All 26 /Adhesions Promoter 1 /AR 300-12 0 /AR 300-26 0 /AR 300-35 0 /AR 300-44 0 /AR 300-46 0 /AR 300-47 0 /AR 300-475 0 /AR 300-72 0 /AR 300-73 0 /AR 300-76 0 /AR 300-80 0 /AR 600-01 0 /AR 600-02 0 /AR 600-07 0 /AR 600-09 0 /AR 600-50 0 /AR 600-51 0 /AR 600-546 0 /AR 600-548 0 /AR 600-549 0 /AR 600-55 0 /AR 600-56 0 /AR 600-60 0 /AR 600-61 0 /AR 600-70 0 /AR 600-71 0 /AR-BR 5400 0 /AR-N 2210 0 /AR-N 2220 0 /AR-N 2230 0 /AR-N 4200 0 /AR-N 4300 0 /AR-N 4400 0 /AR-N 4400-25 0 /AR-N 4400-50 0 /AR-N 4450 0 /AR-N 4600 0 /AR-N 7400 0 /AR-N 7500 0 /AR-N 7520 0 /AR-N 7520 neu 0 /AR-N 7700 0 /AR-N 7720 0 /AR-P 1200 0 /AR-P 3100 0 /AR-P 3200 0 /AR-P 3500 0 /AR-P 3500T 0 /AR-P 3700 0 /AR-P 3800 0 /AR-P 5300 0 /AR-P 5900 0 /AR-P 617 0 /AR-P 6200 0 /AR-P 631-671 0 /AR-P 632-672 0 /AR-P 639-679 0 /AR-P 6500 0 /AR-P 8100 0 /AR-PC 500 0 /AR-PC 5000 0 /AR-U 4000 0 /Bottom Resist 0 /Developer 13 /E-Beam Resist 0 /Negative 0 /Negative 0 /Photoresist 0 /Positive 0 /Positive 0 /Process Chemicals 0 /product group 0 /Products 0 /Protective Resist 0 /Remover 5 /Stopper 2 /SX AR-N 4340/7 0 /SX AR-N 4340/7 0 /SX AR-N 7530/1 0 /SX AR-N 7730/1 0 /SX AR-N 8200/1 0 /SX AR-N 8400 0 /SX AR-P 3500/6 0 /SX AR-P 3500/8 0 /SX AR-P 3740/4 0 /SX AR-PC 5000/41 0 /SX AR-PC 5000/80.2 0 /SX AR-PC 5000/82.7 0 /Thinner 5 /X AR-N 7700/30 0 /X AR-P 3220/7 0 /X AR-P 5900/4 0
Adhesion Promoter AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
Developer AR 300-26
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-35
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-44
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-46
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-47
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-475
For the development of photoresists and novolac-based e-beam resist films
Developer AR 600-50
For the development of e-beam resists films
Developer AR 600-546
For the development of e-beam resists films
Developer AR 600-548
For the development of e-beam resists films
Developer AR 600-549
For the development of e-beam resists films
Developer AR 600-55
For the development of e-beam resists films
Developer AR 600-56
For the development of e-beam resists films
Developer X AR 600-50/2
High-purity and ultra-fine filtered developer for selective T-gate applications
Remover AR 300-70
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-72
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-73
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-76
For the stripping of tempered photoresist and e-beam resist films
Remover AR 600-71
For the stripping of tempered photoresist and e-beam resist films
Stopper AR 600-60
For the stopping of e-beam resist film development with solvents
Stopper X AR 600-60/1
For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1, main component: Octane
Thinner AR 300-12
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-02
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-07
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-09
For adjusting the film thickness of photoresists and e-beam resists
Thinner X AR 300-74/1
For adjusting the coating thickness of the SX AR-PC 5000/41 protective coating
Overview Process chemicals
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de