Electra 92 established on the market – AR-PC 5092.02

In October 2022, we selected the newly developed Electra 92 AR-PC 5092.02 as our Resist of the Month. This conductive resist contains only polyaniline, various surfactants and water, and no isopropanol. This environmentally friendly approach has made it possible to significantly extend the life of the Electra 92 resist. In addition, the resist can be applied to various e-beam resists, including those not offered by Allresist.

At AMOLF (Academic Institute for Fundamental Physics, Amsterdam), Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task. The deposition performance was excellent, resulting in closed, uniform surfaces. The HSQ could then be easily processed. A line width of up to 22 nm was achieved in the Siemens star shown (Fig. 1).

Fig. 1: Lines of the Siemens star on HSQ generated up to 22 nm wide using AR-PC 5092.02. © Bob Drent, AMOLF NanoLab Amsterdam

The result is particularly interesting as we have now added an identical HSQ e-beam resist (Medusa 84 AR-N 8400 SiH) to our product portfolio, on which the coating with Electra 92 also works perfectly.

The new Electra 92 was very well received by our customers in the first year and over 200 liters were sold.

This success has prompted us to name Electra 92 as our Resist of the Month.