Twice a year, we offer our customers the AR NEWs, containing all the news about our company, especially the technological developments and research projects.
52nd Issue of the AR NEWS
Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 - AR-N 8400 SiH, the reliable alternative to HSQ resist // 3. The new choline developer AR 300-41 – a safe alternative to TMAH developers
51st Issue of the AR NEWS
Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH: High-performance alternative to HSQ-based resists // 3. Allresist establishes new facility in Teltow // 4. ZIM-project successfully completed: Development of a photoresist for structuring non-planar objects
50th Issue of the AR NEWS
Content: 1. Allresist at the EIPBN and MNE conferences 2024 / 2. Worldwide interest in Medusa 84 - AR-N 8400 SiH / 3. Daughter Ulrike Schirmer now appointed as Managing Director / 4. Our current environmental activities: Tree planting / 5. No price increases for listed products in 2025😊
49th Issue of the AR NEWS
Content:
1. Allresist at the “8th Thermal Probe Workshop“ of Heidelberg Instruments Nano AG
2. From PPA powder to liquid resist: Phoenix 81
3. Medusa 84 SiH – SX AR-N 8400: Market launch has begun
4. Our current environmental activities: another tree-planting event!
48th Issue of the AR NEWS
Content:
1. Allresist on the MNE 2023 in Berlin
2. Medusa 84 SiH – SX AR-N 8400, another alternative to HSQ with better properties
3. Rubin project – waveguide materials for the NIR/VIS range
4. Successful introduction of the new Electra 92
5. Coloured and fluorescent resists for optical applications
47th Issue of the AR NEWS
Content:
1. On February 20, Allresist received an important IHK certificate for exemplary CO2 balance
in determining their carbon footprint on the path to climate neutrality
2. Allresist awarded as “Employer of the Future” on March 15
3. EOS 72: Our new, highly sensitive and alkali-resistant e-beam resist
4. New ZIM project – Photoresists for concave and convex surfaces
5. Allresist represented again at the EIPBN and MNE congresses
46th Issue of the AR NEWS
Content:
1. 30 years of Allresist: Appreciation by Prime Minister Woidke
2. Allresist on the EIPBN in New Orleans
3. Further improved Electra 92 - new AR-PC 5092
4. Allresist on the MNE in Leuven
5. Rubin-project - waveguide materials for the NIR/VIS-range
6. Allresist determines its CO2 footprint
45th Issue of the AR NEWS
Content:
1. Ukraine at war: We also bear responsibility
2. COVID-19: An endless story?
3. Allresist again present at congresses
4. Eco-friendly "green" PMMA developer
5. Profit project of the State of Brandenburg QD-LED
6. Allresist has planted trees
44th Issue of the AR NEWS
Content:
1. Working in the times of Corona
2. More efficient manufacture of Electra 92
3. RUBIN – highly promising project in optical sensor technology
4. EOS 72, a chemically amplified positive e-beam resist
5. Contribution against climate changes: Allresist plants trees
43rd Issue of the AR NEWS
Content:
1. Allresist with view to the future
2. Investing in novel technologies
3. Structurable conductive layers
4. CSAR 62 – great demand around the world
42nd Issue of the AR NEWS
Content:
1. Prime Minister Dietmar Woidke visits Allresist in times of Covid-19
2. Higher shelf live and more sensitive HSQ-alternative Medusa 82 for grayscale
lithography
3. Medusa for UV lithography
4. Thermally structurable resists
41st issue of the AR NEWS
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
40th issue of the AR NEWS
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
39th Issue of the AR NEWS
Content:
1. Synthesis week in the new production tract
2. Allresist at the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 passed comprehensive application tests
3.1. Dissolution test with the sensitive PAG-Medusa 82 (SX AR-N 8250)
3.2. Influence of a PEB on the sensitivity of Medusa 82
3.3. Plasma etching tests with Medusa structures
3.4. Medusa 82 with specifically low contrast
4. Five coloured negative resists on one glass wafer
38th Issue of the AR NEWS
Content:
1. 26 years of Allresist - Inauguration of the new plant on the company anniversary
2. Allresist’s great success with Medusa 82 at the MNE 2018
3. Further Allresist highlights at the MNE
4. Atlas 46 and CAR 44 for e-beam lithography
5. Phoenix 81 – World-wide sales begin!
6. Offspring at Allresist – The next generation!
37th issue of the AR NEWS
Content:
1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into "stone" structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41
36th Issue of the AR NEWS
Content:
1. 25 years of Allresist – a success story also of resist development
2. Allresist at the MNE Conference with Atlas 46
3. New innovative product developments
3.1. Fluorescent and coloured resists for optics and sensor technologies
3.2. Thick(er) CSAR 62 for the production of deep etch pits
3.3. CSAR 62 in three-layer systems for the generation of T-gates
35th special issue of the AR NEWS
Content:
1. Allresist is planning a new building extension again in the 25th year of its existence
2. New innovative product developments
3. Scientific partnerships for the MNE 2017
34th issue of the AR NEWS
Content:
1. Allresist plans another building extension the in the 25th year of its existence
2. New sales partners
3. Thermally developable positive resist “Phoenix 81“
4. Negative photoresist “Atlas 46“– our effective alternative to SU-8
5. Positive CAR e-beam resist “EOS 72“– our response to FEP 171
6. 25 years of Allresist
33rd issue of the AR NEWS
Content:
1. 24th anniversary of Allresist
2. Allresist as silver sponsor at MNE 2016 in Vienna
3. News about CSAR 62 and Electra 92
4. Optimised T-gate structures with three-layer system of PMMA, copolymer 617, and CSAR 62
5. New developers for PMMAcoMA (AR-P 617, 50 kV)
6. New lab and new rotary evaporator for production
32nd issue of the AR NEWS
Content:
1. Allresist in the 24th year: A steady upswing with innovations
2. Electra 92 as conductive layer for SEM-imaging
3. Poly(phthalaldehyde) (PPA) as e-beam resist
4. Conductive polymer electrodes for stack actuators – smart3
5. Polyphotonics – new resists for optical components and applications in microelectronics
31st issue of the AR NEWS
Content:
1. Innovative new developments presented on the MNE 2015 and the SEMICON Europe:
A case for two – CSAR 62 & Electra 92
2. Alternative to Espacer Electra 92 meets user expectations
2.1 Long shelf life of Electra 92
2.2 CSAR structures on glass, made possible due to Electra 92
2.3 PMMA lift-off structures on semi-precious stone substrates with Electra 92
2.4 Electra 92 for applications on novolac-base resists -
New variant SX AR-PC 5000/91.1 for negative CAR AR-N 7700 on glass
3. PPA-Litho project: First application examples of the new PPA resists
4. Allresist turns 23 years old and rejuvenates
5. Chemnitz seminar “Electron-Beam Lithography“ in the Fraunhofer Institute ENAS
30th issue of the AR NEWS
Content:
1. Investment in sun energy – Allresist installed a rooftop photovoltaic system
2. Highly sensitive negative resist for laser direct exposure
3. PPA-Litho-project: Resists for new applications in lithography
4. Further CSAR 62 applications – high-precision rectangular structures
5. New results with Electra 92
29th issue of the AR NEWS
Content:
1. Opening ceremony of our annex building on time for the 22nd anniversary of Allresist
2. New application results with CSAR 62 (thicker layers)
3. Start of Eurostar project PPA-Litho on 1. November 2014
4. New developments of Allresist
28th Issue of the AR NEWS
Content:
1. News about Allresist: Extension for higher production capacities, second-placed entrepreneur
of the Federal State of Brandenburg and Innovation Prize Berlin Brandenburg 2014
2. New Conductive protective coating for e-beam lithography SX AR-PC 5000/90.2
3. E-beam resist SX AR-N 7530/1 for white light applications
4. AR-P 3540 MIF – a resist which can do more! (Progress report by our partners)
5. Allresist on the Semicon China 2014
27th issue of the AR NEWS
Themen im Überblick: Erfolgreiches Jahr 2013 für Allresist ; Gründung des German Innovation Center in Changzhou
; Erfolgreiche Einführung des CSAR 62
; Maskblank-Herstellung in Vorbereitung
; Thermostabile Negativ-Resists
; Leitfähiger Lack für die E-Beam-Lithographie
; Allresist auf der Semicon Europe 2013
26th issue of the AR NEWS
Content:
1. Recognition for the Ludwig Erhard Prize winner Allresist
2. CSAR 62 – the future alternative for the ZEP resist
3. NIR-resist in the development – first successes
25th issue of the AR NEWS
Content:
1. 20 years of Allresist – a development from MBO to a business of excellence
2. Successful assessment during a site visit for the Ludwig Erhard Prize
3. VEGAS project submitted
4. Our new developments – first results
24nd issue of the AR NEWS
Content:
1. Allresist is now employee champion and applies for the Ludwig Erhard price
2. Results of the new e-beam resist AR-N 7520
3. NIR-coatings in development – fist successes
4. Our new developments – first results
Registration to AR NEWS
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
AR News Newsletter
AR NEWS
Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de