All 24 /Adhesions Promoter 2 /AR 300-12 0 /AR 300-26 0 /AR 300-35 0 /AR 300-44 0 /AR 300-46 0 /AR 300-47 0 /AR 300-475 0 /AR 300-72 0 /AR 300-73 0 /AR 300-76 0 /AR 300-80 0 /AR 600-01 0 /AR 600-02 0 /AR 600-07 0 /AR 600-09 0 /AR 600-50 0 /AR 600-51 0 /AR 600-546 0 /AR 600-548 0 /AR 600-549 0 /AR 600-55 0 /AR 600-56 0 /AR 600-60 0 /AR 600-61 0 /AR 600-70 0 /AR 600-71 0 /AR-BR 5400 0 /AR-N 2210 0 /AR-N 2220 0 /AR-N 2230 0 /AR-N 4200 0 /AR-N 4300 0 /AR-N 4400 0 /AR-N 4400-25 0 /AR-N 4400-50 0 /AR-N 4450 0 /AR-N 4600 0 /AR-N 7400 0 /AR-N 7500 0 /AR-N 7520 0 /AR-N 7520 neu 0 /AR-N 7700 0 /AR-N 7720 0 /AR-P 1200 0 /AR-P 3100 0 /AR-P 3200 0 /AR-P 3500 0 /AR-P 3500T 0 /AR-P 3700 0 /AR-P 3800 0 /AR-P 5300 0 /AR-P 5900 0 /AR-P 617 0 /AR-P 6200 0 /AR-P 631-671 0 /AR-P 632-672 0 /AR-P 639-679 0 /AR-P 6500 0 /AR-P 8100 0 /AR-PC 500 0 /AR-PC 5000 0 /AR-U 4000 0 /Bottom Resist 0 /Developer 12 /E-Beam Resist 0 /Negative 0 /Negative 0 /Photoresist 0 /Positive 0 /Positive 0 /Process Chemicals 0 /product group 0 /Products 0 /Protective Resist 0 /Remover 5 /Stopper 1 /SX AR-N 4340/7 0 /SX AR-N 7530/1 0 /SX AR-N 7730/1 0 /SX AR-N 8200/1 0 /SX AR-P 3500/6 0 /SX AR-P 3500/8 0 /SX AR-P 3740/4 0 /SX AR-PC 5000/41 0 /SX AR-PC 5000/80.2 0 /SX AR-PC 5000/82.7 0 /Thinner 4 /X AR-N 7700/30 0 /X AR-P 3220/7 0 /X AR-P 5900/4 0
Adhesion Promoter AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
Developer AR 300-26
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-35
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-44
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-46
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-47
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-475
For the development of photoresists and novolac-based e-beam resist films
Developer AR 600-50
For the development of e-beam resists films
Developer AR 600-546
For the development of e-beam resists films
Developer AR 600-548
For the development of e-beam resists films
Developer AR 600-549
For the development of e-beam resists films
Developer AR 600-55
For the development of e-beam resists films
Developer AR 600-56
For the development of e-beam resists films
HMDS adhesion promoter
For improving the adhesive strength of photo and e-beam resists
Remover AR 300-70
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-72
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-73
For the stripping of tempered photoresist and e-beam resist films
Remover AR 300-76
For the stripping of tempered photoresist and e-beam resist films
Remover AR 600-71
For the stripping of tempered photoresist and e-beam resist films
Stopper AR 600-60
For the stopping of e-beam resist film development with solvents
Thinner AR 300-12
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-02
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-07
For adjusting the film thickness of photoresists and e-beam resists
Thinner AR 600-09
For adjusting the film thickness of photoresists and e-beam resists
Overview Process chemicals
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
AR NEWS
Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de