900 0 /AR-P 617 0 /AR-P 6200 0 /AR-P 631-671 0 /AR-P 632-672 0 /AR-P 639-679 0 /AR-P 6500 0 /AR-P 8100 0 /AR-PC 500 0 /AR-PC 5000 0 /AR-U 4000 0 /Bottom Resist 0 /Developer 0 /E-Beam Resist 0 /Home 0 /Image Reversal Resist 3 /Negative 0 /Negative 10 /Photoresist 0 /Positive 0 /Positive 21 /Process Chemicals 0 /Products 0 /Protective Resist 0 /Remover 0 /Stopper 0 /SX AR-N 4340/7 0 /SX AR-N 7530/1 0 /SX AR-N 7730/1 0 /SX AR-N 8200/1 0 /SX AR-P 3500/6 0 /SX AR-P 3500/8 0 /SX AR-P 3740/4 0 /SX AR-PC 5000/41 0 /SX AR-PC 5000/80.2 0 /SX AR-PC 5000/82.7 0 /Thinner 0 /X AR-N 7700/30 0 /X AR-P 3220/7 0 /X AR-P 5900/4 0
Photoresist AR-N 2210
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-N 2220
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-N 2230
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-N 4340
Highly sensitive negative resist for the production of integrated circuits
Photoresist AR-N 4400-05 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm
Photoresist AR-N 4400-10 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm
Photoresist AR-N 4400-25 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4400-50 (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4450-10 T (CAR 44)
Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm
Photoresist AR-N 4600 series (Atlas 46)
Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm
Photoresist AR-P 1210
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-P 1220
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-P 1230
Ready-to-use positive and negative spray resists for various applications
Photoresist AR-P 3110
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3120
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3170
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Photoresist AR-P 3210
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3220
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3250
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3510
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3510 T
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3540
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3540 T
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3740
Sensitive positive-tone standard resists for the production of highly integrated circuits
Photoresist AR-P 3840
Sensitive positive-tone standard resists for the production of highly integrated circuits
Photoresist AR-P 5320
Sensitive positive-tone resists for the production of evaporation samples
Photoresist AR-P 5350
Sensitive positive-tone resists for the production of evaporation samples
Photoresist AR-P 5910
Adhesion-enhanced positive-tone resist for complicated patternings with HF etching mixtures
Photoresist AR-U 4030
Image reversal resist for the fabrication of integrated circuits
Photoresist AR-U 4040
Image reversal resist for the fabrication of integrated circuits
Photoresist AR-U 4060
Image reversal resist for the fabrication of integrated circuits
Photoresist SX AR-P 3500/8
Positive photoresist for high-temperature application up to 300 °C
Photoresist X AR-P 3220/7
Thick temperature-stable positive photoresist Experimental sample/custom-made product
Photoresist X AR-P 5900/4
Experimental sample/custom-made product
Übersicht Photoresists
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de