E-Beam Resist AR-P 672 series
(AR-P 672.01, AR-P 672.02, AR-P 672.03, AR-P 672.045, AR-P 672.06, AR-P 672.08, AR-P 672.11)
PMMA resist series 50K – 950K for the production of integrated circuits and masks
Characterisation
- e-beam, deep UV (248 nm)
- very good adhesion to glass, silicon and metals
- for planarization and multi-layer processes
- highest resolution, high contrast
- poly(methyl methacrylate) with diff. molecular weights
Interesting Resist Wiki articles
Properties
AR-P 672.01
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Film thickness/ 4000 rpm (nm): 0,03 µm
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Resolution best value (nm): 6 nm
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Contrast: 7
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Flash point: 44 °C
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Storage 6 month (°C): 10 – 22 °C
AR-P 672.02
AR-P 672.03
AR-P 672.045
AR-P 672.06
AR-P 672.08
AR-P 672.11
Available order sizes
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 1 x 1 L
- 6 x 1 L
Please contact us for further requests.
Suitable process chemicals
Dose sequence of the 600K/950K system
Not yet completely developed at 1800 pC/cm
Definition: The sensitivity is expressed in pC/cm for lines, while the unit for areas is μC/cm².
Formation of undercut vs. exposure dose
Trench width top: 20 nm, measured values in the diagram: width of trenches at the bottom