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Customer information Corona virus

The novel corona virus (COVID-19) is spreading rapidly across national borders. So far, the operational processes of Allresist GmbH have hardly been affected. We strive to meet our customers’ requirements as best we can in this tense situation and to minimize the impact on our operational processes as much as possible. The focus is on protecting our colleagues and our customers.

Oktober 2019: Medusa 82 UV

Medusa 82 UV was already chosen as resist of the month in January 2019. Back then, we highly appreciated the first results for a use as photoresist. Shown are now results with respect to an application in grayscale lithography which were also presented at the MNE 2019 in Greece.

40th issue of the AR NEWS

Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect

Allresist presents Medusa 82 at the MNE 2019 in Rhodes

Just as in the previous years, Allresist was represented at the MNE congress with a prestigious booth. This year’s MNE was guided by the motto “Going Nano in Homer’s Land” – an excellent connecting point for our presentation since our new e-beam resist is named Medusa 82.

Extension of the production facilities

On April 29, 2019, Allresist put the new production wing into operation in which from now on 1,000 l resist batch productions and large-scale syntheses will take place with state-of-the-art technology and taking into account all safety considerations.