Stopper Archive - Allresist EN

Stopper X AR 600-60/1

msendel — Thu, 16 Nov 2023 07:09:48 +0000

Stopper X AR 600-60/1

For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1

Your request for this product

Characterisation

Immediate interruption of development
High-purity solvent mixture for residue-free removal of developer residues from X AR 300-74/1
The development process can be slowed down by adding 10-20 % of the stopper X AR 600-60/1 to the developer X AR 300-74/1

Interesting Resist Wiki articles

Properties

Density at 20 °C (g/cm³)
0,703 g/cm³
Flash point (°C)
13 °C
Filtration (μm)
0,2 µm
Storage up to 6 month (°C)
10-22 °C

Available order sizes

1 x 1.000 ml

Please contact us for further requests.

Suitable products

Adhesion Promoter AR 300-80 new

For improving the adhesive strength of photo and e-beam resists

Stopper X AR 600-60/1

For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1, main component: Octane

Thinner X AR 300-74/1

For adjusting the coating thickness of the SX AR-PC 5000/41 protective coating

The post Stopper X AR 600-60/1 appeared first on Allresist EN.

Stopper AR 600-60

AllAdmin — Thu, 27 Jul 2017 16:20:33 +0000

Stopper AR 600-60

For the stopping of e-beam resist film development with solvents

Product information

Your request for this product

Characterisation

immediate interruption of the development process
ultrapure solvent mixtures for residue-free removal of remaining developer
If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process
is slowed down.

Interesting Resist Wiki articles

Properties

Density at 20 °C (g/cm³)
0,785 g/cm³
Water content max. (%)
0,1 %
Flash point (°C)
12 °C
Filtration (μm)
0,2 µm
Storage up to 6 month (°C)
10-22 °C

Available order sizes

1 x 2.5 L
4 x 2.5 L
8 x 2.5 L

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

Photoresist AR-N 4600 series (Atlas 46)

Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm

The post Stopper AR 600-60 appeared first on Allresist EN.