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E-Beam Resist
Resists for the electron beam lithography
Photoresist
Resists for the optical lithography
Protective Resist
Resist to protect other resist structures
Bottom Resist
Resists for the design of complicated structures
Process Chemicals
Chemicals for the work process with resists (thinner, remover, adhesion promoter, stopper, developer)
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Thanks to the diverse, successfully completed projects, we form the ideal interface between industry and research.
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Products
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E-Beam Resist
E-Beam Resist
All
25
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Adhesions Promoter
0
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AR 300-12
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AR 300-26
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AR 300-35
0
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AR 300-44
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AR 300-46
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AR 300-47
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AR 300-475
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AR 300-72
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AR 300-73
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AR 300-76
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AR 300-80
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AR 600-01
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AR 600-02
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AR 600-07
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AR 600-09
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AR 600-50
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AR 600-51
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AR 600-546
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AR 600-548
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AR 600-549
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AR 600-55
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AR 600-56
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AR 600-60
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AR 600-61
0
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AR 600-70
0
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AR 600-71
0
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AR-BR 5400
0
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AR-N 2210
0
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AR-N 2220
0
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AR-N 2230
0
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AR-N 4200
0
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AR-N 4300
0
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AR-N 4400
0
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AR-N 4400-25
0
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AR-N 4400-50
0
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AR-N 4450
0
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AR-N 4600
0
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AR-N 7400
0
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AR-N 7500
0
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AR-N 7520
0
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AR-N 7520 neu
0
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AR-N 7700
0
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AR-N 7720
0
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AR-P 1200
0
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AR-P 3100
0
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AR-P 3200
0
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AR-P 3500
0
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AR-P 3500T
0
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AR-P 3700
0
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AR-P 3800
0
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AR-P 5300
0
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AR-P 5900
0
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AR-P 617
0
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AR-P 6200
0
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AR-P 631-671
0
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AR-P 632-672
0
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AR-P 639-679
0
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AR-P 6500
0
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AR-P 8100
0
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AR-PC 500
0
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AR-PC 5000
0
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AR-U 4000
0
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Bottom Resist
0
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Developer
0
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E-Beam Resist
0
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Image Reversal Resist
0
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Negative
8
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Negative
0
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Photoresist
0
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Positive
17
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Positive
0
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Process Chemicals
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product group
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Products
0
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Protective Resist
0
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Remover
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Stopper
0
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SX AR-N 4340/7
0
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SX AR-N 7530/1
0
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SX AR-N 7730/1
0
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SX AR-N 8200/1
0
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SX AR-P 3500/6
0
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SX AR-P 3500/8
0
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SX AR-P 3740/4
0
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SX AR-PC 5000/41
0
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SX AR-PC 5000/80.2
0
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SX AR-PC 5000/82.7
0
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Thinner
0
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X AR-N 7700/30
0
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X AR-P 3220/7
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X AR-P 5900/4
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E-Beam Resist AR-N 7500 series
High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C
E-Beam Resist AR-N 7520 new series
Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C
E-Beam Resist AR-N 7520 series
High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C
E-Beam Resist AR-N 7700 series
High-resolution e-beam resists for the production of integrated circuits
E-Beam Resist AR-N 7720 series
AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics
E-Beam Resist AR-N 8200 series (Medusa 82)
Experimental sample/custom-made product
E-Beam Resist AR-N 8250 series (Medusa 82)
Experimental sample/custom-made product
E-Beam Resist AR-P 617 series
Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol
E-Beam Resist AR-P 6200 series (CSAR 62)
High-contrast e-beam resists for the production of integrated circuits and masks
E-Beam Resist AR-P 631 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 632 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 639 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 641 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 642 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 649 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 6510 series
Thick positive resists for the production of microcomponents
E-Beam Resist AR-P 661 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 662 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 669 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 671 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 672 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 679 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 7400 series
Plasma etching resistant e-beam resists for the production of integrated circuits and masks
E-Beam Resist AR-P 8100 series (Phoenix 81)
High-contrast, thermolabile resist for integrated circuits and holographic structures
E-Beam Resist X AR-N 7700/30
Chemically enhanced e-beam resist with very high sensitivity
Overview E-Beam Resists
16. October 2020
E-Beam Resist AR-N 8250 series (Medusa 82)
13. October 2020
E-Beam Resist AR-N 8200 series (Medusa 82)
17. February 2020
E-Beam Resist AR-P 8100 series (Phoenix 81)
3. August 2017
E-Beam Resist X AR-N 7700/30
27. July 2017
E-Beam Resist AR-P 7400 series
27. July 2017
E-Beam Resist AR-P 679 series
27. July 2017
E-Beam Resist AR-P 672 series
27. July 2017
E-Beam Resist AR-P 671 series
27. July 2017
E-Beam Resist AR-P 669 series
27. July 2017
E-Beam Resist AR-P 662 series
27. July 2017
E-Beam Resist AR-P 661 series
27. July 2017
E-Beam Resist AR-P 6510 series
27. July 2017
E-Beam Resist AR-P 649 series
27. July 2017
E-Beam Resist AR-P 642 series
27. July 2017
E-Beam Resist AR-P 641 series
27. July 2017
E-Beam Resist AR-P 639 series
27. July 2017
E-Beam Resist AR-P 632 series
27. July 2017
E-Beam Resist AR-P 631 series
27. July 2017
E-Beam Resist AR-P 6200 series (CSAR 62)
27. July 2017
E-Beam Resist AR-P 617 series
27. July 2017
E-Beam Resist AR-N 7720 series
27. July 2017
E-Beam Resist AR-N 7700 series
27. July 2017
E-Beam Resist AR-N 7520 new series
27. July 2017
E-Beam Resist AR-N 7520 series
27. July 2017
E-Beam Resist AR-N 7500 series
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