Resist of the Month

Special product developments from our company are published quarterly within the “Resist of the Month” series.

October 2024: Worldwide interest in Medusa 84 – AR-N 8400 SiH

15. October 2024

Allresist will soon offer ready-to-use resists as a replacement for HSQ in three different layer thicknesses: 50 nm (4,000 rpm, 4 % solids), 100 nm (4,000 rpm, 7 % solids), 400 nm (4,000 rpm, 23 % solids) → 1.0 µm / 800 rpm

July 2024: Medusa 84 AR-N 8400 SiH, the improved HSQ alternative, in market launch

18. July 2024

Through a targeted synthesis which precisely separates the stable and sensitive molecular fraction of the HSQ polymer, and through complex cleaning procedures, it is possible to offer a significantly more stable resist.

January 2024: Electra 92 established on the market – AR-PC 5092.02

29. January 2024

At AMOLF, Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task.

October 2023: Medusa 84 SiH – SX AR-N 8400 another alternative to HSQ

6. October 2023

In contrast to Medusa 82, the optical transparency of Medusa 84 SiH is significantly higher, since it is made of purely inorganic components. This transparency is important for a large group of customers who use such resists for optical applications.

April 2023: E-beam PMMA resist AR-P 672.045 – the workhorse for electron beam lithography

24. April 2023

Due to the high sales volume, AR-P 672.045 is our internal "market leader". This resist is used by three major microchip manufacturers in France, Germany, and China. The consumption is thus steadily increasing, and meanwhile more than 300 liters of this resist are ordered annually.

January 2023: Standard resist AR-P 3510 – 30 years on the world market

15. January 2023

Right from the beginning, the idea of sustainability was firmly anchored in the philosophy of our young company. One of the first advanced developments of Allresist was the replacement of teratogenic solvents in the positive photoresist AR-P 351 with safer solvents. This is how the standard resist AR-P 3510 was created, in which the excellent lithographic properties of AR-P 351 were retained, but the resist was now significantly less dangerous to health for the user.

October 2022: Optimised Electra 92 – a new AR-PC 5092

19. October 2022

We have now achieved a quality of aniline polymers that does not require the addition of isopropanol, which also increases the stability of AR-PC 5092 resist mixtures. Long-term tests demonstrated that the storage stability is significantly higher than with previous Electra variants.

July 2022: Our resist triplet of the month – presented at the Triple-Beam (EIPBN 2022)

4. July 2022

After the corona-related merely online possible presence in the past two years, Allresist finally again took part live at the EIPBN in New Orleans, and we experienced a high interest in our resists at our booth.

April 2022: New environmentally friendly developer for PMMA resists AR 600-57

4. April 2022

Exceptionally we present a new PMMA developer in the "Resist of the month" section today, because its potential possibilities will probably also inspire our users. This developer is a mixture of isopropanol and water – which may sound surprising at first, since both components individually do not attack PMMA layers.

January 2022: Versatile Phoenix 81 (AR-P 8100)

13. January 2022

Phoenix 81 was developed as part of a Eurostar project in cooperation with Swisslitho AG (now Heidelberg Instruments Nano). Using a NanoFrazor and thermal scanning probe lithography (t-SPL), structures as small as 10 nm can be written by dipping a hot needle into the resist layer and evaporating the resist at the tip (see also AR NEWS, 42nd issue).

October 2021: More efficient production of Electra 92

1. October 2021

Many companies meanwhile use the conductivity of Electra layers for their processes and technologies. Since its introduction on the market in 2018, synthesis and processing of Electra have continuously been improved. The conductivity of this resist could for example be increased by a factor of five between 2018 and 2020.

July 2021: CAR 44 for galvanic molding

6. July 2021

The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.

April 2021: CSAR 62 – In demand around the world

30. March 2021

Resist CSAR 62 is meanwhile established worldwide, with continuously increasing demands. Since we manufacture the polymer by ourselves, we had to scale up polymer synthesis. First of all, CSAR 62 made the jump from laboratory scale to a 20-liter trailer.

January 2021: Optimised process for negative photoresist Atlas 46

20. January 2021

We continued the development work on our new Atlas 46 photoresist also in 2021. Due to own results or recommendations and requests from our users, its formulation and properties were now improved.

July 2020: Bottom resist AR-BR 5400, the “workhorse” for two-layer processes

28. July 2020

In 2004, the first bottom resist (BR) was developed in collaboration with the Center for Intelligent Systems (CiS, Erfurt). This bottom resist is non-light sensitive and can be developed in an aqueous alkaline manner.

January 2020: Black resist SX AR-N 8355/7

25. February 2020

Optically dense resists play an increasingly important role in industry. So-called black resists are required in optical industry, in automotive industry (for headlights) and in the manufacture of rotary encoders.

Oktober 2019: Medusa 82 UV

22. October 2019

Medusa 82 UV was already chosen as resist of the month in January 2019. Back then, we highly appreciated the first results for a use as photoresist. Shown are now results with respect to an application in grayscale lithography which were also presented at the MNE 2019 in Greece.

April 2019: Phoenix 81

22. April 2019

Allresist developed Phoenix 81 (AR-P 8100) within the scope of a Eurostars project together with SwissLitho AG and other partners. SwissLitho recently added a laser direct writer to the NanoFrazor device (see Fig. 1)

Resist of the Month of October: Medusa 82 – alternative to HSQ

21. October 2018

Allresist now developed Medusa 82 as an alternative to HSQ resists. Due to a modification of the polymer, resist Medusa 82 can be handled very easily.

Resist of the Month July: Medusa 82 – the alternative to HSQ-resists

3. July 2018

Our research team successfully developed a negative resist with high resolution and plasma etching stability in oxygen. Already with the first samples, it was possible to achieve the properties of HSQ.

Resist of the month of April: Fluorescent negative photoresist Atlas 46 S

6. April 2018

These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.

Resist of the month January: SU 8 alternative – negative photoresist Atlas 46

2. January 2018

The outstanding properties of SU-8 are well known to all users of microsystem technologies. Allresists new negative resist Atlas 46 S (solid) can easily be processed with high reproducibility of all properties and with high restistance of resist structures to all commonly used solvents. Atlas 46 S is thus perfectly suitable for all applications in which the layer is intended to remain permanently and resistively on the substrate.

Resist of the month of October: Fluorescent resist structures with SX AR-P 672.08

18. September 2017

Fluorescent structures are needed for optical components and in microscopy. In close collaboration with Precision Optics Gera GmbH we now achieved to add fluorescent dyes to PMMA e-beam resists on anisole basis which subsequently could be structured by electron beam lithography.

Resist of the month April – Thermally developable positive resist Phoenix 81

3. April 2017

Resist of the month January 2017: Optimised negative spray resist AR-N 2200

2. January 2017

Spray resist AR-N 2220 is the only ready-to-use negative resist worldwide. This eliminates the need for the time-consuming and inaccurate mixing of a resist with solvents.

Resist of the month October 2016: Optimised T-gate structures with three-layer system PMMA, copolymer 617 and CSAR 62

1. October 2016

T-gates are required for the manufacture of high-quality transistors. Allresist optimised several three-layer systems for this particular application and designed both universal developers for a single development step, as well as individual developers which are suitable to develop each one of the three layers specifically.

Resist of the month July 2016: Negative PMMA resist for photolithography

1. July 2016

Sensitive substrates do not tolerate aqueous-alkaline developers. For such cases, X AR-N 4800/16 was developed already several years ago. While this resist met all the demands placed on it, only a layer build up to 70 % with moderate sensitivity was possible.

Resist of the month January 2016: Electra 92 has now gone into production!

1. January 2016

Electra 92 has passed its baptism of fire by the users very well, and an increasingly large number of satisfied customers provided positive feedbacks with respect to the excellent properties of resist AR-PC 5090.02.

Resist of the month October 2015: E-beam lithography on glass – CSAR 62 and Electra 92

1. October 2015

Allresist presented this precise and easy to handle two-layer system already on the MNE (Micro and Nano Engineering) 2015 in Den Haag with great success.

Resist of the month Juli 2015: Process-adapted two-layer resist AR-BR 5460

1. July 2015

The bottom resist AR-BR 5460 has already been used for a decade in combination with positive (e.g. AR-P 3510) or negative resists (e.g. AR-N 4340) for a large variety of lift-off applications.

Resist of the month April 2015: High-sensitivity negative resist AR-N 4400-10

1. April 2015

The negative resist AR-N 4400-10 was structured with a laser direct imaging system at an exposure wavelength of 405 nm. The figures below show different arrays with column diameters varying from 5 to 50 µm.

Resist of the month January 2015: High temperature-resistant positive resist

1. January 2015

After the successful development of negative resist SX AR-N 4340/7 which is temperature-stable up to 350 °C, we can now in addition offer a temperature-resistant positive variant called SX AR-PC 3500/8. This resist may be exposed and ..

Resist of the month October 2014: Safer solvent

1. October 2014

The protective coating AR-PC 504 has proven itself successful many times for our customers in the past six years. Layers of this polymer reliably protect substrates against concentrated bases and acids.

Resist of the month July 2014: Electra 92

1. July 2014

Allresist developed a novel polymer based on polyaniline in cooperation with the IDM e.V., Teltow. The new conductive protective coating SX AR-PC 5000/90.2 was already presented in issue 28 of the AR NEWS.

Resist of the Month Archive: April 2014

1. April 2014

We already reported in April 2013 on the CSAR 62 within the scope of our “Resist of the month”. After a fast development phase, sales of this new electron beam resist started in May.

Resist of the Month Archive: October 2013

1. October 2013

Resist of the month October 2013: Thermally stable negative resist SX AR-N 4340/6 Our last resist of the month was the thermally stable two-layer system SX AR-N 4340/10 – AR-P 5460 which reliably tolerates temperatures of up to 200 °C.

Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460

1. July 2013

Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460 In a large variety of lift-off applications, the resist layer is exposed to high thermal loads.

Resist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520

1. April 2013

Resist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520 Users cherish the specific properties of ZEP 520, while service and prices are rather feared.

Resist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL)

1. January 2013

Resist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL) Well-ordered structures across an entire wafer can be produced (see image 3)

Resist of the month October 2012: Negative photoresists AR-N 4400 – with optimized bake regime

1. October 2012

Resist of the month October 2012: Negative photoresists AR-N 4400 – with optimized bake regime For the new project VEGAS (see AR NEWS, 25 th issue, October 2012), columnar resist structures with a thickness of 10 to up to 60 µm are required.

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