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Process chemicals

All 26 /Adhesions Promoter 1 /AR 300-12 0 /AR 300-26 0 /AR 300-35 0 /AR 300-44 0 /AR 300-46 0 /AR 300-47 0 /AR 300-475 0 /AR 300-72 0 /AR 300-73 0 /AR 300-76 0 /AR 300-80 0 /AR 600-01 0 /AR 600-02 0 /AR 600-07 0 /AR 600-09 0 /AR 600-50 0 /AR 600-51 0 /AR 600-546 0 /AR 600-548 0 /AR 600-549 0 /AR 600-55 0 /AR 600-56 0 /AR 600-60 0 /AR 600-61 0 /AR 600-70 0 /AR 600-71 0 /AR-BR 5400 0 /AR-N 2210 0 /AR-N 2220 0 /AR-N 2230 0 /AR-N 4200 0 /AR-N 4300 0 /AR-N 4400 0 /AR-N 4400-25 0 /AR-N 4400-50 0 /AR-N 4450 0 /AR-N 4600 0 /AR-N 7400 0 /AR-N 7500 0 /AR-N 7520 0 /AR-N 7520 neu 0 /AR-N 7700 0 /AR-N 7720 0 /AR-P 1200 0 /AR-P 3100 0 /AR-P 3200 0 /AR-P 3500 0 /AR-P 3500T 0 /AR-P 3700 0 /AR-P 3800 0 /AR-P 5300 0 /AR-P 5900 0 /AR-P 617 0 /AR-P 6200 0 /AR-P 631-671 0 /AR-P 632-672 0 /AR-P 639-679 0 /AR-P 6500 0 /AR-P 8100 0 /AR-PC 500 0 /AR-PC 5000 0 /AR-U 4000 0 /Bottom Resist 0 /Developer 13 /E-Beam Resist 0 /Negative 0 /Negative 0 /Photoresist 0 /Positive 0 /Positive 0 /Process Chemicals 0 /product group 0 /Products 0 /Protective Resist 0 /Remover 5 /Stopper 2 /SX AR-N 4340/7 0 /SX AR-N 4340/7 0 /SX AR-N 7530/1 0 /SX AR-N 7730/1 0 /SX AR-N 8200/1 0 /SX AR-N 8400 0 /SX AR-P 3500/6 0 /SX AR-P 3500/8 0 /SX AR-P 3740/4 0 /SX AR-PC 5000/41 0 /SX AR-PC 5000/80.2 0 /SX AR-PC 5000/82.7 0 /Thinner 5 /X AR-N 7700/30 0 /X AR-P 3220/7 0 /X AR-P 5900/4 0

Adhesion Promoter AR 300-80 new

For improving the adhesive strength of photo and e-beam resists

Developer AR 300-26

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-35

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-44

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-46

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-47

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-475

For the development of photoresists and novolac-based e-beam resist films

Developer AR 600-50

For the development of e-beam resists films

Developer AR 600-546

For the development of e-beam resists films

Developer AR 600-548

For the development of e-beam resists films

Developer AR 600-549

For the development of e-beam resists films

Developer AR 600-55

For the development of e-beam resists films

Developer AR 600-56

For the development of e-beam resists films

Developer X AR 600-50/2

High-purity and ultra-fine filtered developer for selective T-gate applications

Remover AR 300-70

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-72

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-73

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-76

For the stripping of tempered photoresist and e-beam resist films

Remover AR 600-71

For the stripping of tempered photoresist and e-beam resist films

Stopper AR 600-60

For the stopping of e-beam resist film development with solvents

Stopper X AR 600-60/1

For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1, main component: Octane

Thinner AR 300-12

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-02

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-07

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-09

For adjusting the film thickness of photoresists and e-beam resists

Thinner X AR 300-74/1

For adjusting the coating thickness of the SX AR-PC 5000/41 protective coating

Overview Process chemicals