Resist of the month Archives - Allresist EN https://www.allresist.com/category/allresist/press-allresist/resist-of-the-month/ ALLRESIST GmbH - Strausberg, Germany Mon, 29 Jan 2024 15:10:30 +0000 en-GB hourly 1 https://wordpress.org/?v=6.5.2 January 2024: Electra 92 established on the market – AR-PC 5092.02 https://www.allresist.com/january-2024-electra-92-established-on-the-market-ar-pc-5092-02/ Mon, 29 Jan 2024 15:10:05 +0000 https://www.allresist.com/?p=18277 At AMOLF, Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task.

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Electra 92 established on the market – AR-PC 5092.02

 


January 2024

In October 2022, we selected the newly developed Electra 92 AR-PC 5092.02 as our Resist of the Month. This conductive resist contains only polyaniline, various surfactants and water, and no isopropanol. This environmentally friendly approach has made it possible to significantly extend the life of the Electra 92 resist. In addition, the resist can be applied to various e-beam resists, including those not offered by Allresist.

At AMOLF (Academic Institute for Fundamental Physics, Amsterdam), Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task. The deposition performance was excellent, resulting in closed, uniform surfaces. The HSQ could then be easily processed. A line width of up to 22 nm was achieved in the Siemens star shown (Fig. 1).

Fig. 1: Lines of the Siemens star on HSQ generated up to 22 nm wide using AR-PC 5092.02. © Bob Drent, AMOLF NanoLab Amsterdam

The result is particularly interesting as we have now added an identical HSQ e-beam resist (Medusa 84 AR-N 8400 SiH) to our product portfolio, on which the coating with Electra 92 also works perfectly.

The new Electra 92 was very well received by our customers in the first year and over 200 liters were sold.

This success has prompted us to name Electra 92 as our Resist of the Month.

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]]> October 2023: Medusa 84 SiH – SX AR-N 8400 another alternative to HSQ https://www.allresist.com/october-2023-medusa-84-sih-sx-ar-n-8400-another-alternative-to-hsq/ Fri, 06 Oct 2023 08:34:21 +0000 https://www.allresist.com/?p=18157 In contrast to Medusa 82, the optical transparency of Medusa 84 SiH is significantly higher, since it is made of purely inorganic components. This transparency is important for a large group of customers who use such resists for optical applications.

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Medusa 84 SiH

SX AR-N 8400 another alternative to HSQ

 


October 2023

The HSQ resist is used worldwide in e-beam lithography. However, despite its good properties, its lifetime is very limited. In addition, many customers have complained that it is becoming increasingly difficult to obtain HSQ, as production is likely to be discontinued soon. Therefore, a year ago we decided to take action and develop another HSQ analog resist with higher stability. We named it Medusa 84 SiH (SX AR-N 8400), so it belongs to the Medusa group, but differs from the two Medusa 82 variants 1).

In contrast to Medusa 82, the optical transparency of Medusa 84 SiH is significantly higher, since it is made of purely inorganic components. This transparency is important for a large group of customers who use such resists for optical applications. These can be structures fabricated by electron beam lithography, such as the diffractive optical element (DOE) shown in Figure 1, or unstructured functional layers in optics.

Fig. 1 DOE fabricated with Medusa 82 @ U. Hübner, P. Voigt, Leibniz Institute of Photonic Technology, Jena, Germany

Furthermore, by selecting a special non-polar resist solvent, the shelf life of Medusa 84 SiH was significantly increased. The quality of our samples, which have been in our lab for 8 months, remains unchanged.

Several partners have tested first samples and confirmed the excellent properties of Medusa 84 SiH 1). As soon as we have more representative results, we will inform you. Small samples of 30 ml will also be available as of November 2023. If you are interested in an evaluation, please contact us.

Fig. 2 Dose scale of the Medusa 84 SiH, dose 950 µC/cm², 30 kV, developer AR 300-44

The first impressive results of our Medusa 84 SiH prompted us to make it the resist of the month October.

  • Further information at allresist.de or 48. AR NEWS October 2023

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]]> April 2023: E-beam PMMA resist AR-P 672.045 – the workhorse for electron beam lithography https://www.allresist.com/april-2023-e-beam-pmma-resist-ar-p-672-045-the-workhorse-for-electron-beam-lithography/ Mon, 24 Apr 2023 21:21:44 +0000 https://www.allresist.com/?p=17973 Due to the high sales volume, AR-P 672.045 is our internal "market leader". This resist is used by three major microchip manufacturers in France, Germany, and China. The consumption is thus steadily increasing, and meanwhile more than 300 liters of this resist are ordered annually.

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E-beam PMMA resist AR-P 672.045

The workhorse for electron beam lithography


April 2023

When Allresist was founded 30 years ago, also PMMA resists for electron beam lithography were included in the product portfolio. The PMMA copolymer which had been developed during the GDR area (formerly PSKL, now AR-P 617) and the self-produced PMMAs (molecular weight 50k and 200k) were retained and complemented by PMMAs with higher molecular mass (600k and 950k).

The entire resist family AR-P 630 – 670 is characterised by very reliable and easy handling as well as an unsurpassed long-term stability. The new, “green” developer AR 600-57 based on water and isopropanol further increases the attractiveness of this resist group. Only slightly longer writing times compared to other e-beam resists (e.g. CSAR 62) have to be accepted.

Due to the high sales volume, AR-P 672.045 is our internal “market leader”. This resist is used by three major microchip manufacturers in France, Germany, and China. The consumption is thus steadily increasing, and meanwhile more than 300 liters of this resist are ordered annually.

Siemens star, produced with AR-P 672.045  

The high level of reliability and continued market success have prompted us to choose AR-P 672.045 as the resist of the month of April.

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]]> January 2023: Standard resist AR-P 3510 – 30 years on the world market https://www.allresist.com/standard-resist-ar-p-3510-30-years-on-the-world-market/ Sun, 15 Jan 2023 21:49:09 +0000 https://www.allresist.com/?p=17925 Right from the beginning, the idea of sustainability was firmly anchored in the philosophy of our young company. One of the first advanced developments of Allresist was the replacement of teratogenic solvents in the positive photoresist AR-P 351 with safer solvents. This is how the standard resist AR-P 3510 was created, in which the excellent lithographic properties of AR-P 351 were retained, but the resist was now significantly less dangerous to health for the user.

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Standard resist AR-P 3510 – 30 years on the world market


January 2023

The 30th company anniversary last year which we celebrated together with the Minister President of Brandenburg, Dietmar Woidke, was also an occasion for us to reflect on the roots and the history of Allresist. Back in autumn 1992, Brigitte Schirmer and Matthias Schirmer founded the Allresist GmbH; they rented the technical center of the former “Fotochemische Werke” in Berlin-Köpenick and took over the entire know-how of the resist production to which developement they had contributed considerably in the past.

The former “Technikum“ in Berlin-Köpenick                                     

Right from the beginning, the idea of sustainability was firmly anchored in the philosophy of our young company. One of the first advanced developments of Allresist was the replacement of teratogenic solvents in the positive photoresist AR-P 351 with safer solvents. This is how the standard resist AR-P 3510 was created, in which the excellent lithographic properties of AR-P 351 were retained, but the resist was now significantly less dangerous to health for the user. We informed our customers about the progress, and in most cases, the changeover to the new product took place extremely quickly. Over the past 30 years, more than 32 tons of AR-P 3510 resist have been sold.

In appreciation of our history, this success has prompted us to choose this resist as resist of the month of January.

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]]> October 2022: Optimised Electra 92 – a new AR-PC 5092 https://www.allresist.com/october-2022-optimised-electra-92-a-new-ar-pc-5092/ Wed, 19 Oct 2022 22:26:01 +0000 https://www.allresist.com/?p=17875 We have now achieved a quality of aniline polymers that does not require the addition of isopropanol, which also increases the stability of AR-PC 5092 resist mixtures. Long-term tests demonstrated that the storage stability is significantly higher than with previous Electra variants.

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Optimised Electra 92 – a new AR-PC 5092


October 2022

The synthesis of Electra 92 could be significantly improved with our new filtration device “Tiffy”, since the new filtration method signifcantly reduces the required working time from 300 hours per batch to 10 hours. The water consumption dropped from 2000 liters to 15 liters per batch, which is another contribution to relieve our environment.

And, in addition to all these advantages, the optimisation process generated an improvement of the resist properties. We have now achieved a quality of aniline polymers that does not require the addition of isopropanol, which also increases the stability of AR-PC 5092 resist mixtures. Long-term tests demonstrated that the storage stability is significantly higher than with previous Electra variants. Furthermore, coating tests on all of our resists showed very good coating behaviour and we therefore even expect that this optimised AR-PC 5092 will replace other Electra variants in the future.

AR-PC 5092 on CSAR 92 on glass

A comprehensive analysis of the present results is currently summarised by our R&D team and will be published shortly.

This success, improving both the manufacturing process and product properties, prompted us to chose Electra 92 as resist of the month.

Test samples for interested customers are offered from now on upon request; please contact our customer advisors.

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]]> July 2022: Our resist triplet of the month – presented at the Triple-Beam (EIPBN 2022) https://www.allresist.com/july-2022-our-resist-triplet-of-the-month-presented-at-the-triple-beam-eipbn-2022/ Mon, 04 Jul 2022 09:02:43 +0000 https://www.allresist.com/?p=17590 After the corona-related merely online possible presence in the past two years, Allresist finally again took part live at the EIPBN in New Orleans, and we experienced a high interest in our resists at our booth.

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Our resist triplet of the month – presented at the Triple-Beam (EIPBN 2022)


April 2022

After the corona-related merely online possible presence in the past two years, Allresist finally again took part live at the EIPBN in New Orleans, and we experienced a high interest in our resists at our booth.

Allresist research team at their booth in New Orleans

Dr. M. Grube during her presentation

The most frequently requested information concerned three of our new developments, resists CSAR 62, Electra 92 and Phoenix 81, which we produce ourselves and which now account for a quarter of our annual sales. We received a lot of positive feedback from congress participants who have already used these resists with great success.

AR-P 6200                          AR-PC 5090                AR-P 8100

                                     

Cäsar (CSAR)                        Electra                   Phoenix

Dr. Mandy Grube presented these resists to a large audience within the context of an industry talk. After her presentation, numerous lively discussions developed at our booth which reflects the great interest with respect to the possible applications of all three resists.

This success at the EIPBN 2022 prompted us to choose a resist triplet as “Resist of the Month” this time.

If you should be interested, you can download further information at www.allresist.de.

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]]> April 2022: New environmentally friendly developer for PMMA resists AR 600-57 https://www.allresist.com/april-2022-new-environmentally-friendly-developer-for-pmma-resists-ar-600-57/ Mon, 04 Apr 2022 10:57:14 +0000 https://www.allresist.com/?p=17054 Exceptionally we present a new PMMA developer in the "Resist of the month" section today, because its potential possibilities will probably also inspire our users. This developer is a mixture of isopropanol and water – which may sound surprising at first, since both components individually do not attack PMMA layers.

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New environmentally friendly developer for PMMA resists AR 600-57


April 2022

Exceptionally we present a new PMMA developer in the “Resist of the month” section today, because its potential possibilities will probably also inspire our users. This developer is a mixture of isopropanol and water – which may sound surprising at first, since both components individually do not attack PMMA layers. There is however an optimal mixing ratio where the required radiation dose for PMMA resists approximately corresponds to the dose of the conventional developers AR 600-55 and AR 600-56 (MIBK/IPA). Due to the gentle development (no swelling occurs), usually also a larger process window is achieved.

These investigations in addition take into account the fact that MIBK will be classified as a hazardous substance as of the end of 2022. With the new mixture, we offer a developer that is not harmful to health and also significantly more advantageous in environmental terms.

The technological and eco-friendly aspects of the new developer AR 600-57 have led us to vote this developer as “Resist” of the month.

PMMA two-layer system, developed with AR 600-57

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]]> January 2022: Versatile Phoenix 81 (AR-P 8100) https://www.allresist.com/january-2022-versatile-phoenix-81-ar-p-8100/ Thu, 13 Jan 2022 21:39:50 +0000 https://www.allresist.com/?p=16731 Phoenix 81 was developed as part of a Eurostar project in cooperation with Swisslitho AG (now Heidelberg Instruments Nano). Using a NanoFrazor and thermal scanning probe lithography (t-SPL), structures as small as 10 nm can be written by dipping a hot needle into the resist layer and evaporating the resist at the tip (see also AR NEWS, 42nd issue).

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Resist of the month: Versatile Phoenix 81 (AR-P 8100)


January 2022

Phoenix 81 was developed as part of a Eurostar project in cooperation with Swisslitho AG (now Heidelberg Instruments Nano). Using a NanoFrazor and thermal scanning probe lithography (t-SPL), structures as small as 10 nm can be written by dipping a hot needle into the resist layer and evaporating the resist at the tip (see also AR NEWS, 42nd issue). Meanwhile, more than 40 NanoFrazor devices have been installed worldwide. Most users take advantage of the ultra-pure, stable Phoenix 81 (gold standard) for their structuring.

This resist allows for various potential applications. A few examples kindly provided by Dr. Felix Holzner and Samuel Bisig (Heidelberg Instruments Nano) are shown in the following.

Pillars written into Phoenix 81 by t-SPL and etched into 20nm Au using a hard mask stack and ion beam etching.

Side electrodes onto a nanowire made markerless overlay using t-SPL in Phoenix 81.

Room-temperature single electron transistors made by t-SPL (nanofeatures) and direct laser sublimation (microfeatures) of Phoenix 81 and etching into Si.

7nm gap made by t-SPL and a two layer lift-off with Phoenix 81 and PMMA-co-MA (AR-P 617).

This documented versatility motivated us to choose Phoenix 81 as resist of the month.

For further information, see our website and https://heidelberg-instruments.com/.

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]]> October 2021: More efficient production of Electra 92 https://www.allresist.com/october-2021-more-efficient-production-of-electra-92/ Fri, 01 Oct 2021 05:43:19 +0000 https://www.allresist.com/?p=16477 Many companies meanwhile use the conductivity of Electra layers for their processes and technologies. Since its introduction on the market in 2018, synthesis and processing of Electra have continuously been improved. The conductivity of this resist could for example be increased by a factor of five between 2018 and 2020.

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Resist of the Month October 2021:

More efficient production of Electra 92


October 2021

Many companies meanwhile use the conductivity of Electra layers for their processes and technologies. Since its introduction on the market in 2018, synthesis and processing of Electra have continuously been improved. The conductivity of this resist could for example be increased by a factor of five between 2018 and 2020. An unwanted side effect was however that the long-term stability of certain batches fell below the guaranteed storage stime of six months, resulting in defects during coating. We have now solved this problem with an innovative manufacturing technology.

At first, synthesis process parameters were subjected to thorough tests by applying a sophisticated temperature regime during which a defined pH value was set at all times. This increased the yield by 33 %, whereby the optimal spectroscopic extinction values ensuring the high quality were also met.

During these tests it became evident that the drying step after dialysis which had been carried out so far caused the reduced long-term stability of the polymers with the highest conductivity. Searching for alternative solutions, we came across Tangential Flow Filtration (TFF). The company Satorius subsequently adapted a SARTOFLOW device specifically to our requirements (see also AR NEWS April 2021).

Tangential Flow Filtration with SARTOFLOW

First test runs conducted in spring turned out to be quite successful and the TFF device was, as is tradition at Allresist, given a catchy name – “Tiffy”. The working time per approach is reduced to 1/30 as compared to the old technology, and in addition 80 % of the required DI water can be saved. Yielding a very high quality, the entire Electra production via Tiffi is now progressing much faster and considerably more environmentally compatible.

Our investigations have also shown that an addition of ethanol instead of isopropanol improves both coating behavior and long-term stability. If we should change the recipe accordingly in future, we will inform our customers in time.

These successful investigations were the reason why we selected Electra 92 as resist of the month of October.

Oliver Schirmer (right) and Eric Röschke (left) exchanging filters at “Tiffy”

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]]> July 2021: CAR 44 for galvanic molding https://www.allresist.com/july-2021-car-44-for-galvanic-molding/ Tue, 06 Jul 2021 10:41:20 +0000 https://www.allresist.com/?p=16296 The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.

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Resist of the Month July 2021:

Negative resist CAR 44 for galvanic molding


July 2021

Due to its excellent structural quality, resist SU-8 is in principle suitable for the fabrication of galvanic components, but the extremely difficult removal of resist structures after electroplating argues against this application. Our negative resist AR-N 4400-50 (CAR 44) which can also be used for layer thicknesses of up to 100 µm is however relatively easy to remove after the process.

In cooperation with United Monolithic Semiconductors GmbH, Ulm, it was possible to optimise the processing method for AR-N 4400-50 such that 30 µm-structures with vertical edges were generated. Exposure and development regime were precisely adapted to the technological requirements. Electroplating with this optimised resist finally yielded metal structures with a desired thickness of 18 μm.

Detailed view of the metal structure, confirming the vertical edges of AR-N 4400-50

Metalized structures after resist removal

The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.

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