E-Beam Resist AR-N 7720 series
(AR-N 7720.13, AR-N 7720.30)
High-resolution e-beam resists for the production of diffractive optics
Please contact us for further requests.
Characterisation
- e-beam, deep UV; chemically enhanced (CAR)
- flat gradation for three-dimensional resist profiles for diffractive optics and holograms
- negative-tone with high resolution in the UVrange 248-265 nm and 290-330 nm
- plasma etching resistant, temperature-stable up to 140 °C
- novolac, acid generator, crosslinking agent
- Safer Solvent PGMEA
Interesting Resist Wiki articles
Properties
AR-P 7720.13
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Film thickness/4000 rpm: 0,25 µm
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Resolution best value: 80 nm
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Contrast: < 1
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Flash point: 42 °C
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Storage 6 month: 8-12 °C
AR-P 7720.30
Available order sizes
Product on request
Suitable process chemicals
Structure resolution
AR-N 7720.13. Sinusoidal structures
Process parameters
- Substrate4“ Si-Wafer
- Tempering
85 °C, 90 s, hot plate
- Exposure
Vistec Lion, 12,5 kV
- Development
AR 300-47, 4 : 1, 60 s, 22 °C
Spin curve
Resist structures
Diffractive optic transferred with AR-N 7720.30 into silicone