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E-Beam Resist

All 20 /Adhesions Promoter 0 /AR 300-12 0 /AR 300-26 0 /AR 300-35 0 /AR 300-44 0 /AR 300-46 0 /AR 300-47 0 /AR 300-475 0 /AR 300-72 0 /AR 300-73 0 /AR 300-76 0 /AR 300-80 0 /AR 600-01 0 /AR 600-02 0 /AR 600-07 0 /AR 600-09 0 /AR 600-50 0 /AR 600-51 0 /AR 600-546 0 /AR 600-548 0 /AR 600-549 0 /AR 600-55 0 /AR 600-56 0 /AR 600-60 0 /AR 600-61 0 /AR 600-70 0 /AR 600-71 0 /AR-BR 5400 0 /AR-N 2210 0 /AR-N 2220 0 /AR-N 2230 0 /AR-N 4200 0 /AR-N 4300 0 /AR-N 4400 0 /AR-N 4400-25 0 /AR-N 4400-50 0 /AR-N 4450 0 /AR-N 4600 0 /AR-N 7400 0 /AR-N 7500 0 /AR-N 7520 0 /AR-N 7520 neu 0 /AR-N 7700 0 /AR-N 7720 0 /AR-P 1200 0 /AR-P 3100 0 /AR-P 3200 0 /AR-P 3500 0 /AR-P 3500T 0 /AR-P 3700 0 /AR-P 3800 0 /AR-P 5300 0 /AR-P 5900 0 /AR-P 617 0 /AR-P 6200 0 /AR-P 631-671 0 /AR-P 632-672 0 /AR-P 639-679 0 /AR-P 6500 0 /AR-P 8100 0 /AR-PC 500 0 /AR-PC 5000 0 /AR-U 4000 0 /Bottom Resist 0 /Developer 0 /E-Beam Resist 0 /Negative 0 /Negative 5 /Photoresist 0 /Positive 15 /Positive 0 /Process Chemicals 0 /product group 0 /Products 0 /Protective Resist 0 /Remover 0 /Stopper 0 /SX AR-N 4340/7 0 /SX AR-N 4340/7 0 /SX AR-N 7530/1 0 /SX AR-N 7730/1 0 /SX AR-N 8200/1 0 /SX AR-N 8400 0 /SX AR-P 3500/6 0 /SX AR-P 3500/8 0 /SX AR-P 3740/4 0 /SX AR-PC 5000/41 0 /SX AR-PC 5000/80.2 0 /SX AR-PC 5000/82.7 0 /Thinner 0 /X AR-N 7700/30 0 /X AR-P 3220/7 0 /X AR-P 5900/4 0

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-N 7520 series

High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 8100 series (Phoenix 81)

High-contrast, thermolabile resist for integrated circuits and holographic structures

E-Beam Resist SX AR-N 8200 series (Medusa 82)

Experimental sample/custom-made product

E-Beam Resist SX AR-N 8250 series (Medusa 82)

Comparable to HSQ, but more process-stable, more sensitive by a factor of 20

E-Beam Resist SX AR-N 8400 series (Medusa 84 SiH)

HSQ with improved stability and shelf life

Overview E-Beam Resists