AR-P 3500 (T) series
(AR-P 3510, AR-P 3510 T, AR-P 3540, AR-P 3540 T)
Sensitive positive-tone standard resists for the production of integrated circuits
Please contact us for further requests.
Characterisation
- broadband UV, i-line, g-line
- high photosensitivity, high resolution
- very good adhesion properties
- 3500 T: robust processing, suitable for TMAH developer 0.26 n
- plasma etching resistant, temperature-stable up to 120 °C
- combination of novolac and naphthoquinone diazide
- Safer Solvent PGMEA
Interesting Resist Wiki articles
Properties
AR-P 3510
- Layer thickness/4000 rpm: 2.0 µm
- Resolution: 0.8 µm
- Contrast: 4.0
- Flash point: 46 °C
- Storage up to 6 months: 10-18 °C
AR-P 3510 T
AR-P 3540
AR-P 3540 T
* The products have a guaranteed shelf life of 6 months from the date of sale when stored according to instructions and can be used beyond that without guarantee until the label date.
Available order sizes
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 1 x 1 L
- 6 x 1 L
Suitable process chemicals
Structure resolution
AR-P 3540 T: Film thickness 1.5 μm, Resist structures 0.5 μm
Process parameters
- SubstrateSi 4“ Wafer
- Tempering95 °C, 90 s, hot plate
- Exposureg-line stepper (NA: 0,56)
- DevelopmentAR 300-44, 60 s, 22 °C
Spin curve
Spin curve of the AR-P 3510/AR-P 3510 T and AR-P 3540/AR-P 3540 T